$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24C-007/00
출원번호 US-0045685 (2005-01-28)
발명자 / 주소
  • Tannous,Adel George
  • Makhamreh,Khalid
출원인 / 주소
  • Manoclean Technologies, Inc.
대리인 / 주소
    Loudermilk &
인용정보 피인용 횟수 : 2  인용 특허 : 84

초록

A method for manufacturing an article having polymeric residue that is to be removed during the manufacture of the article is disclosed. The article is introduced into a controlled environment of a processing tool having one or more processing chambers. Free radicals are generated from one or more r

대표청구항

What is claimed is: 1. A method for manufacturing an article, the article having polymeric residue that is to be removed during the manufacture of the article, comprising the steps of: introducing the article into a controlled environment of a processing tool, the processing tool having one or more

이 특허에 인용된 특허 (84)

  1. Hashish Mohamed (Kent WA) Marvin Mark (Tacoma WA), Abrasive swivel assembly and method.
  2. Narayanswami Natraj ; Wagener Thomas J. ; Siefering Kevin L. ; Cavaliere William A., Aerodynamic aerosol chamber.
  3. Rose Peter H. ; Sferlazzo Piero ; van der Heide Robert G., Aerosol surface processing.
  4. Rose Peter H. ; Sferlazzo Piero ; van der Heide Robert G., Aerosol surface processing.
  5. Kosic Thomas J., Apparatus and method for cleaning large glass plates using linear arrays of carbon dioxide (CO.sub.2) jet spray nozzles.
  6. Ogawa Mitsuhiro (Yao JPX) Ouno Toshiki (Fukuoka JPX) Ejima Taizou (Fukuoka JPX) Kotou Satoru (Amagasaki JPX), Apparatus and method for cleaning semiconductor wafers.
  7. Whitlock Walter H. (Peapack NJ) Weltmer ; Jr. William R. (Murray Hill NJ) Clark James D. (Mountainside NJ), Apparatus and method for removing minute particles from a substrate.
  8. Brandt Werner V. ; Bowers Charles W., Apparatus for cleaning and testing precision components of hard drives and the like.
  9. Lewis, Paul E.; Ahmadi, Goodarz; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Apparatus for cleaning surfaces substantially free of contaminants.
  10. Yie Gene G., Apparatus for generating oscillating fluid jets.
  11. Shepherd John D., Apparatus for rapid repetitive motion of an ultra high pressure liquid stream.
  12. Layden Lawrence M. (Stanton NJ), Apparatus for removing small particles from a substrate.
  13. McDermott Wayne T. (Allentown PA) Wu Jin J. (Ossining NY) Ockovic Richard C. (Northampton PA), Apparatus to clean solid surfaces using a cryogenic aerosol.
  14. Boitnott Charles A. ; Shepherd ; Jr. Robert A., Backside etch process chamber and method.
  15. Goddin ; Jr. Clifton S. (Tulsa OK) Turek Edward A. (Tulsa OK) George Boyd A. (Lisle IL), CO2 Removal from high CO2 content hydrocarbon containing streams.
  16. Goenka Lakhi N. (Ann Arbor MI), CO2 nozzle and method for cleaning pressure-sensitive surfaces.
  17. Romack Timothy J. ; McClain James B. ; Stewart Gina M. ; Givens Ramone D., Carbon dioxide cleaning and separation systems.
  18. Kotani Hiroyuki,JPX ; Urai Naoki,JPX ; Akaki Tetsuji,JPX ; Ueno Tamotsu,JPX, Carbon dioxide gas laser oscillation apparatus.
  19. Kosic Thomas J., Carbon dioxide jet spray disk cleaning system.
  20. Krone-Schmidt Wilfried, Carbon dioxide jet spray pallet cleaning system.
  21. Brandt Elwood Steven ; Simpson Brian A., Carbon dioxide jet spray polishing of metal surfaces.
  22. Borden Michael R. ; Kosic Thomas J., Carbon dioxide liquid and gas sensor apparatus for use with jet spray cleaning systems.
  23. Henzler Gregory W. (Naperville IL), Carbon dioxide pellet blast and carrier gas system.
  24. Xu Han ; Bersin Richard L., Cleaning and stripping of photoresist from surfaces of semiconductor wafers.
  25. Kanno Itaru (Itami City JPX) Fukumoto Takaaki (Itami City JPX) Ohmori Toshiaki (Itami City JPX), Cleaning device using fine frozen particles.
  26. Goffnett David M. (Alma MI) Richardson Mark D. (Hemlock MI) Bielby Eugene F. (Saginaw MI), Cleaning of CVD reactor used in the production of polycrystalline silicon by impacting with carbon dioxide pellets.
  27. Treiber John H. (Huntington Beach CA), Closed-loop multistage system for cleaning printed circuit boards.
