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An examining system for imaging an object positionable in an object plane, includes an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the field, the field being displaceable in the plane of the object, a first deflecto

An examining system for imaging an object positionable in an object plane, includes an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the field, the field being displaceable in the plane of the object, a first deflector for providing a variable deflection field for guiding charged particles emerging from locations of a selectable region of the object through a fixed, predetermined beam cross-section, and a position-sensitive detector disposed in the beam path such that the charged particles, after having passed through the first deflector, impinge on the position-sensitive detector, wherein particles emerging from different locations of the region are imaged on different locations of the position-sensitive detector which are allocated to the locations of emergence.

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1. An examining system for imaging an object which is positionable in an object plane, comprising:an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the delimited field, the delimited field being displaceable in the pla

1. An examining system for imaging an object which is positionable in an object plane, comprising:an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the delimited field, the delimited field being displaceable in the plane of the object; a first deflector for providing a variable deflection field for guiding charged particles emerging from locations of a selectable region of the object; a position-sensitive detector disposed in a beam path such that the charged particles, after having passed through the first deflector impinge on the position-sensitive detector, wherein particles emerging from different locations of the selectable region of the object are imaged on different locations of the position-sensitive detector which are allocated to the locations of emergence; and a controller for controlling the illumination device to change the displacement of the delimited field and for controlling the first deflector such that the selectable region of the object imaged on the detector is displaced together with the illuminated field in the object plane. 2. The examining system according to claim 1, wherein the delimited field substantially coincides with the selectable region of the object imaged on the detector.3. The examining system according to claim 1, further comprising a first focusing lens device disposed between the object and a region of stationary beam cross-section for providing a deflection field which acts on the particles emerging from the locations of the selectable region of the object imaged on the detector like a focusing lens.4. The examining system according to claim 3, wherein the deflection field is variable and the controller is furthermore provided for controlling the first focusing lens device such that an optical axis of the focusing lens is displaceable transversely to the axial direction thereof.5. The examining system according to claim 4, wherein the controller is furthermore provided for controlling the first focusing lens device such that the optical axis thereof intersects the imaged region of the object substantially centrally irrespective of the displacement of the imaged region of the object.6. The examining system according to claim 3, wherein the first focusing lens device is a particle-optical focusing device for providing deflection fields having a focusing effect on a beam of charged particles, comprising:a plurality of aperture structures which are electrically insulated and spaced apart from one another in a direction (z) of the beam, each of said aperture structures comprising a region with a continuous opening for a free beam traversal, each of said openings having a length and a width, the length extending in a first direction (x) transverse to the beam direction and the width extending in a second direction (y) oriented transversely to the first direction and transversely to the beam direction, the length being larger than the width, and wherein at least one aperture structure disposed between two aperture structures positioned adjacent to each other in the beam direction is provided as a comb aperture structure which comprises on each side of the opening of the comb aperture structure, as seen in the first direction (x), a plurality of electrodes which are electrically insulated and disposed spaced apart from one another. 7. The examining system according to claim 6, wherein a first aperture structure which is different from the comb aperture structure comprises at least one electrode region extending in a region of the opening of the first aperture structure in the beam direction over a distance which is larger than 0.25 times the width of the opening of the first aperture structure in this region.8. The examining system according to claim 6, wherein a second aperture structure and a third aperture structure are provided which are each different from the comb aperture structure and which are disposed spaced apart from one another in the beam direction and directly adjacent to one another, each of said second and third aperture structures comprising at least one electrode region in a region of the openings of the second and third aperture structures, said electrode regions being disposed spaced apart from one another in the beam direction by a distance which is larger than 0.5 times a common width of the openings of the second and third aperture structures.9. The examining system according to claim 6, wherein the particle-optical focusing device further comprises a deflection field controller for applying electric potentials to multiple electrodes of the comb aperture structure such that the multiple electrodes produce approximately a quadrupole field, the axis of symmetry of which extending substantially in a beam direction within the opening of the comb aperture structure.10. The examining system according to claim 9, wherein the deflection field controller is provided to apply the electric potentials such that the axis of symmetry can be positioned at several selectable locations which are offset from each other in the first direction.11. The examining system according to claim 10, wherein the axis of symmetry is substantially continuously displaceable in the first direction (x).12. The examining system according to claim 9, wherein the deflection field controller is provided to adjust a mean electric potential of at least two aperture structures relative to each other.13. The examining system according to claim 9, wherein selectable electric potentials are