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Energy control for an excimer or molecular fluorine laser 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01S-003/13
출원번호 US-0688561 (2000-10-16)
발명자 / 주소
  • Rebhan, Ulrich
  • Nowinski, Guenter
출원인 / 주소
  • Lambda Physik AG
대리인 / 주소
    Stallman & Pollock LLP
인용정보 피인용 횟수 : 9  인용 특허 : 134

초록

A method and gas replenishment algorithm for excimer and molecular fluorine lasers is based on parameters upon which gas aging more closely depends than pulse count, such as input energy to the electrical discharge, and also preferably time. A burst control method and algorithm includes measuring th

대표청구항

A method and gas replenishment algorithm for excimer and molecular fluorine lasers is based on parameters upon which gas aging more closely depends than pulse count, such as input energy to the electrical discharge, and also preferably time. A burst control method and algorithm includes measuring th

이 특허에 인용된 특허 (134)

  1. Turner Brian A. (Chester NJ), Addition of oxygen to a gas mix for use in an excimer laser.
  2. Morton Richard George ; Fomenkov Igor Vladimirovich ; Partlo William Norman, Aerodynamic chamber design for high pulse repetition rate excimer lasers.
  3. Wakabayashi Osamu (Kanagawa JPX) Ito Noritoshi (Kanagawa JPX) Kowaka Masahiko (Kanagawa JPX), Apparatus for controlling output from an excimer laser device.
  4. Ito Noritoshi (Hiratsuka JPX) Amada Yoshiho (Hiratsuka JPX) Wakabayashi Osamu (Hiratsuka JPX), Apparatus for controlling output of an excimer laser device.
  5. Bedwell David J. (Bristol GBX), Apparatus for controlling the composition of a laser gas or gas mixture.
  6. Mller-Horsche Elmar (Kissing DEX) Khler Ludwig (Gttingen DEX) Keller Bernd (Bovenden DEX), Apparatus for preionization of gas in a pulsed gas laser.
  7. Mller-Horsche Elmar (Kissing DEX), Apparatus for preionizing apulsed gas laser.
  8. Basting Dirk (Gttingen DEX) Steinfhrer Gerd (Bovenden DEX) Voss Frank (Gttingen DEX), Apparatus for purifying laser gas.
  9. Basting Dirk (Gttingen DEX) Steinfhrer Gerd (Bovenden DEX) Voss Frank (Gttingen DEX), Apparatus for purifying laser gas.
  10. Ludewig Rdiger (Gttingen) Voss Frank (Gttingen DEX), Apparatus for purifying laser gas.
  11. Carlesi Jason R. ; Rokni Shahryar ; Gong Mengxiong ; Watson Tom A. ; Das Palash P. ; Binder Michael C. ; Tantra Muljadi ; Tammadge David J. ; Patterson Daniel G., Automatic fluorine control system.
  12. Gong Mengxiong ; Carlesi Jason R. ; Binder Michael C. ; Das Palash P., Automatic fluorine control system.
  13. Weiss Hardy P. (IM Seeblick 8821 Hutten CHX), Axial gas laser and process for stabilizing its operation.
  14. Watson Tom Arthur ; Partlo William Norman, Compact excimer laser insulator with integral pre-ionizer.
  15. Partlo William N. ; Birx Daniel L. ; Ness Richard M., Current reversal prevention circuit for a pulsed gas discharge laser.
  16. David Jean-Fran.cedilla.ois,FRX ; Gerbe Jean-Pierre,FRX, Device for stowing away a holographic mirror, notably for aircraft.
  17. Ohmi Tadahiro,JPX ; Sano Naoto,JPX ; Shirai Yasuyuki,JPX, Discharge electrode, shape-restoration thereof, excimer laser oscillator, and stepper.
  18. Haruta Kenyu (Mino JPX) Wakata Hitoshi (Itami JPX) Sato Yukio (Amagasaki JPX) Nagai Haruhiko (Hyogo JPX) Nakatani Hajime (Hyogo JPX) Kita Hideki (Toyonaka JPX), Discharge excitation type short pulse laser device.