  28. Nakayama Izumi ; Masuda Yukio ; Bersin Richard L. ; Xu Han ; Geng Quain, Cold processes for cleaning and stripping photoresist from surfaces of semiconductor wafers.
  29. Baumgart Jurgen (Huntingdon Beach CA), Continuous deflashing apparatus for molded articles.
  30. Bowers Charles W., Electrostatic discharge protection of static sensitive devices cleaned with carbon dioxide spray.
  31. Matossian Jesse N. ; Williams John D. ; Krone-Schmidt Wilfried, Heat treatment by plasma electron heating and solid/gas jet cooling.
  32. Zito Richard R., High dispersion carbon dioxide snow apparatus.
  33. Bowers Charles W., Integrated circuit chip module cleaning using a carbon dioxide jet spray.
  34. Chao Sidney C. ; Purer Edna M. ; Sorbo Nelson W., Liquid carbon dioxide cleaning using jet edge sonic whistles at low temperature.
  35. Townsend Carl W. (Los Angeles CA) Purer Edna M. (Los Angeles CA), Liquid carbon dioxide dry cleaning system having a hydraulically powered basket.
  36. Cotte, John Michael; Goldfarb, Dario L.; Jones, Pamela; McCullough, Kenneth John; Moreau, Wayne Martin; Pope, Keith R.; Simons, John P.; Taft, Charles J., Liquid or supercritical carbon dioxide composition.
  37. Aronowitz Sheldon ; Sukharev Valeriy ; Zubkov Vladimir, Low dielectric constant multiple carbon-containing silicon oxide dielectric material for use in integrated circuit structures, and method of making same.
  38. Jon Min-Chung (Princeton Junction NJ) Nicholl Hugh (Berthoud CO) Read Peter Hartpence (Morrisville PA), Method and apparatus for CO2 cleaning with mitigated ESD.
  39. Gasparrini Charles R. (Portchester NY), Method and apparatus for carbon dioxide cleaning of graphic arts equipment.
  40. Bjornard Erik J. (Northfield MN) Kurman Eric W. (Northfield MN) Shogren David A. (Lakeville MN) Hoffman Jeffrey J. (Inver Grove Heights MN), Method and apparatus for cleaning substrates in preparation for deposition of thin film coatings.
  41. Bingham Dennis N. (Idaho Falls ID), Method and apparatus for cutting and abrading with sublimable particles.
  42. Bingham Dennis N. ; Swainston Richard C. ; Palmer Gary L., Method and apparatus for cutting, abrading, and drilling with sublimable particles and vaporous liquids.
  43. Neese Edward D. ; Kullen Peter S. ; Valentine Eugene, Method and apparatus for removing coatings and oxides from substrates.
  44. Jepsen Erik Lund,DKX, Method and apparatus for the cleaning of closed compartments.
  45. Sneed John D. (Long Beach CA) Krone-Schmidt Wilfried (Fullerton CA) Slattery Michael J. (Gardena CA) Bowen Howard S. (Los Angeles CA), Method for cleaning surface by heating and a stream of snow.
  46. Lloyd Daniel L. (Mason OH), Method for removal of surface coatings.
  47. Smith ; Jr. Charles W. (Fairview PA) Rosio Larry R. (Fairview PA) Shore Stephen H. (Erie PA), Method of cleaning workpiece with solvent and then with liquid carbon dioxide.
  48. Goenka Lakhi Nandlal, Method of mitigating electrostatic charge during cleaning of electronic circuit boards.
  49. Powell Gary B. (Petaluma CA), Method of plasma etching with parallel plate reactor having a grid.
  50. Douglas Monte A. (Coppell TX) Wallace Robert M. (Dallas TX), Method of unsticking components of micro-mechanical devices.
  51. Jones Curtis S. (Boise ID) Crane William J. (Boise ID) Gilchrist Robin L. (Boise ID) Langley Rod C. (Boise ID), Method to remove fluorine residues from bond pads.
  52. Stanford ; Jr. Thomas B. (San Pedro CA) Chao Sidney C. (Manhattan Beach CA), Method using megasonic energy in liquefied gases.
  53. Farber Jeffrey J. ; Radman Allan M. ; Treichel Helmuth W., Methods for cleaning substrate surfaces after etch operations.
  54. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Methods for cleaning surfaces substantially free of contaminants.
  55. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Methods for cleaning surfaces substantially free of contaminants utilizing filtered carbon dioxide.
  56. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid, Methods for cleaning utilizing multi-stage filtered carbon dioxide.
