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In a device for reducing the peak power of a pulsed laser light source, in particular for a projection exposure system, there is arranged in the beam path (1) at least one beam splitter apparatus (3, 4) by means of which a detour line (5 or 11) is produced, via reflecting components (6, 7, 8 or 12,

In a device for reducing the peak power of a pulsed laser light source, in particular for a projection exposure system, there is arranged in the beam path (1) at least one beam splitter apparatus (3, 4) by means of which a detour line (5 or 11) is produced, via reflecting components (6, 7, 8 or 12, 13, 14) for at least one partial beam (1b) with subsequent recombination at a beam recombining element (9 or 15) with the other partial beam or beams (1b or 10b) to form a total beam.

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What is claimed is: 1. A projection exposure system, having at least one beam splitter in a beam path of a pulsed laser light source said system having reflecting components splitting a principal beam for the passage of a partial beam on at least one detour line so that a beam recombining element j

What is claimed is: 1. A projection exposure system, having at least one beam splitter in a beam path of a pulsed laser light source said system having reflecting components splitting a principal beam for the passage of a partial beam on at least one detour line so that a beam recombining element joins the partial beam with the principal beam to form a total beam, said beam splitter having a mirror which is arranged at angle of from 35 to 50 degrees to the beam path, and having a phase-retarding plate in the beam path upstream of the beam-splitter. 2. The system as claimed in claim 1, wherein the detour line has a length such that an optical path difference of more than 0.5 m is produced between the partial beams. 3. The system as claimed in claim 1, wherein at least three reflecting components form a detour line. 4. The system as claimed in claim 1, wherein the reflecting components are constructed as mirrors. 5. The system as claimed in claim 1, wherein two detour lines are arranged in series in the beam path. 6. The system as claimed in claim 5, wherein a first detour line has a length of over 2 m, and a second detour line has a length of over 10 m. 7. The system as claimed in claim 1, wherein the beam recombining element is constructed such that a portion of the partial beam which has run via the detour line is repeatedly sent via the detour line. 8. The system as claimed in claim 1, wherein a 10 phase-retarding plate is arranged in the beam path upstream of the beam splitter, and at least one further phase-retarding plate is arranged in the detour line. 9. The system of claim 1 wherein the mirror is arranged at the Brewster angle to the beam path. 10. A projection exposure system, having at least one beam splitter in a beam path of a pulsed laser light source said system having reflecting components splitting a principal beam for the passage of a partial beam on at least one detour line so that a beam recombining element joins the partial beam with the principal beam to form a total beam, said beam splitter having a mirror which is arranged at an angle to the beam path, said detour line having an easily detuned keppler telescope positioned therein, said system further having a phase-retarding plate in the beam path upstream of the beam splitter. 11. The system as claimed in claim 10, wherein the detour line has a length such that an optical path difference of more than 0.5 m is produced between the partial beams. 12. The system as claimed in claim 10, wherein at least three reflecting components form a detour line. 13. The system as claimed in claim 10, wherein the angle is between 35 and 50째. 14. The system as claimed in claim 13, wherein the Brewster angle is provided as the angle. 15. The system as claimed in claim 10, wherein the reflecting components are constructed as mirrors. 16. The system as claimed in claim 10, wherein two detour lines are arranged in series in the beam path. 17. The system as claimed in claim 16, wherein a first detour line has a length of over 2 m, and a second detour line has a length of over 10 m. 18. The system as claimed in claim 10, wherein the beam recombining element is constructed such that a portion of the partial beam which has run via the detour line is repeatedly sent via the detour line. 19. The system as claimed in claim 10, wherein a 10 phase-retarding plate is arranged in the beam path upstream of the beam splitter, and at least one further phase-retarding plate is arranged in the detour line. 20. The system of claim 10 wherein the mirror is arranged at the Brewster angle to the beam path. 21. A projection exposure system, having at least one beam splitter in a beam path of a pulsed laser light source said system having reflecting components splitting a principal beam for the passage of a partial beam on at least one detour line so that a beam recombining element joins the partial beam with the principal beam to form a total beam, said beam splitter having a mirror which is arranged at an angle of from 35째 to 50째 to the beam path, said detour line having an easily detuned keppler telescope positioned therein, and said systemn having a phase-retarding plate in the beam path upstream of the beam splitter. 