Method and apparatus for the preparation of clean gases
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B01D-053/04
출원번호
US-0424545
(1995-06-02)
국제출원번호
PCT/JP92/01579
(1992-12-02)
국제공개번호
WO94/12265
(1994-06-09)
발명자
/ 주소
Fujii, Toshiaki
Suzuki, Tsukuru
Suzuki, Hidetomo
Sakamoto, Kazuhiko
출원인 / 주소
Ebara Research Co., Ltd.
대리인 / 주소
Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
인용정보
피인용 횟수 :
1인용 특허 :
12
초록▼
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semicondu
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
대표청구항▼
1. A method for preventing the surface of a substrate from contamination, said substrate being retained in a box for placing or storing a substrate, which comprises the following steps: passing a nitrogen gas supplied from a nitrogen gas source through an adsorber and/or absorber for decreasing co
1. A method for preventing the surface of a substrate from contamination, said substrate being retained in a box for placing or storing a substrate, which comprises the following steps: passing a nitrogen gas supplied from a nitrogen gas source through an adsorber and/or absorber for decreasing concentrations of non-methane hydrocarbons therein; and introducing the treated nitrogen gas into the box in which the substrate is retained. 2. The method of claim 1, further comprising the step of: subsequent to the step of passing the nitrogen gas through the adsorber and/or absorber, passing the nitrogen gas through a dust removing filter to remove fine particles contained in the nitrogen gas. 3. The method of claim 2, wherein the adsorber and/or absorber, and filter remove fine particles in the nitrogen gas to the extent of class 10 or less.4. The method of claim 1, further comprising the step of: contacting the introduced nitrogen gas with another adsorber and/or absorber being disposed in the box. 5. The method of claim 1, wherein the adsorber and/or absorber decreases concentration of non-methane hydrocarbons in the nitrogen gas to not more than 0.2 ppm.6. The method of claim 1, wherein the space velocity of the nitrogen gas when passing through the adsorber and/or absorber is set not more than 20,000 h−1.7. An apparatus for preventing the surface of a substrate from contamination, said substrate being retained in a box for placing or storing a substrate, which comprises: a nitrogen gas supplying passage connected to a box for placing or storing a substrate; and an adsorber and/or absorber for non-methane hydrocarbons being disposed in the nitrogen gas supplying passage. 8. The apparatus of claim 7, further comprising a filter for removing fine particles being disposed in the nitrogen gas supplying passage.9. The apparatus of claim 8, wherein the filter is capable of removing fine particles in the box to the extent of class 10 or below.10. The apparatus of claim 7, further comprising an adsorber and/or absorber for non-methane hydrocarbons being disposed in the box.11. The apparatus of claim 7, wherein the space velocity of the nitrogen gas when passing through the adsorber and/or absorber disposed in the nitrogen supplying passage is set between 100 and 20,000 h−1.12. A box for preventing the surface of a substrate retained in the box from contamination, which comprises: a holder for supporting the substrate being disposed in the box, an adsorber and/or absorber for non-methane hydrocarbons being disposed in the box, an inlet for supplying a nitrogen gas to the box, and a dust removing filter is disposed at the inlet. 13. A transport space for transporting a substrate without contamination of the surface of the substrate retained therein, which comprises: a gas supplying passage connected to the transport space, and an adsorber and/or absorber for non-methane hydrocarbons being disposed in the gas supplying passage. 14. The transport space of claim 13, further comprising a dust removing filter disposed downstream of said adsorber and/or absorber.15. The transport space of claim 14, further comprising a means for transporting a substrate being disposed in the space.16. The transport space of claim 13, further comprising a means for transporting a substrate being disposed in the space.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (12)
Bingham Larry A. (Mission Viejo CA), Adsorption process.
Spiegel Ronald J. (Chapel Hill NC) Sederquist Richard A. (Newington CT) Trocciola John C. (Glastonbury CT) Healy Herbert C. (Hebron CT) Lesieur Roger R. (Enfield CT) Sandelli Gregory J. (Newington CT, Landfill gas treatment system.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.