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The thin film deposition system for depositing a thin film on the surface of substrates disposed in a sealed thin film deposition furnace comprises a measuring unit at a site communicating with the thin film deposition furnace, the measuring unit comprising a thin film deposition sample substrate fo

The thin film deposition system for depositing a thin film on the surface of substrates disposed in a sealed thin film deposition furnace comprises a measuring unit at a site communicating with the thin film deposition furnace, the measuring unit comprising a thin film deposition sample substrate for allowing a thin film substance flowing in from the thin film deposition furnace to adhere while X-ray incidence and extraction windows being provided on the side walls of the measuring unit, wherein X-ray is irradiated on the thin film deposition sample substrate in the measuring unit through the X-ray incidence window by means of a thin film measuring unit provided at the outside of the thin film deposition furnace, and the X-ray reflected from the thin film deposition sample substrate is sensed through the X-ray extraction window.

대표청구항 ▼

1. A thin film deposition system comprising:a sealed thin film deposition furnace having an X-ray permeable X-ray incidence window and X-ray extraction window; thin film substance generating means for generating thin film deposition particles of the thin film substance in the thin film deposition fu

1. A thin film deposition system comprising:a sealed thin film deposition furnace having an X-ray permeable X-ray incidence window and X-ray extraction window; thin film substance generating means for generating thin film deposition particles of the thin film substance in the thin film deposition furnace; substrate supporting means for supporting a thin film deposition substrate in the thin film deposition furnace at a position for allowing the thin film deposition particles of the thin film deposition substance generated from the thin film substance generating means to adhere on the surface of the substrate; a shield member facing the surface of the thin film deposition substrate supported in the thin film deposition furnace; a thin film deposition opening formed at a part of the shield member and for allowing a part of the thin film deposition substrate to expose so that the thin film deposition particles of the thin film deposition substance generated from the thin film substance generating means are adhered on the exposed part; a sample thin film deposition opening formed at another part of the shield member and for allowing another part of the thin film deposition substrate to expose so that the thin film deposition particles of the thin film deposition substance generated from the thin film substance generating means are adhered on the another exposed part; rotary drive means for relatively changing a part of the surface facing the sample thin film deposition opening by allowing the thin film deposition substrate to rotate; an X-ray irradiation unit disposed at the outside of the thin film deposition furnace and irradiating an X-ray through the X-ray incidence window and the sample thin film deposition opening toward a part of the surface of the thin film deposition substrate supported in the thin film deposition furnace; and an X-ray sensing unit disposed at the outside of the thin film deposition furnace and sensing the X-ray reflected from a part of the surface of the thin film deposition substrate through the sample thin film deposition opening and the X-ray extraction window, the X-ray irradiation unit comprising an X-ray source for emitting a divergent X-ray, and a curved monochromator for at least converting the divergent X-ray emitted from the X-ray source into a monochromatic X-ray and for allowing the monochromatic X-ray to converge on the thin film deposition surface of the thin film deposition sample substrate. 2. A thin film deposition system according to claim 1, wherein the rotary drive means allows the thin film deposition substrate to rotate for every each or plural processes for depositing each thin film layer formed on a part of the surface of the thin film deposition substrate through the thin film deposition opening, in order to change a part of the surface facing the opening for the sample thin film deposition substrate.3. A thin film deposition system according to claim 1 wherein, on the premise that the rocking curve is measured based on the data from the X-ray sensing unit using as a measuring object a thin him having a mixed crystal structure or superlattice structure formed on the surface of the thin film deposition substrate having a known Bragg's angle, the X-ray irradiation unit has a mean X-ray incident angle for allowing the X-ray to impinge on the thin film on the surface of the thin film deposition substrate with an angle set at around the known Bragg's angle.4. A thin film deposition system according to claim 1 wherein, on the premise that X-ray reflectivity is measured, the X-ray irradiation unit has an X-ray incident angle for allowing the X-ray to impinge on the thin film on the surface of the thin film deposition substrate with an angle set at a low angle range required for measuring X-ray reflectivity.5. A thin film deposition system according to claim 1, further comprising a control unit for controlling, by previously storing desired basic information for forming a thin film in the thin film deposition furnace, at least forming of the thin film and measurement of the thin film formed on the surface of the thin film deposition substrate based on the basic information.