IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0407749
(2003-04-07)
|
발명자
/ 주소 |
|
출원인 / 주소 |
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
12 인용 특허 :
10 |
초록
▼
Three dimensional inorganic powder substrates, with shielded surfaces, having metal oxyanion containing coatings are disclosed. The coated substrates are produced by the process comprising reacting powder particle substrates with a metal oxyanion precursor, an anion forming precursor and an oxy prec
Three dimensional inorganic powder substrates, with shielded surfaces, having metal oxyanion containing coatings are disclosed. The coated substrates are produced by the process comprising reacting powder particle substrates with a metal oxyanion precursor, an anion forming precursor and an oxy precursor reactant mixture at fast reaction and elevated temperature reaction conditions to form a substrate containing a metal oxyanion coating on at least a portion of the three dimensions and shielded surfaces of the substrate. The coated substrates are useful in polymers, catalysis, heat dissipation and shielding applications.
대표청구항
▼
1. An article comprising a thermally associated nondeleterious contaminated metal oxyanion coated three dimensional powder particle substrate produced by the process comprising: forming a reactant mixture comprising powder particle substrates, a metal oxyanion precursor, an anion forming precursor s
1. An article comprising a thermally associated nondeleterious contaminated metal oxyanion coated three dimensional powder particle substrate produced by the process comprising: forming a reactant mixture comprising powder particle substrates, a metal oxyanion precursor, an anion forming precursor said metal and the anion of said precursors being chemically different and an oxy precursor chemically the same or different than one or both of said metal oxyanion and anion forming precursor, reacting said reaction mixture at fast reaction and elevated temperature conditions in a reaction zone effective to form a metal oxyanion coating on at least a portion of the surfaces of said powder substrate at said conditions without substantially adversely affecting the solid integrity of the substrate; said fast reaction conditions in said zone including an average particle residence time of less than about one second when at fast reaction, elevated temperature conditions. 2. The article of claim 1 wherein the residence time is less than about 0.5 seconds and greater than about 1 millisecond. 3. The article of claim 2 wherein the residence time is less than about 0.25 seconds and greater than about 1 millisecond. 4. The article of claim 1 wherein the metal of the metal oxyanion precursor is selected from the group consisting of titanium, boron, silicon, aluminum, molybdenum, zirconium, tungsten, nickel, lanthanum and mixtures thereof. 5. The article of claim 4 wherein the metal is selected from the group consisting of titanium, boron, aluminum and silicon. 6. The article of claim 1 wherein the anion forming precursor is a precursor for an anion selected from the group consisting of carbide, boride, sulfide, silicide, and nitride. 7. The article of claim 6 wherein the anion is selected from the group consisting of nitride, silicide and carbide. 8. An article comprising a thermally associated nondeleterious contaminated metal oxycarbide coated three dimensional powder particle substrate comprising: forming a reactant mixture comprising powder particle substrates, a metal oxyanion precursor, a carbide forming precursor said metal and the carbide of said precursors being chemically different and an oxy precursor chemically the same or different than one or both of said metal oxyanion and carbide forming precursor, reacting said reaction mixture at fast reaction and elevated temperature conditions in a reaction zone effective to form a metal carbide coating on at least a portion of the surfaces of said powder substrate at said conditions without substantially adversely affecting the solid integrity of the substrate; said fast reaction conditions in said zone including an average particle residence time of less than about one second when at fast reaction, elevated temperature conditions. 9. The article of claim 8 wherein the residence time is less than about 0.5 seconds and greater than about 1 millisecond. 10. The article of claim 9 wherein the residence time is less than about 0.25 seconds and greater than about 1 millisecond. 11. The article of claim 8 wherein the metal of the metal oxycarbide precursor is selected from the group consisting of titanium, boron, silicon, aluminum, molybdenum, zirconium, tungsten, nickel, lanthanum and mixtures thereof. 12. The article of claim 11 wherein the metal is selected from the group consisting of titanium, boron, aluminum, molybdenum and silicon. 13. The article of claim 8 wherein the oxycarbide forming precursor is selected from the group consisting of gaseous hydrocarbons, gaseous chloro hydrocarbons and powdered carbon. 14. The article of claim 13 wherein the carbide forming precursor is selected from the group consisting of methane and powdered carbon. 15. An article comprising a thermally associated nondeleterious contaminated metal oxynitride coated three dimensional powder particle substrate produced by the process comprising: forming a reactant mixture comprising powder particle substrates, a m etal oxyanion precursor, a nitride forming precursor said metal and the nitride of said precursors being chemically different and an oxy precursor chemically the same or different than one or both of said metal oxyanion and nitride forming precursor, reacting said reaction mixture at fast, reducing and elevated temperature conditions in a reaction zone effective to form a metal nitride coating on at least a portion of the surfaces of said powder substrate at said conditions without substantially adversely effecting the solid integrity of the substrate and contributing deleterious oxide contaminants; said fast reaction conditions in said zone including an average particle residence time of less than about one second when at fast reaction, elevated temperature conditions. 16. The article of claim 15 wherein the residence time is less than about 0.5 seconds and greater than about 1 millisecond. 17. The article of claim 15 wherein the metal of the metal oxynitride precursor is selected from the group consisting of titanium, boron, silicon, aluminum, molybdenum, zirconium, tungsten, nickel, lanthanum and mixtures thereof. 18. The article of claim 17 wherein the metal is selected from the group consisting of titanium, boron, aluminum, molybdenum and silicon. 19. The article of claim 15 wherein the nitride forming precursor is selected from the group consisting of nitrogen, ammonia, nitrogen oxides and mixtures thereof. 20. The article of claim 19 wherein the nitride forming precursor is ammonia.
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