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A component having small holes, such as a silicon electrode plate having gas nozzles, used in a plasma processing apparatus is cleaned by producing a cavitation zone that extends through an entire depth of the holes so that deposited layers on the inner walls of the holes formed during the use in th

A component having small holes, such as a silicon electrode plate having gas nozzles, used in a plasma processing apparatus is cleaned by producing a cavitation zone that extends through an entire depth of the holes so that deposited layers on the inner walls of the holes formed during the use in the apparatus are removed. The cleaned component can subsequently be re-used in the apparatus, and the production cost and the consumption of natural resources are decreased.

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1. A method of cleaning an electrode plate used in a plasma processing apparatus, the electrode plate having a plurality of gas nozzles through which a process gas is supplied to a processing zone of the plasma processing apparatus, the gas nozzles passing through an entire thickness of the electrod

1. A method of cleaning an electrode plate used in a plasma processing apparatus, the electrode plate having a plurality of gas nozzles through which a process gas is supplied to a processing zone of the plasma processing apparatus, the gas nozzles passing through an entire thickness of the electrode plate, the method comprising:immersing the electrode plate in an cleaning agent; and removing deposited layers on inner walls of the gas nozzles formed when the electrode plate is used in the plasma processing apparatus, the removing including radiating ultrasonic waves toward a surface of the electrode plate having openings of the plurality of gas nozzles from an ultrasonic wave radiation surface of a horn connected to an ultrasonic vibrator, a power density of the ultrasonic waves defined by a ratio of an electric power input to the ultrasonic vibrator to an area of the ultrasonic wave radiation surface being not lower than 5 W/cm2, wherein a square of a wavelength of the ultrasonic wave in the cleaning agent is larger than the area of the radiation surface. 2. The method according to claim 1, wherein the electrode plate is a silicon electrode plate, and the power density is not lower than 8 W/cm2.3. The method according to claim 2, wherein the power density is not lower than 18 W/cm2.4. A method of cleaning an electrode plate used in a plasma processing apparatus, the electrode plate having a plurality of gas nozzles through which a process gas is supplied to a processing zone of the plasma processing apparatus, the gas nozzles passing through an entire thickness of the electrode plate, the method comprising:immersing the electrode plate in a cleaning agent; and removing deposited layers on inner walls of the gas nozzles formed when the electrode plate is used in the plasma processing apparatus, the removing including radiating ultrasonic waves toward a surface of the electrode plate having openings of the plurality of gas nozzles from an ultrasonic wave radiation surface of a horn connected to an ultrasonic vibrator, a power density of the ultrasonic waves defined by a ratio of an electric power input to the ultrasonic vibrator to an area of the ultrasonic wave radiation surface being not lower than 5 W/cm2, wherein said removing further includes removing residues of the deposited layers by blasting pellets to the residues that remain after said radiating. 5. The method according to claim 4, wherein the pellets are dry ice pellets.6. The method according to claim 4, wherein:the electrode plate is a silicon electrode plate; said radiating further removes, in addition to the deposited layers, intermediate layers between the inner walls of the gas nozzles and the deposited layers; and said blasting removes, in addition to the residues of the deposited layers, residues of the intermediate layers that remain after said radiating ultrasonic waves. 7. The method according to claim 4, wherein the electrode plate is a silicon electrode plate, and the power density is not lower than 8 W/cm2.8. The method to claim 7, wherein the power density is not lower than 18 W/cm2.9. A method of cleaning an electrode plate used in a plasma processing apparatus, the electrode plate having a plurality of gas nozzles through which a process gas is supplied to a processing zone of the plasma processing apparatus, the gas nozzles passing through an entire thickness of the electrode plate, the method comprising:immersing the electrode plate in an cleaning agent; and removing deposited layers on inner walls of the gas nozzles formed when the electrode plate is used in the plasma processing apparatus, the removing including producing a cavitation zone that extends through an entire depth of the gas nozzles. 