[미국특허]
Multi-input, multi-output motion control for lithography system
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G01N-021/86
G03B-027/42
출원번호
US-0803320
(2001-03-09)
발명자
/ 주소
Pletner, Baruch
Perkins, Richard
Lublin, Leonard
출원인 / 주소
Cymer, Inc.
대리인 / 주소
Cray William
인용정보
피인용 횟수 :
3인용 특허 :
55
초록▼
A multi-input, multi-output vibration control system for a lithography system. The system provides an actuator, and a sensor useful for controlling vibrations in systems for fabricating electronics equipment. The system includes a processor programmed with a multi-input, multi-output control techniq
A multi-input, multi-output vibration control system for a lithography system. The system provides an actuator, and a sensor useful for controlling vibrations in systems for fabricating electronics equipment. The system includes a processor programmed with a multi-input, multi-output control technique such as a linear quadratic Gaussian, H-infinity or mu synthesis. The actuator may comprise one or more plates or elements of electroactive material bonded to an electroded sheet.
대표청구항▼
1. A motion control system for use with a lithography system, said motion control system comprising:a wafer stage base;at least two actuators for controlling motion;at least two sensors for detecting at least one parameter of displacement of said wafer base and producing at least two signals in resp
1. A motion control system for use with a lithography system, said motion control system comprising:a wafer stage base;at least two actuators for controlling motion;at least two sensors for detecting at least one parameter of displacement of said wafer base and producing at least two signals in response thereto; andat least one circuit in electrical communication with said actuators and said sensors;wherein said circuit comprises a computer processor programmed with a multi-input, multi-output control technique selected from the following group of control techniques: linear quadratic Guassian, H-infinity and mu synthesis;wherein, upon the detection of said at least one parameter of displacement by said sensors, said sensors signal said circuit, which, in response, utilizing said control technique activates said actuators to stabilize the wafer stage base to minimize vibration. 2. The motion control system of claim 1, said actuators are selected from the group consisting of a voice coil motor and electroactive stack actuator. 3. The motion control system of claim 1, said sensors selected from the group consisting of LVDT, accelereometer, laser interferometer, capacitive displacement sensor. 4. The motion control system of claim 1, said circuit comprising a digital signal processor. 5. The motion control system of claim 1, said circuit comprising:at least one digital signal processor;at least one analog to digital converter, and;at least one digital to analog converter. 6. The motion control system of claim 1, wherein said actuators stabilize said wafer stage base closely follow a commanded input. 7. A motion control system for use with a lithography system, said motion control system comprising:a wafer stage base;at least two actuators for controlling motion;at least two sensors for detecting at least one parameter of displacement of said wafer base and producing at least two signals in response thereto;a signal conditioner; anda single board computer programmed with a multi-input, multi-output control technique selected from the following group of control techniques: linear quadratic Guassian, N-infinity and mu synthesis;wherein, upon the detection of said at least one parameter of displacement by said sensors, said sensors feed a signal to said signal conditioner, said signal conditioner feeds a signal to said single board computer, and said single board computer commands said actuators to command said wafer stage to track a commanded position. 8. The motion control system of claim 7, wherein said actuators are selected from the group consisting of voice coil motor and electroactive stack actuator. 9. The motion control system of claim 7, wherein said sensors are selected from the group consisting of LVDT, accelerometer, laser interferometer, capacitive displacement sensor. 10. The motion control system of claim 7, wherein said wafer stage is commanded to track a commanded position within 0.19 seconds.
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