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Modular uniform gas distribution system in an ion source 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-007/24
출원번호 US-0896747 (2004-07-21)
발명자 / 주소
  • Siegfried, Daniel E.
  • Burtner, David Matthew
  • Townsend, Scott A.
  • Keem, John
  • Krivoruchko, Mark
  • Alexeyev, Valery
  • Zelenkov, Vsevolod
출원인 / 주소
  • Veeco Instruments, Inc.
대리인 / 주소
    Hensley, Kim &
인용정보 피인용 횟수 : 9  인용 특허 : 25

초록

A modular ion source design relies on relatively short modular anode layer source (ALS) components, which can be coupled together to form a longer ALS. For long ion sources, these shorter modular components allow for easier manufacturing and further result in a final assembly having better precision

대표청구항

1. A gas distribution system for an ion source having an anode, a cathode, and a source body forming a cavity containing the anode and supporting the cathode, the gas distribution system comprising:a plurality of gas distribution plate modules forming a modular gas distribution plate for supplying a

이 특허에 인용된 특허 (25)

  1. Kaufman Harold R., Closed drift ion source with improved magnetic field.
  2. Rudolph Hugo Petrmichl, Cold cathode ion beam deposition apparatus with segregated gas flow.
  3. Maishev Yuri,RUX ; Ritter James ; Velikov Leonid ; Shkolnik Alexander, Cold-cathode ion source with a controlled position of ion beam.
  4. Maishev Yuri,RUX ; Ritter James ; Terentiev Yuri,RUX ; Velikov Leonid, Cold-cathode ion source with propagation of ions in the electron drift plane.
  5. Maishev Yuri,RUX ; Ritter James ; Velikov Leonid ; Shkolnik Alexander, Combined ion-source and target-sputtering magnetron and a method for sputtering conductive and nonconductive materials.
  6. Ballance David S. ; Bierman Benjamin ; Tietz James V., Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween.
  7. Veerasamy, Vijayen S.; Petrmichl, Rudolph Hugo; Luten, Henry A., Ion beam source with coated electrode(s).
  8. Sainty, Wayne G, Ion source.
  9. Sainty, Wayne Gregory, Ion source.
  10. Viacheslav V. Zhurin ; Harold R. Kaufman ; James R. Kahn ; Kirk A. Thompson, Ion-assisted magnetron deposition.
  11. Maishev Yuri,RUX ; Ritter James ; Velikov Leonid ; Shkolnik Alexander, Ion-beam source with channeling sputterable targets and a method for channeled sputtering.
  12. Maishev Yuri,RUX ; Ritter James ; Velikov Leonid ; Shkolnik Alexander, Ion-beam source with uniform distribution of ion-current density on the surface of an object being treated.
  13. Maishev Yuri,RUX ; Ritter James ; Velikov Leonid ; Shkolnik Alexander, Ion-beam source with virtual anode.
  14. Maishev Yuri,RUX ; Ritter James ; Velikov Leonid, Method for combined treatment of an object with an ion beam and a magnetron plasma with a combined magnetron-plasma and ion-beam source.
  15. Veerasamy, Vijayen S.; Petrmichl, Rudolph Hugo, Method of ion beam milling a glass substrate prior to depositing a coating system thereon, and corresponding system for carrying out the same.
  16. Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl, Method of ion beam milling substrate prior to depositing diamond like carbon layer thereon.
  17. Kunio Sekiya JP; Hiroshi Sekiya JP, Method of making quality crepe paper.
  18. Thomsen, Scott V.; Petrmichl, Rudolph Hugo; Veerasamy, Vijayen S.; Longobardo, Anthony V.; Luten, Henry A.; Hall, Jr., David R., Method of manufacturing window using ion beam milling of glass substrate(s).
  19. Maishev Yuri,RUX ; Ritter James ; Terentiev Yuri,RUX ; Velikov Leonid ; Shkolnik Alexander, Multiple-beam ion-beam assembly.
  20. Maishev Yuri,RUX ; Ritter James ; Velikov Leonid ; Shkolnik Alexander, Multiple-cell source of uniform plasma.
  21. Lee Gil-Gwang (Seoul KRX) Fujihara Kazuyuki (Seoul KRX) Chang Kyu-hwan (Kyungki-do KRX), Showerhead for a gas supplying apparatus.
  22. Muller, K. Paul; Flietner, Bertrand; Roithner, Klaus, Spatially uniform gas supply and pump configuration for large wafer diameters.
  23. Voigt, Arnold W.; King, David Q.; De Grys, Kristi H.; Myers, Roger M., Uniform gas distribution in ion accelerators with closed electron drift.
  24. Maishev Yuri,RUX ; Ritter James ; Velikov Leonid, Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ion-emitting slit.
  25. Maishev Yuri,RUX ; Ritter James ; Velikuv Leonid, Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ionization gap.

이 특허를 인용한 특허 (9)

  1. Deakins, James D.; Hansen, Dennis J.; Mahoney, Leonard J.; Erguder, Tolga; Burtner, David M., Adaptive controller for ion source.
  2. Liu,Ping Chun; Hsiung,Ming Te; Liu,Ming Hsin; Shen,Tean Mu, Anode layer particle beam device.
  3. Rosenthal, Michael, Catheter including cutting element and energy emitting element.
  4. Simpson, John; Patel, Himanshu; Stine, Greg; Follmer, Brett; Rosenthal, Michael; Mehrdad, Farhangnia, Debulking catheters and methods.
  5. Gutkin, Michael; Bizyukov, Alexander; Sleptsov, Vladimir; Bizyukov, Ivan; Sereda, Konstantin, Focused anode layer ion source with converging and charge compensated beam (falcon).
  6. Simpson, John B.; Rosenthal, Michael H.; Patel, Himanshu; Venegas, Gautama B., Method and devices for cutting tissue.
  7. Simpson, John B.; Rosenthal, Michael H.; Patel, Himanshu; Venegas, Gautama B., Methods and devices for cutting tissue.
  8. Simpson, John B.; Rosenthal, Michael H.; Patel, Himanshu; Venegas, Gautama B., Methods and devices for cutting tissue.
  9. Rosenthal, Michael H.; Patel, Himanshu, Methods and devices for cutting tissue at a vascular location.
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