초록 ▼

A PVD method and a PVD apparatus use a rotating magnetic field in order to increase the yield. The magnetic field is provided such that it essentially vanishes, at least in a time average, outside a rotation axis of the magnetic field in sectors of the target region of the PVD apparatus. In this man

A PVD method and a PVD apparatus use a rotating magnetic field in order to increase the yield. The magnetic field is provided such that it essentially vanishes, at least in a time average, outside a rotation axis of the magnetic field in sectors of the target region of the PVD apparatus. In this manner the PVD method and the PVD apparatus achieve a uniform coating.

대표청구항 ▼

We claim: 1. A method for physical vapor deposition, the method which comprises: providing a target region and a substrate region disposed in a process region; providing an electric field between the target region and the substrate region and using the electric field for partially ionizing process

We claim: 1. A method for physical vapor deposition, the method which comprises: providing a target region and a substrate region disposed in a process region; providing an electric field between the target region and the substrate region and using the electric field for partially ionizing process gas constituents in the process region, accelerating ionized process gas constituents toward the target region, ejecting target constituents by using process gas constituents and partially depositing ejected target constituents on the substrate region; generating a magnetic field substantially vanishing in one of given regions and given sectors of at least one of the target region and the substrate region at least when averaged over time and rotating the magnetic field about a rotation axis; generating the magnetic field such that the magnetic field substantially vanishes outside the rotation axis in one of given regions and given sectors of at least one of the target region and the substrate region at least when averaged over time; using, as the magnetic field, a combination of at least a first magnetic field component and at least a second magnetic field component such that the first and second magnetic field components are one of directly oppositely polarized or directly oppositely directed with respect to one another but otherwise are substantially identical; and one of generating or providing the first and second magnetic field components temporally separately with respect to one another. 2. The method according to claim 1, which comprises using, as the rotation axis, an axis extending through the target region and the substrate region such that the axis connects the target region and the substrate region to one another. 3. The method according to claim 1, which comprises using, as the rotation axis, a symmetry axis extending through the target region and the substrate region such that the symmetry axis connects the target region and the substrate region to one another. 4. The method according to claim 1, which comprises one of generating and using the first and second magnetic field components simultaneously. 5. The method according to claim 1, which comprises one of generating and providing the first and second magnetic field components diametrically oppositely with regard to the rotation axis and antisymmetrically with respect to one another. 6. The method according to claim 1, which comprises choosing first and second time periods for one of a separate use and a separate generation of the first and second magnetic field components such that the first and second time periods are individually substantially identical to one another. 7. The method according to claim 1, which comprises choosing first and second time periods of one of a separate use and a separate generation of the first and second magnetic field components such that respective sums of the first and second time periods are substantially identical to one another. 8. The method according to claim 1, which comprises generating one of the second and first magnetic field component from one of the first and second magnetic field component, respectively, by performing, with a respective magnetic field device, an action selected from the group consisting of a polarity reversal, a rotation and a positioning of the magnetic field device. 9. A PVD apparatus, comprising: a target region and a substrate region disposed spatially separated from one another in a process region containing a process gas and with an electric field to be generated between said target region and said substrate region; a magnetic field device configured to generate a magnetic field at least at one of said target region and said substrate region such that the magnetic field substantially vanishes in one of given regions and given sectors of at least one of said target region and said substrate region at least when averaged over time and such that the magnetic field rotates about a rotation axis; said magnetic field device generating the magnetic field such that the magnetic field substantially vanishes outside the rotation axis in at least one of the given regions and the given sectors of at least one of said target region and said substrate region at least when averaged over time; said magnetic field device being a single magnetic device having a body axis; and said magnetic device being configured to be one of moved or rotated about the body axis of said magnetic device at least between a first position and a second position and said magnetic device being configured to generate, in the first position, substantially a first magnetic field component and, in the second position, substantially a second magnetic field component such that the first and second magnetic field components are one of directly oppositely oriented with respect to one another or directly oppositely polarized with respect to one another. 10. The PVD apparatus according to claim 9, wherein the rotation axis extends through said target region and said substrate region such that the rotation axis connects said target region and said substrate region to one another. 11. The PVD apparatus according to claim 9, wherein the rotation axis is a symmetry axis extending through said target region and said substrate region such that the symmetry axis connects said target region and said substrate region to one another. 12. The PVD apparatus according to claim 9, wherein said magnetic field device is configured to generate at least a first magnetic field component and at least a second magnetic field component such that the first and second magnetic field components are one of directly oppositely polarized and directly oppositely directed with respect to one another but otherwise are substantially identical. 13. The PVD apparatus according to claim 9, wherein said magnetic field device is rotatable about the rotation axis. 14. The PVD apparatus according to claim 9, wherein said magnetic field device is rotatable about the rotation axis and disposed above said target region outside said process region. 