IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0243952
(2002-09-16)
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발명자
/ 주소 |
- Laird, Ronald E.
- Neuman, George
- Lingle, Philip J.
- Lemmer, Jean-Marc
- Schillinger, Keith H.
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출원인 / 주소 |
- Guardian Industries Corp., Centre Luxembourgeois de Recherches pour le Verre et la Ceramique S.A. (C.R.V.C.)
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대리인 / 주소 |
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인용정보 |
피인용 횟수 :
24 인용 특허 :
20 |
초록
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A sputter coated article is provided with improved mechanical durability (e.g., pre-HT scratch resistance) and/or thermal stability by sputtering at least one Ag inclusive layer in an atmosphere including at least O 2 gas. For instance, in certain example embodiments an Ag inclusive target may be s
A sputter coated article is provided with improved mechanical durability (e.g., pre-HT scratch resistance) and/or thermal stability by sputtering at least one Ag inclusive layer in an atmosphere including at least O 2 gas. For instance, in certain example embodiments an Ag inclusive target may be sputtered in an atmosphere including a combination of Ar and O 2 gas. In certain embodiments, this enables the resulting AgO x infrared (IR) reflecting layer to better adhere to adjacent contact layer(s).
대표청구항
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1. A method of making a coated article including a coating supported by a glass substrate, the method comprising:sputtering a first dielectric layer on the glass substrate;sputtering a target comprising a metal or metal alloy in an atmosphere including at least oxygen gas in order to form a first co
1. A method of making a coated article including a coating supported by a glass substrate, the method comprising:sputtering a first dielectric layer on the glass substrate;sputtering a target comprising a metal or metal alloy in an atmosphere including at least oxygen gas in order to form a first contact layer comprising a metal oxide on the substrate over the first dielectric layer;sputtering a target comprising Ag in an atmosphere including at least oxygen gas in order to form an infrared (IR) reflecting layer comprising AgO x which is located over and contacts the first contact layer;sputtering a target comprising a metal or metal alloy in an atmosphere including at least oxygen gas in order to form a second contact layer comprising a metal oxide on the substrate so that the second contact layer is located over and in contact with the IR reflecting layer comprising AgO x ;wherein more oxygen gas is introduced into each of the respective atmospheres proximate the targets used in sputtering the first and second contact layer than is introduced into the atmosphere proximate the target comprising Ag used in sputtering the IR reflecting layer comprising AgO x ; andheat treating the glass substrate with the coating thereon in order to thermally temper the same, and wherein visible transmission of the coated article does not decrease as a result of said heat treating. 2. The method of claim 1, wherein a ratio of (a) oxygen gas introduced into the atmosphere proximate the target comprising Ag for sputtering the IR reflecting layer, to (b) oxygen gas introduced into the atmosphere proximate one of the targets for sputtering a corresponding one of the contact layers, is from about 1:1.3 to 1:10; so that more oxygen is present proximate the target used in sputtering the contact layer than is present proximate the target comprising Ag used in sputtering the IR reflecting layer. 3. The method of claim 2, wherein the ratio is from about 1:1.5 to 1:8. 4. The method of claim 2, wherein the ratio is from about 1:2 to 1:5. 5. The method of claim 1, wherein from about 20-100 sccm of oxygen gas is introduced into the atmosphere proximate the target comprising Ag, and wherein at least one of the contact layers comprises NiCrO x . 6. The method of claim 1, wherein from about 20-60 sccm of oxygen gas is introduced into the atmosphere proximate the target comprising Ag. 7. The method of claim 1, wherein both the oxygen gas and argon gas are introduced into the atmosphere proximate the target comprising Ag, and wherein more argon gas than oxygen gas is introduced into the atmosphere proximate the target comprising Ag. 8. The method of claim 1, wherein at least one of the contact layers comprises NiCrO x and is oxidation graded so that a first portion of said one contact layer close to said infrared (IR) reflecting layer is less oxidized than a second portion of said one contact layer that is further from said infrared (IR) reflecting layer and is located in a central portion of said one contact layer. 9. The method of claim 1, wherein the coated article comprises from the glass substrate outwardly:the first dielectric layer;the first contact layer which comprises NiCrO x ;the IR reflecting layer comprising AgO x ;the second contact layer which comprises NiCrO x ;at least one additional dielectric layer;a third layer comprising NiCrO x ;a second IR reflecting layer;a fourth layer comprising NiCrO x ; andat least one additional dielectric layer. 