|국가/구분||United States(US) Patent 등록|
|미국특허분류(USC)||095/097; 095/113; 095/139; 096/125; 096/130; 096/144; 096/150|
|발명자 / 주소|
|출원인 / 주소|
|대리인 / 주소||
|인용정보||피인용 횟수 : 61 인용 특허 : 121|
The present disclosure relates to systems and processes for adsorptive gas separations where a first gas mixture including components A and B is to be separated so that a first product of the separation is enriched in component A, while component B is mixed with a third gas component C contained in a displacement purge stream to form a second gas mixture including components B and C, and with provision to prevent cross contamination of component C into the first product containing component A, or of component A into the second gas mixture containing comp...
1. A displacement purge gas separation process for separating a first component from a second component of a feed gas mixture where the second component is more readily adsorbed by an adsorbent material in a displacement purge gas separation apparatus having plural adsorbers, each adsorber having a flow path in contact with an adsorbent material between a first and a second end, the process comprising:supplying a feed gas mixture comprising at least the first component and the second component to the first end of the first adsorber; withdrawing a product...