  57. Boumerzoug, Mohamed; Tannous, Adel George; Makhamreh, Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  58. Boitnott Charles A. ; Caughran James W. ; Egbert Steve, Modular process system.
  59. Bauer Tibor L. (Hopewell Junction NY) Cavaliere William A. (Verbank NY) Linnell David C. (Poughkeepsie NY) Wu Jin J. (Ossining NY), Nozzle apparatus for producing aerosol.
  60. Goenka Lakhi N. (Ann Arbor MI), Nozzle for enhanced mixing in CO2 cleaning system.
  61. Bowers Charles W., Photoresist and redeposition removal using carbon dioxide jet spray.
  62. Sahbari, Javad J.; Sahbari, Shawn J., Polymer removal.
  63. Heyns Garrett J. (Boulder CO) McClure Terry R. (Kersey CO) Nicholl Hugh (Berthoud CO) Read Peter H. (Morrisville PA) Schulte Steven M. (Westminster CO) Tabrizi Mohammad F. (Westminster CO), Probemat cleaning system using CO2 pellets.
  64. Herden Hansjoerg (Rodgau DEX) Federhen Stefan (Frankfurt DEX) Mayer-Schwinning Gernot (Bad Homburg DEX) Roth Hubert (Bad Vilbel DEX), Process and apparatus for separating polycyclic and polyhalogenated hydrocarbons from exhaust gas of a sintering process.
  65. Jur, Jesse Stephen; McCullough, Kenneth J.; Moreau, Wayne Martin; Simons, John Patrick; Taft, Charles Jesse, Process for cleaning a workpiece using supercritical carbon dioxide.
  66. Haerle Andrew G. ; Meder Gerald S., Process for cleaning ceramic articles.
  67. Haerle, Andrew G.; Meder, Gerald S., Process for cleaning ceramic articles.
  68. Gifford George G. (Poughkeepsie NY) Lii Yeong-Jyh T. (Peekskill NY) Wu Jin J. (Ossining NY), Process for fabricating a semiconductor structure having sidewalls.
  69. Okabayashi Seiji (Nakajo JPX) Watanabe Hirofumi (Nakajo JPX) Abe Kiyoshi (Shibata JPX) Ogawa Masahide (Shibata JPX), Process for treating air containing hydrocarbon vapor with a composite adsorbent material.
  70. Bersin Richard L. ; Xu Han, Processes for cleaning and stripping photoresist from surfaces of semiconductor wafers.
  71. Rose Peter H. ; Sferlazzo Piero, Processing a surface.
  72. McClain, James B.; Cole, Michael E., Pumpless carbon dioxide dry cleaning system.
  73. Li Li ; Harlan Frankamp, Reduction/oxidation material removal method.
  74. McCullough Kenneth John ; Purtell Robert Joseph ; Rothman Laura Beth ; Wu Jin-Jwang, Removal of fluorine or chlorine residue by liquid CO.sub.2.
  75. Bowen Howard S. ; Lee Richard M. ; Bowen John H., Solid/gas carbon dioxide spray cleaning system.
  76. Obinata Hisaharu,JPX ; Kiyota Tetsuji,JPX ; Toyoda Satoru,JPX ; Kadokura Yoshiyuki,JPX, Sputtering apparatus for filling pores of a circular substrate.
  77. Lansberry Don D. (Kaysville UT) Council Thomas G. (Camarillo CA), Supercritical fluid recirculating system for a precision inertial instrument parts cleaner.
  78. McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Allentown PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Millwood NY) Schwarz Alexander (Allentown PA) Wolfe Henry L. (Pleasant Valley NY), Surface cleaning using a cryogenic aerosol.
  79. DePalma, Philip W.; Sherman, Robert, System and method for controlling humidity in a cryogenic aerosol spray cleaning system.
  80. Peterson Ronald V. (Thousand Oaks CA) Krone-Schmidt Wilfried (Fullerton CA), System for precision cleaning by jet spray.
  81. Patrin John C. ; Heitzinger John M., Treating substrates by producing and controlling a cryogenic aerosol.
  82. Wong Kaichiu ; Ramkumar Krishnaswamy ; Bamnolker Hanna ; Puri Suraj ; Bhushan Rajiv ; Wong David ; Elmore Gary ; Mohindra Raj, Ultra-low particle semiconductor cleaner for removal of particle contamination and residues from surface oxide formation on semiconductor wafers.
  83. Bowers Charles W., Wafer cassette cleaning using carbon dioxide jet spray.
  84. Borden Michael R. ; Kosic Thomas J. ; Bowers Charles W., Wafer cleaning using a laser and carbon dioxide snow.

이 특허를 인용한 특허 (2)

  1. Jackson, David P., Method and apparatus for cutting and cleaning a superhard substrate.
  2. Shearin, Jason, Tack weld purging system.

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트