Methods for hermetically sealing microchip reservoir devices
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B23K-001/06
B23K-026/00
출원번호
US-0184259
(2002-06-28)
발명자
/ 주소
Uhland, Scott A.
Polito, Benjamin F.
Herman, Stephen J.
Santini, Jr., John T.
Maloney, John M.
출원인 / 주소
MicroCHIPS, Inc.
대리인 / 주소
Sutherland Asbill & Brennan LLP
인용정보
피인용 횟수 :
184인용 특허 :
42
초록▼
Methods are provided for hermetically sealing the reservoirs of microchip devices and for hermetically sealing the substrate assemblies in a hermetic packaging structure. In one embodiment, the method comprises (1) providing a primary substrate having a front side and a back side, the substrate comp
Methods are provided for hermetically sealing the reservoirs of microchip devices and for hermetically sealing the substrate assemblies in a hermetic packaging structure. In one embodiment, the method comprises (1) providing a primary substrate having a front side and a back side, the substrate comprising a plurality of reservoirs positioned between the front side and the back side, each reservoir being loaded with molecules or a secondary device for controlled release or exposure, the reservoirs having at least one opening in need of sealing, the primary substrate including one or more hermetic sealing materials; (2) providing a hermetic sealing substrate having a surface composed of one or more hermetic sealing materials; (3) positioning the hermetic sealing substrate over the reservoir openings and contacting said hermetic sealing materials of the primary substrate with said hermetic sealing materials of the hermetic sealing substrate; and (4) applying energy or a mechanical force to the contacted sealing materials effective to form a hermetic seal between the hermetic sealing substrate and the primary substrate to hermetically seal the reservoir openings.
대표청구항▼
1. A method for hermetically sealing reservoirs of a microchip device, the method comprising:providing a primary substrate having a front side and a back side, the substrate comprising a plurality of reservoirs positioned between the front side and the back side, each reservoir being loaded with mol
1. A method for hermetically sealing reservoirs of a microchip device, the method comprising:providing a primary substrate having a front side and a back side, the substrate comprising a plurality of reservoirs positioned between the front side and the back side, each reservoir being loaded with molecules or a secondary device for controlled release or exposure, the reservoirs having at least one opening in need of sealing, the primary substrate including one or more hermetic sealing materials;providing a hermetic sealing substrate having a surface composed of one or more hermetic sealing materials;positioning the hermetic sealing substrate over the reservoir openings and contacting said hermetic sealing materials of the primary substrate with said hermetic sealing materials of the hermetic sealing substrate; andapplying energy to the contacted sealing materials effective to form a hermetic seal between the hermetic sealing substrate and the primary substrate to hermetically seal each of the reservoir openings. 2. The method of claim 1, wherein the energy is applied through a welding process. 3. The method of claim 2, wherein the welding process comprises ultrasonic welding. 4. The method of claim 2, wherein the welding process comprising laser welding. 5. The method of claim 1, wherein the energy is applied by heating to cause a reaction between the hermetic sealing materials of the primary substrate and the hermetic sealing materials of the hermetic sealing substrate. 6. A method for hermetically sealing reservoirs of a device, the method comprising:providing a primary substrate having a front side and a back side, the substrate comprising a plurality of reservoirs positioned between the front side and the back side, each reservoir being loaded with molecules or a secondary device for controlled release or exposure, the reservoirs having at least one opening in need of sealing, the primary substrate including one or more hermetic sealing materials;providing a hermetic sealing substrate having a surface composed of one or more hermetic sealing materials;positioning the hermetic sealing substrate over the reservoir openings and contacting said hermetic sealing materials of the primary substrate with said hermetic sealing materials of the hermetic sealing substrate; andapplying energy to the contacted sealing materials effective to form a hermetic seal between the hermetic sealing substrate and the primary substrate to hermetically seal the reservoir openings,wherein the energy is applied by heating to cause a eutectic reaction between the hermetic sealing materials of the primary substrate and the hermetic sealing materials of the hermetic sealing substrate. 