10. The method according to claim 9, wherein the electrode plate is a silicon electrode plate.11. The method according to claim 9, wherein said removing further includes removing residues of the deposited layers by blasting pellets to the residues that remain after said producing of the cavitation zone.12. The method according to claim 11, wherein the pellets are dry ice pellets.13. The method according to claim 11, wherein:the electrode plate is a silicon electrode plate; said producing of the cavitation zone further removes, in addition to the deposited layers, intermediate layers formed between the inner walls of the gas nozzles and the deposited layers; and said blasting removes, in addition to the residues of the deposited layers, residues of the intermediate layers that remain after said producing of the cavitation zone. 14. A method of producing semiconductor devices, comprising:attaching an electrode plate in a plasma processing apparatus, the electrode plate having a plurality of gas nozzles through which a process gas is supplied to a processing zone of the plasma processing apparatus, the gas nozzles passing through an entire thickness of the electrode plate; processing a first plurality of semiconductor devices in the processing zone while forming deposited layers on inner walls of the gas nozzles; detaching the electrode plate from the plasma processing apparatus; cleaning the detached electrode plate, the cleaning comprising: immersing the detached electrode plate in a cleaning agent; and removing the deposited layers from inner walls of the gas nozzles, the removing including producing a cavitation zone extending through an entire depth of the gas nozzles; re-attaching the cleaned electrode plate to the plasma apparatus; and processing a second plurality of semiconductor devices in the plasma apparatus. 15. The method according to claim 14, wherein the electrode plate is a silicon electrode plate.16. The method according to claim 14, wherein a radio-frequency power is supplied to the electrode plate during the processing of the semiconductor devices.17. The method according to claim 14, wherein said producing of the cavitation zone includes radiating ultrasonic waves toward a surface of the electrode plate having openings of the gas nozzles from an ultrasonic wave radiation surface of a horn connected to an ultrasonic vibrator, a power density of the ultrasonic waves defined by a ratio of an electric power input to the ultrasonic vibrator to an area of the ultrasonic wave radiation surface is not lower than 5 W/cm2.18. The method according to claim 14, wherein said removing further includes removing residues of the deposited layers by blasting pellets to the residues that remain after said producing of the cavitation zone.19. The method according to claim 18, wherein the pellets are dry ice pellets.20. The method according to claim 18, wherein:the electrode plate is a silicon electrode plate; said producing of the cavitation zone further removes, in addition to the deposited layers, intermediate layers formed between the inner walls of the gas nozzles and the deposited layers; and said blasting removes, in addition to the residues of the deposited layers, residues of the intermediate layers that remain after said producing of the cavitation zone. 21. A method of cleaning a component used in a plasma processing apparatus, the component having a plurality of holes through which a process gas is supplied to a processing zone of the plasma processing apparatus, the holes passing through an entire thickness of the component, the method comprising:immersing the component in an cleaning agent; and removing deposited layers on inner walls of the holes formed when the component is used in the plasma processing apparatus, the removing including producing a cavitation zone that extends through an entire depth of the holes. 22. The method according to claim 21, wherein the component is exposed to plasma within the processing zone of the plasma processing apparatus when the component is used in the apparatus.23. The method according to claim 21, wherein the component is a silicon component.24. The method according to claim 21, wherein said producing of the cavitation zone includes radiating ultrasonic waves toward a surface of the component having openings of the plurality of holes from an ultrasonic radiation surface of a horn connected to an ultrasonic vibrator, a power density of the ultrasonic waves defined by a ratio of an electric power input to the ultrasonic vibrator to an area of the ultrasonic wave radiation surface is not lower than 5 W/cm2.25. The method according to claim 21, wherein said removing further includes removing residues of the deposited layers that remain after said producing of the cavitation zone by blasting pellets to the residues.26. The method according to claim 25, wherein the pellets are dry ice pellets.27. The method according to claim 25, wherein:the component is a silicon component; said producing of the cavitation zone further removes, in addition to the deposited layers, intermediate layers formed between the inner walls of the gas nozzles and the deposited layers; and said blasting removes, in addition to the residues of the deposited layers, residues of the intermediate layers that remain after said producing of the cavitation zone.