IPC분류정보
| 국가/구분 |
United States(US) Patent
등록
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| 국제특허분류(IPC7판) |
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| 출원번호 |
US-0846490
(2001-04-30)
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발명자
/ 주소 |
- Eldridge,Benjamin Niles
- Grube,Gary William
- Khandros,Igor Yan
- Mathieu,Gaetan L.
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| 출원인 / 주소 |
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| 인용정보 |
피인용 횟수 :
19 인용 특허 :
114 |
초록
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A probe card assembly includes a probe card, a space transformer having resilient contact structures (probe elements) mounted directly to (i.e., without the need for additional connecting wires or the like) and extending from terminals on a surface thereof, and an interposer disposed between the spa
A probe card assembly includes a probe card, a space transformer having resilient contact structures (probe elements) mounted directly to (i.e., without the need for additional connecting wires or the like) and extending from terminals on a surface thereof, and an interposer disposed between the space transformer and the probe card. The space transformer and interposer are "stacked up" so that the orientation of the space transformer, hence the orientation of the tips of the probe elements, can be adjusted without changing the orientation of the probe card. Suitable mechanisms for adjusting the orientation of the space transformer, and for determining what adjustments to make, are disclosed. The interposer has resilient contact structures extending from both the top and bottom surfaces thereof, and ensures that electrical connections are maintained between the space transformer and the probe card throughout the space transformer's range of adjustment, by virtue of the interposer's inherent compliance. Multiple die sites on a semiconductor wafer are readily probed using the disclosed techniques, and the probe elements can be arranged to optimize probing of an entire wafer. Composite interconnection elements having a relatively soft core overcoated by a relatively hard shell, as the resilient contact structures are described.
대표청구항
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What is claimed is: 1. Method of fabricating tip structures for ends of contact structures, comprising: depositing at least one layer of at least one conductive material on a surface of a substrate; depositing a layer of masking material atop the at least one conductive layer; patterning openings i
What is claimed is: 1. Method of fabricating tip structures for ends of contact structures, comprising: depositing at least one layer of at least one conductive material on a surface of a substrate; depositing a layer of masking material atop the at least one conductive layer; patterning openings in the masking material; depositing at least one layer of at least one conductive tip material into the openings, forming tip structures; removing the masking material; after said step of depositing at least one layer of at least one conductive tip material, joining the tip structures to previously fabricated contact structures; and releasing the tip structures from the substrate. 2. Method, according to claim 1, further comprising: depositing a joining material on the at least one layer of at least one conductive tip material previously deposited in the openings. 3. Method, according to claim 1, wherein: the contact structures are resilient contact structures. 4. Method, according to claim 1, wherein: the contact structures are composite interconnection elements. 5. Method, according to claim 1, wherein: the contact structures are resilient contact structures disposed atop a space transformer of a probe card assembly. 6. Method, according to claim 1, wherein said substrate is a sacrificial substrate. 7. A method comprising: fabricating a tip structure on a first substrate; providing a second substrate comprising a contact structure extending therefrom; after fabricating said tip structure, joining said tip structure to said contact structure; and releasing said tip structure from said first substrate. 8. The method claim 7, wherein: said second substrate comprises a plurality of contact structures extending therefrom, said fabricating step comprises fabricating a plurality of tip structures on said first substrate; said joining step comprises joining said plurality of tip structures to said plurality of contact structures; and said releasing step comprises releasing said plurality of tip structures from said first substrate. 9. The method of claim 8, wherein said fabricating comprises depositing tip material in a plurality of openings in a masking material formed on said first substrate. 10. The method of claim 8, wherein said fabricating step comprises: depositing at least one layer of material on said first substrate; depositing a masking material over said at least one layer of material; patterning openings in said masking material; and depositing tip material into said openings. 11. The method of claim 10, wherein said step of depositing tip material comprises depositing a plurality of materials into said openings. 12. The method of claim 8 further comprising forming said contact structures on said second substrate. 13. The method of claim 12, wherein said step of forming said contact structures on said second substrate comprises bonding wires to said second substrate. 14. The method of claim 13, wherein said step of forming said contact structures on said second substrate further comprises over coating said wires. 15. The method of claim 12, wherein said step of forming said contact structures on said second substrate comprises planarizing ends of said contact structures. 16. The method of claim 15, wherein said joining step comprises joining said tip structures to said ends of said contact structures. 17. The method of claim 8, wherein said contact structures are elongate, and said joining step comprises joining said tip structures to free ends of said contact structures. 18. The method of claim 8, wherein said fabricating step further comprises fabricating said tip structures on said first substrate as structures that are structurally distinct from and unconnected to said plurality of contact structures. 19. The method of claim 8, wherein, prior to said joining step, said tip structures are structurally distinct from and unconnected to said plurality of contact structures. 20. The method of claim 8, wherein said releasing step occurs alter said joining step. 21. The method of claim 8, wherein said joining step occurs after said providing step. 22. The method of claim 8, wherein said providing step comprises fabricating said contact structures on said second substrate, and said joining step occurs after said step of fabricating said contact structures on said second substrate. 23. The method of claim 10, wherein: said at least one layer of material comprises a layer of conductive material, and said step of depositing tip material into said openings comprises electroplating said tip material onto said layer of conductive material. 24. The method of claim 10, wherein: said at least one layer of material comprises a layer of release material, and said releasing step comprises removing said layer of release material. 25. The method of claim 10, wherein: said joining step comprises joining said tip structures to said contact structures with a joining material, and said at least one layer of material comprises a layer of material that prevents said joining material from flowing between ones of said tip structures.
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