7. The method of claim 6, wherein the eutectic reaction forms a eutectic bond comprising a eutectic composition selected from the group consisting of gold/silicon, gold/germanium, gold/tin, gold/indium, lead/tin, lead/indium, and platinum/silicon. 8. A method for hermetically sealing reservoirs of a device, the method comprising:providing a primary substrate having a front side and a back side, the substrate comprising a plurality of reservoirs positioned between the front side and the back side, each reservoir being loaded with molecules or a secondary device for controlled release or exposure, the reservoirs having at least one opening in need of sealing, the primary substrate including one or more hermetic sealing materials;providing a hermetic sealing substrate having a surface composed of one or more hermetic sealing materials;positioning the hermetic sealing substrate over the reservoir openings and contacting said hermetic sealing materials of the primary substrate with said hermetic sealing materials of the hermetic sealing substrate; andapplying energy to the contacted sealing materials effective to form a hermetic seal between the hermetic sealing substrate and the primary substrate to hermetically seal the reservoir openings,wherein the energy is applied by hea ting, which comprises resistive heating, to cause a reaction between the hermetic sealing materials of the primary substrate and the hermetic sealing materials of the hermetic sealing substrate. 9. A method for hermetically sealing reservoirs of a device, the method comprising:providing a primary substrate having a front side and an back side, the substrate comprising a plurality of reservoirs positioned between the front side and the back side, each reservoir being loaded with molecules or a secondary device for controlled release or exposure, the reservoirs having at least one opening in need of sealing, the primary substrate including one or more hermetic sealing materials;providing a hermetic sealing substrate having a surface composed of one or more hermetic sealing materials;positioning the hermetic sealing substrate over the reservoir openings and contacting said hermetic sealing materials of the primary substrate with said hermetic sealing materials of the hermetic sealing substrate; andapplying a mechanical force to the contacted sealing materials effective to form a hermetic seal between the hermetic sealing substrate and the primary substrate to hermetically seal the reservoir openings,wherein the hermetic sealing material of the hermetic sealing substrate comprises a metal gasket and the applied mechanical force is effective to deform the metal gasket so as to seal each reservoir opening. 10. The method of claim 9, further comprising tapered structures extending from the primary substrate surface and effective to concentrate the compressive forces at areas around the reservoir opening. 11. The method of claim 1, wherein the hermetic sealing substrate comprises a metal film or metal foil. 12. The method of claim 1, wherein the hermetic sealing materials of the primary substrate, of the sealing substrate, or both, comprise a silicate glass or silicon. 13. The method of claim 1, wherein the hermetic sealing materials of the primary substrate, of the sealing substrate, or both, comprise a metal selected from the group consisting of gold, platinum, titanium, palladium, tantalum, aluminum, and stainless steel. 14. The method of claim 1, wherein the primary substrate comprises a hermetic material selected from the group consisting of ceramics, metals, silicon, or glasses. 15. The method of claim 1, wherein, following formation of the hermetic seal, the hermetic sealing substrate is a reservoir cap which can selectively be disintegrated to release or expose the molecules or secondary device. 16. The method of claim 15, wherein the front side of the substrate comprises metal traces and the hermetic sealing substrate is welded onto the metal traces. 17. The method of claim 1, wherein the reservoir is closed, at the end distal the opening in need of sealing, by a reservoir cap which can selectively be disintegrated to release or expose the molecules or secondary device. 18. The method of claim 1, wherein the reservoirs contain drug molecules. 19. The method of claim 1, further comprising applying a protective coating material over the hermetic sealing substrate, on a surface distal the surface that contacts the hermetic sealing materials of the primary substrate, before or after the reservoirs are hermetically sealed. 20. A method of packaging a microchip device, comprising:providing a microchip device having a substrate, a plurality of reservoirs containing contents for release or exposure, and reservoir caps over the reservoir contents, wherein each reservoir is hermetically sealed;providing a hermetic packaging structure; andforming a hermetic seal between the substrate of the microchip device and one or more surfaces of the packaging structure, effective to encase the microchip device yet leave the reservoir caps exposed and operational. 