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A method of forming a strained-silicon-on-insulator substrate is disclosed. A target wafer includes an insulator layer on a substrate. A donor wafer includes a bulk semiconductor substrate having a lattice constant different from a lattice constant of silicon and a strained silicon layer formed on t

A method of forming a strained-silicon-on-insulator substrate is disclosed. A target wafer includes an insulator layer on a substrate. A donor wafer includes a bulk semiconductor substrate having a lattice constant different from a lattice constant of silicon and a strained silicon layer formed on the bulk semiconductor substrate. The top surface of the donor wafer is bonded to the top surface of the target wafer. The strained silicon layer is then separated from the donor wafer so that the strained silicon layer adheres to the target wafer. The bond between the strained silicon layer and the target wafer can then be strengthened.

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1. A method of forming a strained-silicon-on-insulator substrate comprising the steps of:providing a bulk semiconductor substrate, the bulk semiconductor substrate having a lattice constant different from a lattice constant of silicon; forming a strained silicon layer on the bulk semiconductor subst

1. A method of forming a strained-silicon-on-insulator substrate comprising the steps of:providing a bulk semiconductor substrate, the bulk semiconductor substrate having a lattice constant different from a lattice constant of silicon; forming a strained silicon layer on the bulk semiconductor substrate to form a donor wafer, the donor wafer having a top surface; implanting ions into the donor wafer to form an implanted layer; providing a target wafer comprising of an insulator layer overlying a substrate, the insulator layer comprising a high stress layer, the target wafer having a top surface; bonding the top surface of the donor wafer to the top surface of the target wafer; separating the strained silicon layer from the donor wafer, the strained silicon layer adhering to the target wafer; and strengthening the bond between the strained silicon layer and the target wafer. 2. The method of claim 1 wherein the insulator layer comprises a high stress layer that has a stress of more than 300 MPa.3. The method of claim 1 wherein the lattice constant of the bulk semiconductor substrate is larger than the lattice constant of silicon.4. The method of claim 3 wherein the bulk semiconductor substrate is a bulk silicon-germanium substrate.5. The method of claim 1 wherein the high stress layer is a nitrogen-containing layer.6. The method of claim 5 wherein the nitrogen-containing layer is selected from a group of consisting of silicon nitride, silicon oxynitride, silicon oxime, and any combinations thereof.7. The method of claim 5 wherein the nitrogen-containing layer comprises Si3N4.8. The method of claim 1 wherein the strained silicon layer is under tensile strain.9. The method of claim 8 wherein the tensile strain has a magnitude of between about 0.01% and about 4%.10. The method of claim 1 wherein the said lattice constant of the bulk semiconductor substrate is smaller than the lattice constant of silicon.11. The method of claim 10 wherein the bulk semiconductor substrate is a bulk silicon-germanium-carbon substrate.12. The method of claim 1 wherein the strained silicon layer is under compressive strain.13. The method of claim 12 wherein the compressive strain has a magnitude of between about 0.01% and about 4%.14. The method of claim 1 wherein the implanted ion species is selected from a group consisting of helium, neon, argon, krypton, xenon, and combinations thereof.15. The method of claim 1 wherein the insulator layer comprises silicon oxide.16. The method of claim 1 wherein the insulator layer has a thickness of between about 100 angstroms and about 5000 angstroms.17. The method of claim 1 wherein the target wafer substrate comprises a silicon substrate.18. The method of claim 1 wherein the donor wafer further comprises a dielectric layer on the strained silicon layer.19. The method of claim 18 wherein the dielectric layer is comprised of a material selected from a group consisting of silicon oxide, silicon nitride, silicon oxynitride, aluminum oxide and combinations thereof.20. The method of claim 18 wherein the dielectric layer is a high stress layer with a stress of more than 300 Mpa.21. The method of claim 1 wherein the bonding process comprises a beta-bonding process.22. The method of claim 1 wherein the separating process comprises a controlled cleaving process.23. The method of claim 1 wherein strengthening the bond comprises annealing the strained silicon layer and the target substrate.24. A method of forming a strained-silicon-on-insulator substrate comprising the steps of:providing a bulk semiconductor substrate, the bulk semiconductor substrate having a lattice constant different from a lattice constant of silicon; providing a strained silicon layer on the bulk semiconductor substrate to form a donor wafer, the donor wafer having a top surface and an interface between the strained silicon layer and the bulk semiconductor substrate; providing a target wafer comprising an insulator layer overlying a substrate, the insulator layer comprising a high stress layer and said target wafer having a top surface; bonding the top surface of the donor wafer to the top surface of the target wafer; separating the strained silicon layer from the donor wafer, the strained silicon layer adhering to the target wafer; and strengthening the bond between the strained silicon layer and the target wafer. 