  19. Meller Anton,DEX ; Voss Frank,DEX, Discharge unit and electrode for a pulsed discharge laser.
  20. Hohla Kristian (Gttingen DEX) Albers Ernst (Gttingen DEX), Discharge-pumped laser.
  21. Magnusson Robert (Arlington TX) Wang Shu-Shaw (Arlington TX), Efficient bandpass reflection and transmission filters with low sidebands based on guided-mode resonance effects.
  22. Bumler Jrgen (Osterode DEX) Zeh Manfred (Gttingen DEX), Electrode for pulsed gas lasers.
  23. Suzuki Kazuaki (Kawasaki JPX), Energy amount control device.
  24. Das Palash P. (Vista CA) Larson Donald G. (San Diego CA), Excimer laser.
  25. Voss Frank (Gottingen DEX), Excimer laser comprising a gas reservoir and a collecting receptacle and a method of refilling the gas reservoir of the.
  26. Wakabayashi Osamu (Hiratsuka JPX) Mizoguchi Hakaru (Hiratsuka JPX), Excimer laser device.
  27. Haruta Kenyu (Amagasaki JPX) Wakata Hitoshi (Amagasaki JPX) Sato Yukio (Amagasaki JPX) Nagai Haruhiko (Amagasaki JPX), Excimer laser equipment.
  28. Rothweil Daniel A. ; Fomenkov Igor V., Excimer laser having power supply with fine digital regulation.
  29. Bittenson Steven N. (Bedford MA) Klauminzer Gary K. (Lexington MA), Excimer laser output control device.
  30. Fomenkov Igor Vladimirovich ; Sandstrom Richard L., Excimer laser with greater spectral bandwidth and beam stability.
  31. Miyaji Akira (Tokyo JPX) Ikeda Masatoshi (Tokyo JPX), Exposure apparatus.
  32. Scaggs Michael ; Voss Frank,DEX, F.sub.2 (157nm) laser employing neon as the buffer gas.
  33. Rokni Shahryar ; Watson Tom A. ; Tammadge David J., Fluorine control system for excimer lasers.
  34. Fahlen Theodore S. (San Jose CA), Gas discharge laser having a buffer gas of neon.
  35. von Borstel Michael (Stuttgart DEX), Gas laser.
  36. Nozue Yasuhiro (Yokohama JPX) Kajiyama Koichi (Hiratsuka JPX) Sajiki Kazuaki (Hiratsuka JPX), Gas laser device.
  37. Cohn, David E.; Conley, Eugene E., Gas laser preionization device.
  38. Sandstrom Richard L. (Encinitas CA), Gas replenishment method and apparatus for excimer lasers.
  39. Chen Chungte W. (Irvine CA) Gossett Ernest W. (Glendora CA), Grism (grating-prism combination).
  40. Partlo William N. ; Birx Daniel L. ; Ness Richard M. ; Rothweil Daniel A. ; Melcher Paul C. ; Smith Brett D., High pulse rate pulse power system.
  41. Partlo William N. ; Birx Daniel L. ; Ness Richard M. ; Rothweil Daniel A. ; Melcher Paul C. ; Smith Brett D., High pulse rate pulse power system with fast rise time and low current.
  42. Partlo William N. ; Birx Daniel L. ; Ness Richard M. ; Rothweil Daniel A. ; Melcher Paul C. ; Smith Brett D., High pulse rate pulse power system with resonant power supply.
  43. Ness Richard M. ; Partlo William N. ; Sandstrom Richard L., High voltage cable interlock circuit.
  44. Govorkov Sergei V. ; Stamm Uwe,DEX, Hybrid laser resonator with special line narrowing.
  45. Mizoguchi Hakaru,JPX ; Wakabayashi Osamu,JPX ; Kobayashi Yukio,JPX ; Amada Yoshiho,JPX ; Mimura Tatsuo,JPX, Laser appartus.
  46. Juhasz Tibor ; Ujazdowski Richard C. ; Besaucele Herve A. ; Ozarski Robert G. ; Azzola James H., Laser chamber with minimized acoustic and shock wave disturbances.
