초록 ▼

The present invention intends to provide a manufacturing method for a plasma display panel, so as to overcome problems associated with a withstanding voltage of a dielectric glass layer. Glass particles have angular shapes after grinding with a grinder, but as the surface of them has been melted, th

The present invention intends to provide a manufacturing method for a plasma display panel, so as to overcome problems associated with a withstanding voltage of a dielectric glass layer. Glass particles have angular shapes after grinding with a grinder, but as the surface of them has been melted, they are converted into spheroids. Those glass particles can get wet evenly, so that a binder evenly adheres to the surface of a glass particle when a glass paste including the glass particles is applied to the surface of a substrate. In this case, there is a scarce possibility for a gas, generated by baking the binder, to remain in the form of bubbles in a formed dielectric glass layer. There are fewer bubbles remaining in a completed dielectric glass layer than in a dielectric glass layer than in a glass layer made from angular glass particles.

대표청구항 ▼

1. A manufacturing method for a plasma display panel by which electrodes are formed on a surface of a substrate in a first process and a dielectric glass layer is formed on the electrodes in a second process, the second process comprising:a grinding step for grinding a dielectric glass material;a sp

1. A manufacturing method for a plasma display panel by which electrodes are formed on a surface of a substrate in a first process and a dielectric glass layer is formed on the electrodes in a second process, the second process comprising:a grinding step for grinding a dielectric glass material;a spheroidizing step for converting each particle of the ground dielectric glass material into a spheroidal form;an applying step for applying a mixture of the spheroidal dielectric glass particles and a binder, as a layer, to the surface of the substrate on which the electrodes are formed; anda firing step for firing the layer to remove the binder from the layer, thereby forming a dielectric glass layer. 2. The manufacturing method of claim 1,wherein the spheroidizing step is performed by melting the surface of particles of the ground dielectric glass material. 3. The manufacturing method of claim 2,wherein the melting is performed by putting the particles of the ground dielectric glass material into a plasma jet. 4. The manufacturing method of claim 2,wherein the melting is performed by exposing the particles of the ground dielectric glass material to an atmosphere at a temperature no higher than the softening point of the particles. 5. The manufacturing method of claim 1,wherein the spheroidizing step is performed by having the particles of the glass material collide with one another in high-speed gas flows. 6. The manufacturing method of claim 1,wherein the second process further comprises a step of classifying the glass particles, which is performed between the spheroidizing step and the applying step, so that a maximum diameter of the spheroidal particles of the dielectric glass material does not exceed a half thickness of the dielectric glass layer after the firing step. 7. The manufacturing method of claim 1,wherein the applying step is performed by placing a dielectric glass sheet on the surface of the substrate, the dielectric glass sheet being obtained by mixing the spheroidal glass particles with a thermoplastic resin. 8. The manufacturing method of claim 1, whereinin the firing step, the firing is performed at a temperature in a range of 550° C. to 590° C. 9. The manufacturing method of claim 2, whereinin the spheroidizing step, the spheroidizing is performed until a surface of more than 90 weight percent of the ground dielectric glass material is melted. 10. A manufacturing method for a plasma display panel by which electrodes are formed on a surface of a substrate in a first process and a dielectric glass layer of a predetermined thickness is formed on the electrodes in a second process, the second process comprising:a grinding step for grinding a dielectric glass material selected from a group consisting of PbO—B 2 O 3 —SiO 2 —CaO; PbO—B 2 O 3 —SiO 2 —MgO; PbO—B 2 O 3 —SiO 2 —BaO; PbO—B 2 O 3 —SiO 2 —MgO—Al 2 O 3 ; PbO—B 2 O 3 —SiO 2 —BaO—Al 2 O 3 ; PbO—B 2 O 3 —SiO 2 —CaO—Al 2 O 3 ; ZnO—B 2 O 3 —SiO 2 —Al 2 O 3 —CaO; P 2 O 5 —ZnO—Al 2 O 3 —CaO; and Nb 2 O 5 —ZnO—B 2 O 3 —SiO 2 —CaO;a spheroidizing step for converting the ground dielectric glass material into spheroidal particles;a selecting step for selecting a maximum diameter of the spheroidal particles to not exceed one half the thickness of the predetermined dielectric glass layer;an applying step for applying a mixture of the selected spheroidal particles and a binder, as a layer, to the surface of the substrate on which the electrodes are formed; anda firing step for firing the layer to uniformly remove the binder from the layer, thereby forming a dielectric glass layer of the predetermined thickness. 11. The manufacturing method of claim 10,wherein the spheroidizing step is performed by melting the surface of more than 90 weight percent of the glass particles of the ground dielectric glass material. 12. The manufacturing method of claim 11,wherein the melting is performed by putting the particles of the ground dielectric glass material into a plasma jet having a discharge gas of 10 L/minute and a plasma current of 300A. 13. The manufacturing method of claim 12, wherein a firing step temperature is set to enable the binder to burn out before the glass particles reach the softening point to suppress the number of bubbles in the dielectric glass layer.