25. The method of claim 24 wherein the insulator layer comprises a high stress layer that has a stress of more than 300 MPa.26. The method of claim 24 wherein the said lattice constant of the bulk semiconductor substrate is larger than the lattice constant of silicon.27. The method of claim 26 wherein the bulk semiconductor substrate comprises a bulk silicon-germanium substrate.28. The method of claim 24 wherein the high stress layer comprises a nitrogen-containing layer.29. The method of claim 28 wherein the nitrogen-containing layer is selected from a group consisting of silicon nitride, silicon oxynitride, silicon oxime, and any combinations thereof.30. The method of claim 28 wherein the nitrogen-containing layer comprises Si3N4.31. The method of claim 24 wherein the strained silicon film is under tensile strain.32. The method of claim 31 wherein the tensile strain has a magnitude of between about 0.01% and about 4%.33. The method of claim 24 wherein the said lattice constant of the bulk semiconductor substrate is smaller than the lattice constant of silicon.34. The method of claim 33 wherein the bulk semiconductor substrate is a bulk silicon-germanium-carbon substrate.35. The method of claim 24 wherein the strained silicon film is under compressive strain.36. The method of claim 35 wherein the compressive strain has a magnitude of between about 0.01% and about 4%.37. The method of claim 24 wherein the insulator layer comprises of silicon oxide.38. The method of claim 24 wherein the insulator layer has a thickness of between about 100 angstroms and about 5000 angstroms.39. The method of claim 24 wherein the target wafer substrate comprises a silicon substrate.40. The method of claim 24 wherein the donor wafer further comprises a dielectric layer on the strained silicon layer.41. The method of claim 40 wherein the dielectric layer is comprised of a material selected from a group consisting of silicon oxide, silicon nitride, silicon oxynitride, aluminum oxide, and combinations thereof.42. The method of claim 40 wherein the dielectric layer is a high stress layer with a stress of more than 300 MPa.43. The method of claim 24 wherein said bonding process comprises a beta-bonding process.44. The method of claim 24 wherein said separating process comprises an atomic layer cleaving process.45. The method of claim 24 wherein said the bond between the semiconductor film and the target wafer is strengthened by annealing the hybrid wafer.46. A method of forming a strained-semiconductor-on-insulator semiconductor device, the method comprising:providing target wafer that includes a substrate with a high stress layer formed thereon; adhering a donor wafer to a surface of the target wafer, the donor wafer including a bulk substrate and a strained semiconductor layer disposed over the bulk substrate; and separating the strained semiconductor layer from the donor wafer, the strained semiconductor layer adhering to the target wafer. 47. The method of claim 46 wherein the strained semiconductor layer comprises a strained silicon layer.48. The method of claim 47 wherein the bulk substrate has a lattice constant different from the lattice constant of silicon.49. The method of claim 46 wherein providing a target wafer comprises proving a silicon wafer and wherein the high stress layer comprises a first oxide layer formed over the silicon wafer, a nitride layer formed over the first oxide layer and a second oxide layer formed over the nitride layer.50. The method of claim 46 wherein the high stress layer comprises an insulating layer.51. The method of claim 50 wherein the insulating layer comprises a nitrogen-containing layer.52. The method of claim 46 wherein the donor wafer comprises a doped region, wherein the strained semiconductor layer is separated from the donor wafer at the doped region.53. The method of claim 52 wherein the doped region comprises a hydrogen doped region.54. The method of claim 52 wherein the doped region comprises a region doped with a material selected from the group consisting of helium, neon, argon, krypton, xenon, and combinations thereof.55. The method of claim 46 and further comprising strengthening the bond between the strained semiconductor layer and the target wafer after adhering the strained semiconductor layer to the target wafer.56. The method of claim 55 wherein strengthening the bond comprises heating the strained semiconductor layer and the target wafer to a temperature greater than about 700° C.57. A method of forming a strained silicon on insulator (SSOI) device, the method comprising:providing a strained silicon layer between a first stressor layer and a second stressor layer, the first stressor layer adjacent a first surface of the strained silicon layer and the second stressor layer adjacent a second surface of the strained silicon layer, the second surface being opposed to the first surface; and removing the first stressor layer. 