[특허]Vacuum processing apparatus and operating method therefor

[미국특허] Vacuum processing apparatus and operating method therefor 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	F26B-013/30
출원번호	US-0796207 (2004-03-10)
우선권정보	JP-0225321 (1990-08-29)
발명자 / 주소	Kato, Shigekazu Nishihata, Kouji Tsubone, Tsunehiko Itou, Atsushi
출원인 / 주소	Hitachi, Ltd.
대리인 / 주소	Antonelli, Terry, Stout &
인용정보	피인용 횟수 : 1 인용 특허 : 49

초록 ▼

This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

대표청구항 ▼

1. A vacuum processing apparatus, comprising:a plurality of vacuum processing chambers for processing substrates; cassette mount tables in an atmosphere for mounting cassettes each storing a plurality of substrates to be processed or which have been processed; an atmospheric transfer device for transferring said substrates in the atmosphere being capable of moving at least vertically and of being controlled such that substrates to be processed can be taken out of any location in said cassettes mounted on said cassette mount tables; and control means (a) for transferring substrates to be processed from any location in any one of the cassettes mounted on the cassette mount tables in the atmosphere to at least one of the vacuum processing chambers via said atmospheric transfer device and (b) for transferring processed substrates from said vacuum processing chambers to respective original positions within original cassettes, in which the substrates were stored prior to processing, via said atmospheric transfer device. 2. A vacuum processing apparatus, comprising:a plurality of vacuum processing chambers for processing substrates; cassette mount tables in an atmosphere for mounting cassettes each storing a plurality of substrates to be processed or which have been processed; an atmospheric transfer device for transferring substrates in the atmosphere being capable of moving at least vertically and of being controlled such that substrates to be processed can be taken out of any location in said cassettes mounted on said cassette mount tables; and control means (a) for transferring substrates to be processed one by one from any location in any one of the cassettes mounted on the cassette mount tables in the atmosphere to at least one of the vacuum processing chambers via said atmospheric transfer device and (b) for transferring processed substrates from said vacuum processing chambers to respective original positions within original cassettes one by one, in which the substrates were stored prior to processing, via said atmospheric transfer device. 3. A vacuum processing apparatus, comprising:a plurality of vacuum processing chambers for processing substrates; a plurality of cassette mount tables in an atmosphere for mounting at least one cassette each storing at least one of substrates and at least one cassette storing at least one of dummy substrates; an atmospheric transfer device for transferring substrates and dummy substrates in the atmosphere, being capable of moving at least vertically and of being controlled such that substrates and dummy substrates can be taken out of any location in said cassettes mounted on said cassette mount tables; and a control means (a) for transferring substrates and dummy substrates from any location in any one of said cassettes mounted on the cassette mount tables in the atmosphere to at least one of the vacuum processing chambers via said atmospheric transfer device, and (b) for transferring said substrates and said dummy substrates from said vacuum processing chambers to respective original positions within original cassettes, in which the substrates and dummy substrates were stored prior to processing, via said atmospheric transfer device. 4. A vacuum processing apparatus, comprising:a plurality of vacuum processing chambers for processing substrates; a plurality of cassette mount tables in an atmosphere for mounting at least one cassette each storing at least one of substrates and at least one cassette storing at least one of dummy substrates; an atmospheric transfer device for transferring substrates and dummy substrates in the atmosphere, being capable of moving at least vertically and of being controlled such that substrates to be processed and dummy substrates can be taken out of any location in said cassettes mounted on said cassette mount tables; and control means (a) for transferring substrates and dummy substrates one by one from any location in any one of said cassettes mounted on the cassette mount tables in the atmosphere to at least one of the vacuum processing chambers via said atmospheric transfer device, and (b) for transferring said substrates and said dummy substrates from said vacuum processing chambers to respective original positions within original cassettes one by one, in which substrates were stored prior to processing, via said atmospheric transfer device.

이 특허에 인용된 특허 (49) 인용/피인용 타임라인 분석

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Miyata,Akira, Method and device for processing substrate.
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[미국특허] Vacuum processing apparatus and operating method therefor 원문보기

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