  47. Mizoguchi Hakaru (Hiratsuka JPX) Amada Yoshiho (Hiratsuka JPX) Ito Noritoshi (Hiratsuka JPX), Laser device.
  48. Osamu Wakabayashi JP; Tatsuya Ariga JP; Toru Igarashi JP; Shoichi Sakanishi JP; Tomokazu Takahashi JP, Laser device.
  49. Mizoguchi Hakaru (Hiratsuka JPX) Amada Yoshiho (Hiratsuka JPX) Ito Noritoshi (Hiratsuka JPX), Laser device having an electrode with auxiliary conductor members.
  50. Cavaioli Marco (Rome ITX) Salvetti Gianemilio (Rome ITX) Marchetti Renato (Rome ITX) Penco Eugenio (Rome ITX), Laser doped with tripropylamine.
  51. Kleinschmidt Jurgen,DEX ; Heist Peter,DEX, Laser for generating narrow-band radiation.
  52. Mizoguchi Hakaru,JPX ; Nishisaka Toshihiro,JPX ; Komori Hiroshi,JPX, Laser gas controller and charging/discharging device for discharge-excited laser.
  53. Rebhan Ulrich (Gttingen DEX) Steinfhrer Gerd (Bovenden DEX) Voss Frank (Gttingen DEX) Oesterlin Peter (Gttingen DEX), Laser gas purifying apparatus.
  54. Mizoguchi Hakaru (Hiratsuka JPX) Fujimoto Junichi (Hiratsuka JPX) Kowaka Masahiko (Hiratsuka JPX) Takahashi Tomokazu (Hiratsuka JPX), Laser gas replenishing apparatus and method in excimer laser system.
  55. Chaffee Edwin G. (Salt Lake City UT), Laser gas replenishment system.
  56. Weick Jurgen-Michael,DEX ; Mohler Thomas,DEX, Laser machine tool with gas filled beam delivery conduit.
  57. Usui Akaru (Aichi JPX), Laser machining apparatus for welding and cutting.
  58. Yoshida Kenichi (Osaka JPX) Ono Kimizo (Osaka JPX) Sunago Katsuyoshi (Osaka JPX) Takenaka Shinya (Osaka JPX) Iwai Tohru (Osaka JPX), Laser output controlling device.
  59. Wakabayashi Osamu,JPX ; Shakushi Tetsuo,JPX, Laser processing device and laser device.
  60. Govorkov Sergei V. ; Basting Dirk,DEX, Laser system and method for narrow spectral linewidth through wavefront curvature compensation.
  61. Partlo William N. (San Diego CA), Laser system with anamorphic confocal unstable resonator.
  62. Amada Yoshiho (Kanagawa JPX) Wakabayashi Osamu (Kanagawa JPX) Kowaka Masahiko (Kanagawa JPX), Laser wavelength control apparatus.
  63. Ershov Alexander I., Laser with line narrowing output coupler.
  64. Sandstrom Richard L. ; Das Palash P. ; Fomenkov Igor V. ; Besaucele Herve A. ; Ozarski Robert G., Laser-illuminated stepper or scanner with energy sensor feedback.
  65. Nozue Yasuhiro (Yokohama JPX) Kajiyama Koichi (Hiratuska JPX) Saito Kaoru (Hiratsuka JPX) Wakabayashi Osamu (Hiratsuka JPX) Kowaka Masahiko (Hiratsuka JPX) Itakura Yasuo (Hiratsuka JPX), Light source for reduced projection.
  66. Das Palash P. ; Ershov Alexander I. ; Morton Richard G., Line narrowing apparatus with high transparency prism beam expander.
  67. Ershov Alexander I., Line narrowing device with double duty grating.
  68. Desor Rainer,DEX ; Targsdorf Andreas,DEX ; Merz Spencer ; Von Bergmann Hubertus,ZAX, Magnetic switch controlled power supply isolator and thyristor commutating circuit.