58. The method of claim 57 wherein the second stressor layer comprises a nitrogen-containing layer.59. The method of claim 58 wherein the nitrogen-containing layer is formed over an oxide layer, the oxide layer being formed over a substrate.60. The method of claim 57 wherein the first stressor layer comprises a silicon germanium layer.61. The method of claim 60 wherein the first stressor layer comprises a SiGeC layer.62. The method of claim 60 wherein the first stressor is a crystalline material.63. The method of claim 57 wherein providing a strained silicon layer between a first stressor layer and a second stressor layer comprises bonding a donor wafer to a target wafer, the donor wafer including the first stressor layer and the target layer comprising the second stressor layer and the strained silicon layer.64. The method of claim 57 wherein the first stressor layer abuts the first surface prior to removing.65. The method of claim 1 wherein the insulator layer comprises a first oxide layer formed over the substrate, a nitride layer formed on the first oxide layer and a second oxide layer formed on the nitride layer.66. The method of claim 1 wherein the implanted ion species comprises hydrogen.67. The method of claim 1 wherein providing target wafer comprising of an insulator layer overlying a substrate comprises:providing the substrate; and depositing a high stress film on the substrate. 68. The method of claim 67 wherein providing the substrate comprises providing a silicon substrate and wherein depositing a high stress film comprises depositing a silicon nitride film with high silicon content by plasma enhanced chemical vapor deposition.69. The method of claim 68 wherein depositing a silicon nitride film comprises using deposition conditions that include a high ratio of dichlorosilane to ammonia gas flow rates.70. The method of claim 67 wherein depositing a high stress film comprises depositing a silicon nitride film with a high nitrogen content.71. A method of forming a strained-semiconductor-on-insulator semiconductor device, the method comprising:providing target wafer that includes a substrate with a multi-layer insulator formed thereon, the multi-layer insulator comprising a first oxide layer formed over the substrate, a nitride layer formed over the first oxide layer and a second oxide layer formed over the nitride layer; adhering a donor wafer to a surface of the target wafer, the donor wafer including a bulk substrate and a strained semiconductor layer disposed over the bulk substrate; and separating the strained semiconductor layer from the donor wafer, the strained semiconductor layer adhering to the target wafer. 72. The method of claim 71 wherein the donor wafer comprises a doped region, wherein the strained semiconductor layer is separated from the donor wafer at the doped region and wherein the doped region comprises a hydrogen doped region.73. The method of claim 71 and further comprising strengthening the bond between the strained semiconductor layer and the target wafer after adhering the strained semiconductor layer to the target wafer, wherein strengthening the bond comprises heating the strained semiconductor layer and the target wafer to a temperature greater than about 700° C.74. A method of forming a strained-semiconductor-on-insulator semiconductor device, the method comprising:providing a target wafer that includes a substrate with an insulating layer formed thereon, the insulating layer comprising first oxide layer formed over the substrate, a nitride layer formed over the first oxide layer and a second oxide layer formed over the nitride layer; adhering a donor wafer to a surface of the target wafer, the donor wafer including a bulk substrate and a strained semiconductor layer disposed over the bulk substrate; and separating the strained semiconductor layer from the donor wafer, the strained semiconductor layer adhering to the target wafer. 75. The method of claim 74 wherein the strained semiconductor layer comprises a strained silicon layer.76. The method of claim 75 wherein the bulk substrate has a lattice constant different from the lattice constant of silicon.77. The method of claim 74 wherein the donor wafer comprises a doped region, wherein the strained semiconductor layer is separated from the donor wafer at the doped region.78. The method of claim 77 wherein the doped region comprises a hydrogen doped region.79. The method of claim 77 wherein the doped region comprises a region doped with a material selected from the group consisting of helium, neon, argon, krypton, xenon, and combinations thereof.80. The method of claim 74 and further comprising strengthening the bond between the strained semiconductor layer and the target wafer after adhering the strained semiconductor layer to the target wafer.81. The method of claim 80 wherein strengthening the bond comprises heating the strained semiconductor layer and the target wafer to a temperature greater than about 700° C.82. The method of claim 71 wherein the nitride layer comprises a high stress layer.83. The method of claim 74 wherein the nitride layer comprises a high stress layer.84. The method of claim 83 wherein the nitride layer has a stress of more than 300 MPa.