초록

An airtight processing apparatus comprises a chamber having a side wall and a bottom wall airtightly fixed to the side wall, and a bed supported inside the chamber by the side wall with a gap from the bottom wall.

대표청구항 ▼

1. An airtight processing apparatus comprising:a chamber having a side wall and a bottom wall airtightly fixed to the side wall; anda bed supported inside the chamber by the side wall with a gap from the bottom wall,wherein the side wall of the chamber has upper and lower side walls; andwherein the

1. An airtight processing apparatus comprising:a chamber having a side wall and a bottom wall airtightly fixed to the side wall; anda bed supported inside the chamber by the side wall with a gap from the bottom wall,wherein the side wall of the chamber has upper and lower side walls; andwherein the bed has an edge sandwiched between the upper and lower side walls, whereby the bed is supported by the side wall.2. An airtight processing apparatus according to claim 1, further comprising a sample holder placed on the bed; the sample holder being attachable/detachable to the bed.3. An airtight processing apparatus according to claim 1, wherein the bed has a plurality of holes.4. An airtight processing apparatus according to claim 1, wherein the bed is formed from pure iron.5. An airtight processing apparatus according to claim 1, wherein the bed has a plated surface.6. An airtight processing apparatus according to claim 1, further comprising a vacuum pump operative to evacuate the chamber.7. An electron beam processing apparatus comprising:the airtight processing apparatus according to claim 6; andan electron beam irradiating part that irradiates a sample with an electron beam.8. An electron beam processing apparatus according to claim 7, wherein the chamber has an upper wall with a through hole airtightly fixed to the side wall; andwherein the electron beam irradiating part is provided so as to be airtightly passed through the through hole and be slidable relative thereto.9. An electron beam processing apparatus according to claim 8, further comprising an irradiating part holder that holds the electron beam irradiating part, the irradiating part holder being provided so as to bridge an edge of the upper wall of the chamber and the electron beam irradiating part.10. An electron beam processing apparatus according to claim 7, further comprising a mask holder that holds a mask provided with a pattern to be transferred to the sample.11. An electron beam processing apparatus according to claim 10, wherein the electron beam processing apparatus is an electron beam proximity exposure apparatus.12. An airtight processing method comprising the steps of supporting a bed by a side wall of a chamber with a gap from a bottom wall of the chamber; holding a sample on the bed; and processing the sample within the chamber under reduced or increased pressure,wherein the bed partitions the chamber into first and second airtight rooms; andwherein the first and second airtight rooms are maintained at substantially the same pressure.13. An airtight processing apparatus according to claim 1, wherein the bed partitions the chamber into first and second airtight rooms.14. An airtight processing apparatus comprising:a chamber having a side wall and a bottom wall airtighty fixed to the side wall; anda bed supported inside the chamber by the side wall with a gap defined between the bottom wall and the bed,wherein the bed partitions the chamber into first and second airtight rooms.