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Hard surface cleaners containing chitosan and furanone 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C11D-001/00
  • C11D-003/26
  • C11D-003/24
  • C11D-003/43
출원번호 US-0035318 (2001-10-26)
발명자 / 주소
  • Wick, Roberta A.
  • Avery, Richard W.
  • Robb, Ian
출원인 / 주소
  • S.C. Johnson & Son, Inc.
인용정보 피인용 횟수 : 18  인용 특허 : 20

초록

Disclosed herein are acidic aqueous hard surface cleaners and methods for using them. The cleaners include a poly D-glucosamine such as chitosan and also a furanone. The cleaners provide residual benefits on the hard surface such as soil resistance and resistance to bacteria, molds and biofilms.

대표청구항

1. A hard surface cleaner having a pH below 6.0, comprising:a surfactant which is present in an amount not greater than 10% by weight;a poly D-glucosamine which is chitosan itself and which is present in an amount sufficient to facilitate antimicrobial activity of the cleaner in an amount less than

이 특허에 인용된 특허 (20)

  1. Linares Carlos G. (Cincinnati OH) Cilley William A. (Cincinnati OH), Acidic liquid detergent compositions for bathrooms.
  2. Steinberg Peter D.,AUX ; De Nys Peter C.,AUX, Antifouling compositions.
  3. Dyer David L., Antimicrobial nail coating composition.
  4. Garris John P., Aqueous acidic filter cleaning composition for removing organic biguanide deposits.
  5. Nelson John D. (Naugatuck CT), Chitosan pyrithione as antimicrobial agent useful in personal care products.
  6. Georg Meine DE; Brigitte Giesen DE; Kerstin Ziganke DE, Cleaning of fruit, vegetables, and meats comprising alkyl-polyglycoside.
  7. McAtee David Michael ; Nissing Nicholas James ; Hasenoehrl Erik John ; Cabell David William, Cleansing and conditioning article for skin or hair.
  8. Hasenoehrl Erik John ; McAtee David Michael, Cleansing and conditioning products for skin or hair with improved deposition of conditioning ingredients.
  9. Lourdes Dessus Albacarys ; David Michael McAtee ; George Endel Deckner, Cleansing articles for skin and/or hair which also deposit skin care actives.
  10. Rha ChoKyun (Boston MA) Pradipasena Pasawadee (Brookline MA) Nakamura TetsuHisa (Cambridge MA) Easson ; Jr. Donald D. (Cambridge MA) Sinskey Anthony J. (Boston MA), Compositions utilizing an exocellular polysaccharide isolated from Zoogloea ramigera.
  11. Franzke Michael,DEX ; Steinbrecht Karin,DEX ; Clausen Thomas,DEX ; Baecker Sabine,DEX ; Titze Jurgen,DEX, Cosmetic compositions for hair treatment containing dendrimers or dendrimer conjugates.
  12. Lang Gnther (Reinheim DEX) Konrad Eugen (Darmstadt DEX) Wendel Harald (Ober-Ramstadt DEX) Maresch Gerhard (Darmstadt DEX) Lenz Hans-Rudi (Darmstadt DEX), Cosmetic compostions based upon N-hydroxybutyl-chitosans, N-hydroxybutyl-chitosans as well as processes for the producti.
  13. Roenigk Karl F. (Hudson WI), Durable anti-microbial agent.
  14. Khan Mohammed A. (Sandy UT) Hoang Minh Q. (Taylorsville UT), Hand wipe solution.
  15. Avery Richard W.,GB2, Liquid hard surface cleaner comprising a monocarboxylate acid and an ampholytic surfactant having no carboxyl groups.
  16. Mitchell David C., Method and composition for inhibiting decomposition of aspartame.
  17. Lyon Keith R. ; Rock ; Jr. Michael M., Method for the manufacture of anti-microbial articles.
  18. Robinson Larry Richard, UV protection compositions.
  19. Roland De La Mettrie FR, Washing and conditioning compositions based on silicon and hydrophobic guar gum.
  20. Sebag Henri,FRX ; Decoster Sandrine,FRX, Washing and conditioning compositions containing silicone and dialkyl ether.

이 특허를 인용한 특허 (18)

  1. van Buskirk,Gregory; Garabedian,Aram; Hood,Ryan K.; Kong,Stephen Bradford, Acidic cleaning composition.
  2. van Buskirk, Gregory; Garabedian, Aram; Hood, Ryan K.; Kong, Stephen Bradford, Acidic cleaning compositions.
  3. van Buskirk,Gregory; Garabedian,Aram; Hood,Ryan K.; Kong,Stephen Bradford, Acidic cleaning compositions.
  4. Tasz,Maciej K.; Svoboda,George J., Combination air sanitizer, soft surface deodorizer/sanitizer and hard surface disinfectant.
  5. Theivendran, Sivarooban; Kubinec, James J.; Snelling, Jeff, Filter comprising a halogen release system and chitosan.
  6. Gaudreault, Rosemary, Hard surface cleaning composition.
  7. Gaudreault, Rosemary, Hard surface cleaning composition for personal contact areas.
  8. Simon,Richard E.; Cheng,Lily; DeLeeuw,David L., Low residue cleaning composition comprising lactic acid, nonionic surfactant and solvent mixture.
  9. Shimmin,Laura; Burciaga,Sonia H.; Hill,Bernard; Hood,Ryan K.; Kaaret,Thomas W.; Kilkenny,Andrew; Kong,Stephen Bradford, Low residue cleaning solution comprising a C8 to C10 alkylpolyglucoside and glycerol.
  10. Kong,Stephen Bradford; Burciaga,Sonia H., Low residue cleaning solution for disinfecting wipes comprising a C8-10 alkyl polyglycoside.
  11. Nishizawa,Hirotaka; Osawa,Kenji; Osako,Junichiro; Wada,Tamaki; Sugiyama,Michiaki; Totsuka,Takashi, Memory card.
  12. Gaudreault, Rosemary, Mold and mildew stain removing solution.
  13. Troost, Erik Herman; Brain, Joseph; Popplewell, Lewis Michael; Lee, Kaiping, Multi-compartment storage and delivery containers and delivery system for microencapsulated fragrances.
  14. Nguyen, Peter N.; Manderfield, Cary E.; Tasz, Maciej K., Odor elimination composition comprising triethylene glycol for use on soft surfaces.
  15. Nguyen, Peter N.; Manderfield, Cary E.; Tasz, Maciej K., Odor elimination composition for use on soft surfaces.
  16. Nguyen,Peter N.; Manderfield,Cary E.; Tasz,Maciej K., Odor elimination composition for use on soft surfaces.
  17. Gaudreault, Rosemary, Stain removing solution.
  18. Li, Jigui; Tarng, Ming-Ren, System and method for controlling the application of acid etchers or cleaners by means of color-changing dye.
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