  69. Das Palash P. (Vista CA) Stephenson Gary R. (San Diego CA), Maintenance strategy control system and monitoring method for gas discharge lasers.
  70. Hakuta Kohzo (Fuchu JPX) Aramaki Minoru (Tokyo JPX) Suen. A Takashi (Yamaguchi JPX) Kodama Mitsuo (Ube JPX) Nakano Hisaji (Ube JPX) Nakagawa Shinsuke (Ube JPX), Method and apparatus for analyzing fluorine containing gases.
  71. Partlo William N. ; Sandstrom Richard L. ; Birx Daniel L. ; Ness Richard Mons, Method and apparatus for eliminating reflected energy due to stage mismatch in nonlinear magnetic compression modules.
  72. Kajiyama Koichi (Fujieda JPX) Saito Kaoru (Fujieda JPX) Itakura Yasuo (Hiratsuka JPX) Wakabayashi Osamu (Hiratsuka JPX) Kowaka Masahiko (Hiratsuka JPX) Yamaguchi Tadayoshi (Hiratsuka JPX), Method and apparatus for sensing the wavelength of a laser beam.
  73. Lokai Peter (Bovenden DEX) Rosenkranz Heribert (Gttingen DEX), Method and apparatus for stabilizing the frequency of a laser beam.
  74. Shioji Naruaki,JPX, Method and apparatus for supplying gaseous nitrogen to a laser beam machine.
  75. Kleinschmidt Jurgen,DEX ; Stamm Uwe,DEX ; Vogler Klaus,DEX ; Lokai Peter,DEX, Method and apparatus for wavelength calibration.
  76. Klauminzer Gary K. (Lexington MA) Merz S. Spencer (Lexington MA) Campbell James D. (Bedford MA), Method and means of controlling the output of a pulsed laser.
  77. Wakabayashi Osamu (Hiratsuka JPX) Kowaka Masahiko (Hiratsuka JPX), Method and system for controlling narrow-band oscillation excimer laser.
  78. Yoshioka Takeo (Hyogo JPX) Minagawa Tadao (Hyogo JPX), Method for controlling gas in halogen gas laser and device therefor.
  79. Rebhan Ulrich (Gttingen DEX), Method of controlling the total energy amount of a plurality of laser pulses.
  80. Aramaki Minoru (Tokyo JPX) Nakagawa Shinsuke (Ube JPX) Nakano Hisaji (Ube JPX) Ichimura Hiroshi (Ube JPX) Tainaka Masahiro (Ube JPX), Method of refining rare gas fluoride excimer laser gas.
  81. Hakuta Kohzo (Fuchu JPX) Aramaki Minoru (Ube JPX) Suenaga Takashi (Yamaguchi Prefecture JPX), Method of refining rare gas halide excimer laser gas.
  82. King Michael C. (Carlisle MA), Microlithographic system.
  83. Basting Dirk ; Govorkov Sergei V. ; Stamm Uwe,DEX, Molecular fluorine (F.sub.2) laser with narrow spectral linewidth.
  84. Kajiyama Koichi (Fujieda JPX) Saito Kaoru (Fujieda JPX) Nozue Yasuhiro (Yokohama JPX) Ito Noritoshi (Hiratsuka JPX) Wakabayashi Osamu (Hiratsuka JPX) Fujimoto Junichi (Kanagawa JPX) Kowaka Masahiko (, Multi-mode narrow-band oscillation excimer laser.
  85. Ishihara Toshihiko ; Hofmann Thomas ; Das Palash P. ; Ershov Alexander I., Narrow band excimer laser.
  86. Wakabayashi Osamu (Hiratsuka JPX) Kowaka Masahiko (Hiratsuka JPX) Kobayashi Yukio (Hiratsuka JPX), Narrow band excimer laser.
  87. Wakabayashi Osamu,JPX ; Kowaka Masahiko,JPX ; Kobayashi Yukio,JPX, Narrow band excimer laser.
  88. Wakabayashi Osamu (Kanagawa JPX) Kowaka Masahiko (Kanagawa JPX) Kobayashi Yukio (Kanagawa JPX), Narrow band excimer laser and wavelength detecting apparatus.