22. The system as claimed in claim 21, wherein the detour line has a length such that an optical path difference of more than 0.5 m is produced between the partial beams. 23. The system as claimed in claim 21, wherein at least three reflecting components form a detour line. 24. The system as claimed in claim 21, wherein the reflecting components are constructed as mirrors. 25. The system as claimed in claim 21, wherein two detour lines are arranged in series in the beam path. 26. The system as claimed in claim 25, wherein a first detour line has a length of over 2 m, and a second detour line has a length of over 10 m. 27. The system as claimed in claim 25, wherein the beam recombining element is constructed such that a portion of the partial beam which has run via the detour line is repeatedly sent via the detour line. 28. The system as claimed in claim 21, wherein a 10 phase-retarding plate is arranged in the beam path upstream of the beam splitter, and at least one further phase-retarding plate is arranged in the detour line. 29. The system of claim 21 wherein the mirror is arranged at the Brewster angle to the beam path. 30. A projection exposure system, having at least one beam splitter in a beam path of a pulsed laser light source said system having reflecting components splitting a principal beam for the passage of a partial beam on at least one detour line so that a beam recombining element joins the partial beam with the principal beam to form a total beam, said beam splitter having a mirror which is arranged at an angle of from 35째 to 50째 to the beam path, said detour line having an easily detuned keppler telescope positioned therein, and of such a length that an optical path difference of more than 0.5 m. is produced between the partial beams, and having a phase-retarding plate in the beam path upstream of the beam splitter. 31. The system as claimed in claim 30, wherein at least three reflecting components form a detour line. 32. The system as claimed in claim 30, wherein the reflecting components are constructed as mirrors. 33. The system as claimed in claim 30, wherein two detour lines are arranged in series in the beam path. 34. The system as claimed in claim 30, wherein a first detour line has a length of over 2 m, and a second detour line has a length of over 10 m. 35. The system as claimed in claim 30, wherein the beam recombining element is constructed such that a portion of the partial beam which has run via the detour line is repeatedly sent via the detour line. 36. The system as claimed in claim 30, wherein a 10 phase-retarding plate is arranged in the beam path upstream of the beam splitter, and at least one further phase-retarding plate is arranged in the detour line. 37. The system of claim 30 wherein the mirror is arranged at the Brewster angle to the beam path. 38. A projection exposure system, having at least one beam splitter in a beam path of a pulsed laser light source said system having reflecting components splitting a principal beam for the passage of a partial beam on a first detour line having a length of over 2 m and a second detour line having a length of over 10 m, so that a beam recombining element joins the partial beam with the principal beam to form a total beam, said beam splitter having a mirror which is arranged at an angle of from 35째 to 50째 to the beam path, and having a phase-retarding plate in the beam path upstream of the beam splitter. 39. The system of claim 38 wherein the mirror is arranged at the Brewster angle to the beam path. 40. The system as claimed in claim 38, wherein the detour line has a length such that an optical path difference of more than 0.5 m is produced between the partial beams. 41. The system as claimed in claim 38, wherein at least three reflecting components form a detour line. 42. The system as claimed in claim 38, wherein the reflecting components are constructed as mirrors. 43. The system as claimed in claim 38, wherein the beam recombining element is constructed such that a portion of the partial beam which has run via the detour line is repeatedly sent via the detour line. 44. The system as claimed in claim 38, wherein a 10 phase-retarding plate is arranged in the beam path upstream of the beam splitter, and at least one further phase-retarding plate is arranged in the detour line.