초록 ▼

The present invention provides a method for manufacturing a semiconductor device comprising a III-V semiconductor substrate, and an insulating layer deposited on the substrate by Atomic Layer Deposition (ALD). The use of ALD to deposit the insulating layer was found to facilitate the creation of act

The present invention provides a method for manufacturing a semiconductor device comprising a III-V semiconductor substrate, and an insulating layer deposited on the substrate by Atomic Layer Deposition (ALD). The use of ALD to deposit the insulating layer was found to facilitate the creation of active devices that avoid Fermi layer pinning. In addition, such insulating layer may be advantageously used as a passivation layer in III-V substrate based active devices and transistors.

대표청구항 ▼

1. A method of manufacturing a semiconductor device, comprising:providing a III-V semiconductor substrate;performing a thermal anneal of said III-V semiconductor substrate, said thermal anneal comprising a temperature of between about 200° C. and about 400° C. for between about 5 and about

1. A method of manufacturing a semiconductor device, comprising:providing a III-V semiconductor substrate;performing a thermal anneal of said III-V semiconductor substrate, said thermal anneal comprising a temperature of between about 200° C. and about 400° C. for between about 5 and about 500 minutes; anddepositing by Atomic Layer Deposition an insulating layer on said III-V semiconductor substrate. 2. The method as recited in claim 1, wherein said thermal anneal is performed before depositing said insulating layer. 3. The method as recited in claim 1, further including forming an oxide layer on said III-V semiconductor substrate before depositing said insulating layer. 4. The method as recited in claim 1, wherein said insulating layer is between about 0.5 and about 100 nm thick. 5. The method as recited in claim 1, wherein said insulating layer is a first insulating layer and said method further comprises depositing a second insulating layer on said first insulating layer using a non-Atomic Layer Deposition process. 6. The method as recited in claim 1, further comprising performing a second thermal anneal after depositing said insulating layer. 7. The method as recited in claim 1, wherein said semiconductor device is a metal oxide semiconductor field effect transistor (MOSFET) and said method includes forming a gate, source and drain regions and a channel region between said source and drain regions, said MOSFET having a trap density of less than about 10 12 traps/cm 2 . 8. The method as recited in claim 7, wherein said MOSFET device has a transconductance of greater than about 2 mS/mm. 9. The method as recited in claim 1, wherein said thermal anneal is performed after depositing said insulating layer. 10. The method as recited in claim 1, wherein said temperature is between about 200° C. and about 300° C.