10. The method of claim 1, wherein the coated article as a visible transmittance of at least about 65%, and a sheet resistance (Re) of no greater than 8.0 ohms/sq. 11. The method of claim 1, wherein at least one of the contact layers comprises NiCrO x . 12. The method of claim 1, wherein another dielectric layer is located between the first dielectric layer and the first contact layer. 13. The method of claim 12, wherein said another dielectric layer comprises silicon nitride, and the first dielec tric layer comprises an oxide of titanium. 14. A method of making a coated article including a coating supported by a glass substrate, the method comprising:sputtering a first dielectric layer so as to be supported by the glass substrate;sputtering a first contact layer on the substrate over the first dielectric layer;sputtering a target comprising Ag in an atmosphere including at least oxygen gas in order to form an infrared (IR) reflecting layer comprising AgO x which is located over and contacts the first contact layer;sputtering a second contact layer on the substrate so that the second contact layer is located over and in contact with the IR reflecting layer comprising AgO x ;wherein said sputtering of at least one of the contact layers comprises sputtering a target comprising a metal or metal alloy in an atmosphere including at least oxygen gas in order to form a metal oxide contact layer;heat treating the substrate with the coating thereon for tempering, and wherein visible transmission of the coated article does not decrease due to the heat treating;wherein more oxygen gas is provided in an atmosphere used in sputtering the metal oxide contact layer than is provided in an atmosphere proximate target comprising Ag used in sputtering the IR reflecting layer comprising AgO x ; andwherein visible transmission of the coated article increased upon said heat treating. 15. The method of claim 14, wherein the first and second contact layers each comprise an oxide of NiCr. 16. The method of claim 14, wherein a ratio of (a) oxygen as introduced into the atmosphere proximate the target comprising Ag for sputtering the IR reflecting layer, to (b) oxygen gas introduced into the atmosphere proximate one of the targets for sputtering a corresponding one of the contact layers, is from about 1:1.3 to 1:10; so that more oxygen is present proximate the target used in sputtering the contact layer than is present proximate the target comprising Ag used in sputtering the IR reflecting layer. 17. The method of claim 16, wherein the ratio is from about 1:1.5 to 1:8. 18. The method of claim 14, wherein from about 20-100 sccm of oxygen gas is introduced into the atmosphere proximate the target comprising Ag, and wherein at least one of the contact layers comprises an oxide of NiCr. 19. The method of claim 14, wherein from about 20-60 sccm of oxygen gas is introduced into the atmosphere proximate the target comprising Ag. 20. A method of making a coated article including a coating supported by a glass substrate, the method comprising:sputtering a first dielectric layer so as to be supported by at least the glass substrate;sputtering a first contact layer on the substrate over the first dielectric layer;sputtering a target comprising Ag in an atmosphere including at least oxygen gas in order to form an infrared (IR) reflecting layer comprising AgO x which is located over and contacts the first contact layer;sputtering a second contact layer on the substrate so that the second contact layer is located over and in contact with the JR reflecting layer comprising AgO x ;wherein said sputtering of at least one of the contact layers comprises sputtering a target comprising a metal or metal alloy in an atmosphere including at least oxygen gas in order to form a metal oxide contact layer, wherein more oxygen gas is provided in an atmosphere used in sputtering the metal oxide contact layer than is provided in an atmosphere proximate the target comprising Ag used in sputtering the IR reflecting layer comprising AgO x . 21. The method of claim 20, wherein the first and second contact layers each comprise an oxide of NiCr. 22. The method of claim 20, wherein a ratio of (a) oxygen as introduced into the atmosphere proximate the target comprising Ag for sputtering the IR reflecting layer, to (b) oxygen gas introduced into the atmosphere proximate one of the targets for sputtering a corresponding one of the contact layers, is from about 1:1.3 to 1:10; so t hat more oxygen is present proximate the target used in sputtering the contact layer than is present proximate the target comprising Ag used in sputtering the IR reflecting layer. 23. The method of claim 22, wherein the ratio is from about 1:1.5 to 1:8. 24. The method of claim 20, wherein from about 20-100 sccm of oxygen gas is introduced into the atmosphere proximate the target comprising Ag, and wherein at least one of the contact layers comprises an oxide of NiCr. 25. The method of claim 20, wherein from about 20-60 sccm of oxygen gas is introduced into the atmosphere proximate the target comprising Ag.
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