21. The method of claim 20, wherein the forming step comprises laser welding, ultrasonic welding, or both. 22. A method of packaging a microchip device, comprising:providing a microchip d evice having a substrate, a plurality of reservoirs containing contents for release or exposure, and reservoir caps over the reservoir contents;providing a hermetic packaging structure; andforming a hermetic seal between the substrate of the microchip device and one or more surfaces of the packaging structure, effective to encase the microchip device yet leave the reservoir caps exposed and operational, wherein the forming step comprises electroplating a metal across an interface between a surface of the substrate and a surface of the packaging structure. 23. A method of packaging a microchip device, comprising:providing a microchip device having a substrate, a plurality of reservoirs containing contents for release or exposure, and reservoir caps over the reservoir contents;providing a hermetic packaging structure; and forming a hermetic seal between the substrate of the microchip device and one or more surfaces of the packaging structure, effective to encase the microchip device yet leave the reservoir caps exposed and operational, wherein the hermetic seal comprises a eutectic bond. 24. The method of claim 20, wherein the packaging structure comprises two metal pieces which are laser welded together after encasing the substrate between portions of the two pieces. 25. The method of claim 20, wherein the packaging structure further comprises power sources, control electronics, or a combination thereof, for powering disintegration of the reservoir caps, controlling the activation time of for disintegration of the reservoir caps, or both. 26. The method of claim 1, wherein the reservoirs each comprise a sensor or sensing component. 27. The method of claim 1, wherein the hermetic sealing materials of the primary substrate, of the sealing substrate, or both, comprise a metal or an alloy. 28. The method of claim 6, wherein the eutectic reaction forms a eutectic bond which includes a eutectic composition comprising indium or tin. 29. The method of claim 6, wherein the reservoirs each comprise a therapeutic or prophylactic agent. 30. The method of claim 6, wherein the reservoirs each comprise a sensor or sensing component. 31. The method of claim 9, wherein the reservoirs each comprise a therapeutic or prophylactic agent. 32. The method of claim 9, wherein the reservoirs each comprise a sensor or sensing component. 33. The method of claim 20, wherein the reservoirs contents comprise a therapeutic or prophylactic agent. 34. The method of claim 20, wherein the reservoirs contents comprise a sensor or sensing component. 35. The method of claim 28, wherein the eutectic bond includes a eutectic composition comprising indium or tin. 36. The method of claim 1, wherein the energy is applied to cause non-reactive fusion of the hermetic sealing material of the primary substrate with the hermetic sealing material of the hermetic sealing substrate. 37. The method of claim 8, wherein the resistive heating comprises use of a patterned resistor. 38. A method for hermetically sealing reservoirs of a device, the method comprising:providing a primary substrate having a front side and a back side, the primary substrate comprising a plurality of reservoirs positioned between the front side and the back side, the reservoirs having at least one opening in need of sealing, the primary substrate including one or more hermetic sealing materials;contacting the one or more hermetic sealing materials of the primary substrate to a glass layer of a multi-layer, secondary substrate, the glass layer having a plurality of apertures therethrough; andanodically bonding the glass layer to the one or more hermetic sealing materials of the primary substrate to form a hermetic seal between the primary substrate and the secondary substrate to hermetically seal the reservoir openings, wherein the apertures are in communication with the reservoirs. 39. The method of claim 38, wherein multi-layer, secondary substrate further comprises a patterned metal layer which is anodica lly or eutectically bonded to the glass layer on the side distal the primary substrate, the patterned metal layer having apertures in communication with the reservoirs and with the apertures in the glass layer. 40. The method of claim 39, wherein the multi-layer, secondary substrate further comprises a metal foil which is laser welded to the patterned metal layer on the side distal the glass layer, the metal sheet sealing the space defined by the reservoirs and apertures. 41. The method of claim 38, further comprising loading the reservoirs with reservoir contents for controlled release or exposure.
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