  89. Hofmann Thomas ; Ishihara Toshihiko ; Das Palash P. ; Ershov Alexander I., Narrow band excimer laser with gas additive.
  90. Besaucele Herve A. ; Ishihara Toshihiko ; Hofmann Thomas, Narrow band gas discharge laser with gas additive.
  91. Ershov Alexander I., Narrow band laser with etalon based output coupler.
  92. Basting Dirk (Gottingen DEX) Kleinschmidt Jurgen (Weissenfels DEX), Narrow-band laser apparatus.
  93. Furuya Nobuaki (Kawasaki JPX) Ono Takuhiro (Zama JPX) Horiuchi Naoya (Kawasaki JPX) Yamanaka Keiichiro (Kawasaki JPX) Miyata Takeo (Zama JPX), Narrow-band laser apparatus.
  94. Ono Yuzo (Tokyo JPX) Oba Akitomo (Tokyo JPX), Optical head device and birefringent diffraction grating polarizer and polarizing hologram element used therein.
  95. Scaggs Michael J., Optically pumped laser with multi-facet gain medium.
  96. Amada Yoshiho,JPX ; Wakabayashi Osamu,JPX ; Ito Noritoshi,JPX, Output controller for laser device.
  97. Schall Wolfgang,DEX, Oxygen-iodine laser.
  98. Vogler Klaus Wolfgang,DEX ; Heist Peter,DEX, Performance control system and method for gas discharge lasers.
  99. Sunderland Richard A. (St. Charles MO) Lane John A. (Watertown NY), Pivoting battery compartment and door.
  100. Firester Arthur Herbert (Skillman NJ), Polarization-selective laser mirror.
  101. Bees George L. (Ashland MA), Power supply for negative impedance gas discharge lasers.
  102. Larson Donald G. (San Diego CA), Pre-ionizer for a laser.
  103. Basting Dirk,DEX ; Von Bergmann Hubertus,ZAX, Precision variable delay using saturable inductors.
  104. Eldridge Robert E. (Los Angeles CA) Cohn David B. (Torrance CA) Affleck Wayde H. (El Segundo CA), Preionization electrode for pulsed gas laser.
  105. Das Palash P., Process for selecting operating range for narrow band excimer laser.
  106. Caspers Carl A. (510-8 25th Ave. North St. Cloud MN 56301), Prosthetic polyurethane liner and sleeve for amputees.
  107. Sandstrom Richard L. ; Besaucele Herve Andre ; Fomenkov Igor V. ; Das Palash P., Pulse energy control for excimer laser.
  108. Birx Daniel L. ; Das Palash P. ; Fomenkov Igor V. ; Partlo William N. ; Watson Tom A., Pulse power generating circuit with energy recovery.
  109. Mller-Horsche Elmar (Gttingen DEX), Pulsed gas-discharge laser.
  110. Fahlen Theodore S. (San Jose CA) Clark David J. (Whittier CA), Pulsed laser electrode assembly.
  111. Levatter Jeffrey I. (Rancho Santa Fe CA), Rare gas-halogen excimer laser.
  112. Turner Robert E. (60 Prospect St. Huntington NY 11743), Recycling of gases for an excimer laser.
  113. Morton Richard G. ; Blasiak Thomas C., Reflective overcoat for replicated diffraction gratings.
  114. Hofmann Thomas ; Hueber Jean-Marc ; Das Palash P. ; Ishihara Toshihiko ; Duffey Thomas P. ; Melchior John T. ; Besaucele Herve A. ; Morton Richard G. ; Ness Richard M. ; Newman Peter C. ; Partlo Will, Reliable, modular, production quality narrow-band high rep rate F.sub.2 laser.
  115. Knowles David S. ; Azzola James H. ; Besaucele Herve A. ; Das Palash P. ; Ershov Alexander I. ; Fomenkov Igor V. ; Juhasz Tibor ; Ozarski Robert G. ; Partlo William N. ; Rothweil Daniel A. ; Sandstro, Reliable. modular, production quality narrow-band KRF excimer laser.