15. The PVD apparatus according to claim 9, wherein the body axis of said magnetic device is one of parallel and perpendicular to the rotation axis. 16. The PVD apparatus according to claim 9, wherein said magnetic field device is configured to be displaceable in a direction of the rotation axis of the magnetic field. 17. The PVD apparatus according to claim 9, wherein said magnetic field device includes at least one permanent magnet. 18. The PVD apparatus according to claim 9, wherein said magnetic field device includes at least one current-carrying conductor. 19. The PVD apparatus according to claim 9, wherein said magnetic field device includes at least one current-carrying coil. 20. The PVD apparatus according to claim 9, wherein said magnetic field device includes at least one of conductors and coils configured to carry electrical currents in a controlled manner and independently of one another. 21. The PVD apparatus according to claim 20, wherein at least one of said conductors and said coils generate a rotating magnetic field having a controllable orientation. 22. A PVD apparatus, comprising: a target region and a substrate region disposed spatially separated from one another in a process region containing a process gas and with an electric field to be generated between said target region and said substrate region; a magnetic field device configured to generate a magnetic field at least at one of said target region and said substrate region such that the magnetic field substantially vanishes in one of given regions and given sectors of at least one of said target region and said substrate region at least when averaged over time and such that the magnetic field rotates about a rotation axis; said magnetic field device generating the magnetic field such that the magnetic field substantially vanishes outside the rotation axis in at least one of the given regions and the given sectors of at least one of said target region and said substrate region at least when averaged over time; said magnetic field device including at least one first magnetic field device and at least one second magnetic field device; and said magnetic device being configured to be one of moved or rotated about the body axis of said magnetic device at least between a first position and a second position and said magnetic device being configured to generate, in the first position, substantially a first magnetic field component and, in the second position, substantially a second magnetic field component such that the first and second magnetic field components are one of directly oppositely oriented with respect to one another or directly oppositely polarized with respect to one another. 23. The PVD apparatus according to claim 22, wherein said first and second magnetic field devices are configured such that they are oppositely polarized. 24. The PVD apparatus according to claim 22, wherein said first and second magnetic field devices are positioned such that they are oppositely polarized. 25. The PVD apparatus according to claim 22, wherein said first and second magnetic field devices are disposed diametrically oppositely with regard to the rotation axis. 26. The PVD apparatus according to claim 22, wherein said first and second magnetic field devices are configured to be displaceable in a direction of the rotation axis of the magnetic field. 27. A PVD apparatus, comprising: a target region and a substrate region disposed spatially separated from one another in a process region containing a process gas and with an electric field to be generated between said target region and said substrate region; a magnetic field device configured to generate a magnetic field at least at one of said target region or said substrate region such that the magnetic field substantially vanishes in one of given regions or given sectors of at least one of said target region or said substrate region at least when averaged over time and such that the magnetic field rotates about a rotation axis; said magnetic field device generating the magnetic field such that the magnetic field substantially vanishes outside the rotation axis in at least one of the given regions or the given sectors of at least one of said target region or said substrate region at least when averaged over time; and said magnetic field device having a magnetic field shielding device for shielding the magnetic field. 28. The PVD apparatus according to claim 27, wherein the magnetic field shielding device includes a material of high magnetic permeability. 29. A PVD apparatus, comprising: a target region and a substrate region disposed spatially separated from one another in a process region containing a process gas and with an electric field to be generated between said target region and said substrate region; a magnetic field device configured to generate a magnetic field at least at one of said target region or said substrate region such that the magnetic field substantially vanishes in one of given regions or given sectors of at least one of said target region or said substrate region at least when averaged over time and such that the magnetic field rotates about a rotation axis; said magnetic field device generating the magnetic field such that the magnetic field substantially vanishes outside the rotation axis in at least one of the given regions or the given sectors of at least one of said target region or said substrate region at least when averaged over time; said magnetic field device including at least one first magnetic field device and at least one second magnetic field device; and said first and second magnetic field devices having respective magnetic field shielding devices for shielding one of respective magnetic fields or respective magnetic field components from said target region. 30. A PVD apparatus, comprising: a target region and a substrate region disposed spatially separated from one another in a process region containing a process gas and with an electric field to be generated between said target region and said substrate region; a magnetic field device configured to generate a magnetic field at least at one of said target region or said substrate region such that the magnetic field substantially vanishes in one of given regions or given sectors of at least one of said target region or said substrate region at least when averaged over time and such that the magnetic field rotates about a rotation axis; said magnetic field device generating the magnetic field such that the magnetic field substantially vanishes outside the rotation axis in at least one of the given regions or the given sectors of at least one of said target region or said substrate region at least when averaged over time; said magnetic field device being configured to be displaceable in a direction of the rotation axis of the magnetic field between a first position relatively closer to said target region and a second position relatively more remote from said target region.