supplyable to the electrodes of the comb aperture structure by means of the deflection field controller.14. The examining system according to claim 6, wherein the electrodes of the comb aperture structure have a dimension in the beam direction which is about 0.5 times to 1.5 times the width of the opening of the comb aperture structure in the region of the electrodes.15. The examining system according to claim 3, wherein the first focusing lens device is a particle-optical focusing device for providing deflection fields having a focusing effect on a beam of charged particles, comprising:a first aperture structure comprising a region with a continuous opening for a free beam traversal, said opening having a length and a width, the length extending in a first direction (x) transverse to the beam direction and the width extending in a second direction (y) oriented transversely to the first direction and transversely to the beam direction, the length being larger than the width; and a comb aperture structure electrically insulated and spaced apart from the first aperture structure in a direction (z) of the beam, the comb aperture structure comprising an opening, wherein the comb aperture structure comprises on each side of the opening of the comb aperture structure, as seen in the first direction (x), a plurality of electrodes which are electrically insulated and disposed spaced apart from one another. 16. The examining system according to claim 15, wherein the first aperture structure comprises at least one electrode region extending in a region of the opening of the first aperture structure in the beam direction over a distance which is larger than 0.25 times the width of the opening of the first aperture structure in this region.17. The examining system according to claim 15, wherein the particle-optical focusing device further comprises a deflection field controller for applying electric potentials to multiple electrodes of the comb aperture structure such that the multiple electrodes produce approximately a quadrupole field, the axis of symmetry of which extending substantially in a beam direction within the opening of the comb aperture structure.18. The examining system according to claim 17, wherein the deflection field controller is provided to apply the electric potentials such that the axis of symmetry can be positioned at several selectable locations which are offset from each other in the first direction.19. The examining system according to claim 18, wherein the axis of symmetry is substantially continuously displaceable in the first direction (x).20. The examining system according to claim 17, wherein the deflection field controller is provided to adjust a mean electric potential of the first aperture structure and the comb aperture structure relative to each other.21. The examining system according to claim 15, wherein the electrodes of the comb aperture structure have a dimension in the beam direction which is about 0.5 times to 1.5 times the width of the opening of the comb aperture structure in the region of the electrodes.22. The examining system according to claim 15, wherein selectable electric potentials are supplyable to the electrodes of the comb aperture structure by means of the deflection field controller.23. The examining system according to claim 1, wherein the illumination device comprises a photon source to illuminate the delimited field, wherein the charged particles emerging from the locations of the imaged region comprise photoelectrons generated by photons of the photon source.24. The examining system according to claim 23, further comprising a deflector having a movable mirror to displace the illuminated field by movement of the mirror.25. The examining system according to claim 1, wherein the illumination device comprises an electron source to illuminate the delimited field, and wherein the charged particles emerging from the locations of the imaged region of the object comprise at least one of secondary electrons, backscattering electrons and transmission electrons generated by electrons of the electron source.26. The examining system according to claim 25, wherein the illumination device comprises at least one aperture structure for at least one of shaping an illumination beam, illuminating the delimited field and adjusting a numerical aperture of the illumination device.27. The examining system according to claim 25, wherein the illumination device and the first deflector are disposed on opposite sides of the object plane and the illumination device comprises a second deflector to deflect the beam for displacing the delimited field, said second deflector being controllable by the controller.28. The examining system according to claim 25, wherein the illumination device and the first deflector are disposed on a same side relative to the object plane.29. The examining system according to claim 28, wherein a beam guiding device is provided to guide the electrons emitted by the electron source through a region of stationary beam cross-section towards the object, the electrons travelling towards the object also passing through the first deflector.30. The examining system according to claim 29, wherein, when passing through the first deflector, the electrons travelling towards the object have a higher kinetic energy than the electrons travelling from the object to the detector, and wherein the first deflector is provided such that the deflection field generated by the same provides substantially equal deflections (M) for the electrons travelling towards the object and the electrons travelling from the object to the detector.31. The examining system according to claim 30, wherein the first deflector comprises at least one region with an electric deflection field which is variable by the controller and a magnetic deflection field which is variable by the controller, with field directions of the electric deflection field and the magnetic deflection field as well as directions of movement of the electrons in this region being oriented in pairs substantially orthogonally to each other.32. The examining system according to claim 31, wherein the controller controls the first deflector such that in the at least one region the relationB=k·E is substantially fulfilled, wherein B is a field strength of the magnetic field in the region, E is a field strength of the electric field in the region, and k is a constant. 33. The examining system according to claim 1, wherein an imaging energy filter for the charged particles is provided in the beam path between a region of stationary beam cross-section and the detector.34. The examining system according to claim 1, wherein the first deflector comprises two deflection units configured to deflect charged particles through opposite deflection angles β and ?β.