초록 ▼

A closed loop pressure controller system that sets, measures and controls the process pressure within a semiconductor process is shown. The system is commonly composed of a pressure sensor to collect the pressure information, a controller box that hosts the control electronics, and a valve to physic

A closed loop pressure controller system that sets, measures and controls the process pressure within a semiconductor process is shown. The system is commonly composed of a pressure sensor to collect the pressure information, a controller box that hosts the control electronics, and a valve to physically affect the conductivity of the inlet or outlet gas line and accordingly the process pressure. The present invention differs from the prior art by using closed-loop motor control of the valve, rather than the method of the prior art, where the valve position is controlled by a stepper motor actuator driven in an open loop fashion. It is demonstrated that the utility of such prior art open-loop configurations is limited by the fact that the achievable precision of the valve position is hindered by static friction in the valve system, and the non-linear character of the torque versus shaft-angle of the motor (among other error components). The method of the present invention more accurately positions the valve, and accordingly enhances the overall precision and allowable loop-gain of the pressure control system by providing the valve drive with feedback as to the actual angular position of the valve in extremely high resolution.

대표청구항 ▼

1. A process for controlling the measure within a semiconductor processing chamber, comprising the steps of:first generating measure sensor signal responsive to the measure in said chamber;second generating a step command signal responsive to said measure sensor signal and a tool logic signal, said

1. A process for controlling the measure within a semiconductor processing chamber, comprising the steps of:first generating measure sensor signal responsive to the measure in said chamber;second generating a step command signal responsive to said measure sensor signal and a tool logic signal, said step command signal generating comprising applying a measure control algorithm to said pressure sensor and tool ionic signals;third generating a direction/speed command signal responsive to said step command signal and valve position feedback signal, said direction/speed command signal generating comprising applying a position control algorithm to said step command and valve position feedback signals;actuating said valve responsive to said direction/speed command signal, said actuating comprising moving said valve by operation of a motor drive assembly, said actuating resulting in said valve residing in a position, said valve in fluid communication with said chamber wherein said valve further comprises a valve stem; andsaid motor drive assembly comprises a motor drive and reduction gear mans, said reduction gear means operatively connected between said motor drive and said valve stem, wherein said motor drive assembly position comprises the rotational position of said reduction gear means;fourth generating another said valve position feedback signal responsive to said position of said valve, said valve position feedback signal comprising data representing the position of said motor drive assembly operatively connected to said valve;first generating said third generating, said actuating and said fourth generating steps until said motor drive assembly is positioned adequately; andsecond repeating said first and second generating and said first repeating steps until said pressure is controlled adequately.