  116. Zhou Zhengzhuo (Torrance CA) Pothoven Floyd R. (Hawthorne CA) Waters Rodney L. (Torrance CA), Sealed excimer laser with longitudinal discharge and transverse preionization for low-average-power uses.
  117. Burghardt Berthold (Waake DEX), Small line width tunable laser.
  118. Sandstrom Richard L. (Encinitas CA), Spectral narrowing technique.
  119. Das Palash P. ; Fomenkov Igor V., Stepper or scanner having two energy monitors for a laser.
  120. Amezcua Marco (Privada del Crepusculo #36 Lote 22 Edificio A Departamento 103 Pedregal de Carrasco Mexico City MXX D. F. C. P. 04700), Stove control timer.
  121. Stephens F. Clark (2315 Overland Ave. Los Angeles CA 90064), Switching gas-discharge ion lasers.
  122. Alger Terry (Tracy CA) Uhlich Dennis M. (Livermore CA) Benett William J. (Livermore CA) Ault Earl R. (Dublin CA), System for controlling the flow of gas into and out of a gas laser.
  123. Anderson Stuart L. (San Diego CA) Sandstrom Richard L. (Encinitas CA), System for, and method of, regulating the wavelength of a light beam.
  124. Bcher Hermann (Gttingen DEX), Tunable laser oscillator.
  125. Lokai Peter (Bovenden DEX) Stamm Uwe (Gottingen DEX), Tunable narrowband optical parametrical oscillator.
  126. Stamm Uwe (Gottingen DEX) Klaft Ingo (Gottingen DEX) Berger Vadim (Gottingen DEX) Borneis Stefan (Fulda DEX) Lokai Peter (Bovenden DEX), Tunable narrowband source of a coherent radiation.
  127. Das Palash Parijat ; Ershov Alexander I., Very narrow band KrF laser.
  128. Ershov Alexander I., Very narrow band laser.
  129. Ershov Alexander I., Very narrow band laser.
  130. Zubli Leslie A. (Apple Gift Corp. ; 329 Old Court Rd. New Hyde Park NY 11040), Voice pen for generating audible messages.
  131. Kleinschmidt Jurgen,DEX ; Albrecht Hans-Stephan,DEX ; Heist Peter,DEX, Wavelength calibration tool for narrow band excimer lasers.
  132. Das Palash P. ; Sandstrom Richard L. ; Fomenkov Igor, Wavelength reference for excimer laser.
  133. Wakata Hitoshi (Amagasaki JPX) Sugitatsu Atsushi (Amagasaki JPX) Nakatani Hajime (Amagasaki JPX) Minamitani Yasushi (Amagasaki JPX), Wavelength stabilizer for narrow bandwidth laser.
  134. Newman Peter C. ; Sandstrom Richard L., Wavelength system for an excimer laser.

이 특허를 인용한 특허 (9)

  1. Bragin, Igor, Energy controller for excimer-laser silicon crystallization.
  2. Ahlawat, Rahul; Aggarwal, Tanuj, Gas mixture control in a gas discharge light source.
  3. Ahlawat, Rahul; Aggarwal, Tanuj, Gas mixture control in a gas discharge light source.
  4. Albrecht,Hans Stephan; Vogler,Klaus Wolfgang; Kleinschmidt,Juergen; Schroeder,Thomas; Bragin,Igor; Berger,Vadim; Stamm,Uwe; Zschocke,Wolfgang; Govorkov,Sergei, Laser gas replenishment method.
  5. Stamm, Uwe; Albrecht, Hans-Stephan; Nowinski, Günter, Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser.
  6. Roy, John, Method and system for performing automatic gas refills for a gas laser.
  7. Holliday, Keith, Output energy control for lasers.
  8. Riggs, Daniel J., System and method for controlling gas concentration in a two-chamber gas discharge laser system.
  9. Russin, Alicia Michelle Powers, Systems and methods to more accurately estimate a fluorine concentration in a source laser.
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