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특허 상세정보

Abatement of effluents from chemical vapor deposition processes using organometallic source reagents

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B01D-053/04   
미국특허분류(USC) 096/108; 096/111; 096/143; 427/250; 073/023.2
출원번호 US-0358972 (2003-02-05)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Chappuis, Margaret
인용정보 피인용 횟수 : 9  인용 특허 : 19
초록

A method and apparatus for abatement of effluent from a CVD process using a source reagent having a metal organic loosely bound to a organic or organometallic molecule such that upon exposure to heat such bond is readily cleavable, e.g., copper deposition process involving the formation of films on a substrate by metalorganic chemical vapor deposition (CVD) utilizing a precursor composition for such film formation. The abatement process in specific embodiments facilitates high efficiency abatement of effluents from copper deposition processes utilizing C...

대표
청구항

1. An apparatus for abatement of effluent from a CVD process using an organometallic copper source reagent, said apparatus comprising: a sorbent bed comprising sorbent material having sorptive affinity for the organometallic copper source reagent and decomposition byproducts thereof; and a flow path joining the sorbent bed in gas flow communication with the process, so that effluent is flowed through the gas flow path to the sorbent bed for at least partial removal of residual copper source reagent and decomposition products from the effluent; and ...

이 특허에 인용된 특허 (19)

  1. Holst, Mark; Dubois, Ray; Arno, Jose; Faller, Rebecca; Tom, Glenn. Abatement of effluents from chemical vapor deposition processes using organometallic source reagents. USP2003036537353.
  2. Tom Glenn M. (New Milford CT). Bulk gas sorption and apparatus, gas containment/treatment system comprising same, and sorbent composition therefor. USP1992095151395.
  3. Matviya Thomas M. (Pittsburgh PA) Hayden Richard A. (Pittsburgh PA). Catalytic carbon. USP1994105356849.
  4. Schmitt John Vincent ; Chen Ling ; Bleyle George Michael ; Cong Yu ; Mak Alfred ; Chang Mei. Chemical vapor deposition hot-trap for unreacted precursor conversion and effluent removal. USP2000086099649.
  5. Tom Glenn M. (New Milford CT) McManus James V. (Danbury CT) Luxon Bruce A. (Stamford CT). Composition, apparatus, and process, for sorption of gaseous compounds of group II-VII elements. USP1991085037624.
  6. Tom Glenn M. ; McManus James V. ; Olander W. Karl. Fluid storage and delivery system utilizing carbon sorbent medium. USP1998015704965.
  7. Mori Yoichi (Fujisawa JPX) Fukunaga Akira (Fujisawa JPX). Gas adsorber for exhaust gas. USP1992125169419.
  8. Machida Hideaki (Hachioji JPX) Kokubun Hiroshi (Hachioji JPX). Manufacturing process for producing a b
  9. Tom Glenn M. (New Milford CT). Method for concentration and recovery of halocarbons from effluent gas streams. USP1997045622682.
  10. Mark Holst ; Ray Dubois ; Jose Arno ; Rebecca Faller ; Glenn Tom. Method of abating of effluents from chemical vapor deposition processes using organometallic source reagents. USP2002056391385.
  11. Miller Cynthia A. ; Tom Glenn M.. Piezoelectric sensor for hydride gases, and fluid monitoring apparatus comprising same. USP1998105827947.
  12. Gardiner Robin A. ; Kirlin Peter S. ; Baum Thomas H. ; Gordon Douglas ; Glassman Timothy E. ; Pombrik Sofia ; Vaartstra Brian A.. Precursor compositions for chemical vapor deposition, and ligand exchange resistant metal-organic precursor solutions. USP1998105820664.
  13. Hayden Richard (Pittsburgh PA) Butterworth Steven L. (Bethel Park PA). Process for regenerating nitrogen-treated carbonaceous chars used for hydrogen sulfide removal. USP1996025494869.
  14. Hardwick, Steven; McManus, James V.. Process for sorption of hazardous waste products from exhaust gas streams. USP1994065320817.
  15. Norman John Anthony Thomas ; Senzaki Yoshihide ; Roberts David Allen. Production of metal-ligand complexes. USP2000086096913.
  16. Tom Glenn M. ; King Mackenzie E.. Quartz crystal microbalance sensors and semiconductor manufacturing process systems comprising same. USP2001106295861.
  17. Dhingra Sandeep S. ; Kresge Charles T. ; McCullen Sharon B.. Selective sorption of organics by metal-containing M41S. USP2000046054052.
  18. Makoto Sekine JP; Nobuo Hayasaka JP; Katsuya Okumura JP. Semiconductor processing system and method of using the same. USP2002016334928.
  19. Hultquist Steven J. ; Tom Glenn M. ; Kirlin Peter S. ; McManus James V.. Sorbent-based gas storage and delivery system for dispensing of high-purity gas, and apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing same. USP2000106132492.

이 특허를 인용한 특허 피인용횟수: 9

  1. Holst, Mark; Faller, Rebecca; Tom, Glenn; Arno, Jose; Dubois, Ray. Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions. USP2004126833024.
  2. Dietz, James; Bishop, Steven E.; McManus, James V.; Lurcott, Steven M.; Wodjenski, Michael J.; Kaim, Robert; DiMeo, Jr., Frank. Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel. USP2015109170246.
  3. Dietz, James; Bishop, Steven E.; McManus, James V.; Lurcott, Steven M.; Wodjenski, Michael J.; Kaim, Robert; Dimeo, Jr., Frank. Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel. USP2013108555705.
  4. Dietz, James; Bishop, Steven E.; McManus, James V.; Lurcott, Steven M.; Wodjenski, Michael J.; Kaim, Robert; Dimeo, Jr., Frank. Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel. USP2011067966879.
  5. McManus, James V.; Dietz, James; Lurcott, Steven M.. Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel. USP2015089097611.
  6. Uji, Shigekazu; Yamaguchi, Masahito. Method of processing volatile organic compound, adsorption and desorption apparatus, and system for processing volatile organic compound. USP2010127854790.
  7. Hetherington, Lucy Jane; Cousins, Matthew John. Reduced copper sulphide sorbent for removing heavy metals. USP2015038969240.
  8. Olander, W. Karl; Sweeney, Joseph D.; Wang, Luping. Semiconductor manufacturing facility utilizing exhaust recirculation. USP2010127857880.
  9. Olander,W. Karl; Sweeney,Joseph D.; Wang,Luping. Semiconductor manufacturing facility utilizing exhaust recirculation. USP2009027485169.