Preparation of electroless deposition solutions
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IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C23C-018/31
B05D-001/18
출원번호
US-0609443
(2003-06-26)
발명자
/ 주소
Choi,Hok Kin
Thirumala,Vani
Dubin,Valery
Cheng,Chin chang
Zhong,Ting
출원인 / 주소
Intel Corporation
대리인 / 주소
Blakely, Sokoloff, Taylor &
인용정보
피인용 횟수 :
5인용 특허 :
43
초록▼
A system and method for storing a solution containing a subset of a group consisting of a metal ion, a complexing agent, an ammonium salt, and a strong base and then nearer to a time of use in an electroless deposition process, using the solution to form an electroless deposition solution containing
A system and method for storing a solution containing a subset of a group consisting of a metal ion, a complexing agent, an ammonium salt, and a strong base and then nearer to a time of use in an electroless deposition process, using the solution to form an electroless deposition solution containing the entire group. In one embodiment of the invention, the metal ion includes a cobalt ion, the complexing agent includes citric acid, the ammonium salt includes ammonium chloride, and the strong base includes tetramethylammonium hydroxide.
대표청구항▼
What is claimed is: 1. A method comprising: storing for at least two days a solution containing a subset of a group consisting of a metal ion, a complexing agent, an ammonium salt, and a strong base, wherein the subset includes at least two components of the group; and nearer to a time of use in an
What is claimed is: 1. A method comprising: storing for at least two days a solution containing a subset of a group consisting of a metal ion, a complexing agent, an ammonium salt, and a strong base, wherein the subset includes at least two components of the group; and nearer to a time of use in an electroless deposition process, using the solution to form a second electroless deposition solution containing the entire group. 2. The method of claim 1: wherein the subset includes the ammonium salt and lacks the strong base; and wherein said using includes introducing the strong base into the solution that was stored. 3. The method of claim 1: wherein the subset includes the strong base and lacks the ammonium salt; and wherein said using includes introducing the ammonium salt into the solution that was stored. 4. The method of claim 1: wherein the metal ion includes a metal ion that is selected from the group consisting of a cobalt ion, a nickel ion, an iron ion, a tungsten ion, a molybdenum ion, a niobium ion, a tantalum ion, and combinations thereof; wherein the complexing agent includes one or more carboxylic acids; wherein the ammonium salt includes an ammonium salt that is selected from the group consisting of an ammonium halide, an ammonium carboxylate, an ammonium sulfate, and combinations thereof; and wherein the strong base includes a base that is selected from the group consisting of a tetralkylammonium hydroxide, sodium hydroxide, and potassium hydroxide. 5. The method of claim 4: wherein the subset includes the ammonium salt and lacks the strong base; and wherein said using includes introducing the strong base into the stored solution. 6. The method of claim 4: wherein the subset includes the strong base and lacks the ammonium salt; and wherein said using includes introducing the ammonium salt into the stored solution. 7. The method of claim 4: wherein the metal ion includes a cobalt ion, the complexing agent includes citric acid, the ammonium salt includes ammonium chloride, and the strong base includes tetramethylammonium hydroxide; wherein the subset includes the ammonium salt and lacks the strong base; and wherein said using includes introducing the strong base into the solution that was stored. 8. The method of claim 1: wherein the metal ion includes a cobalt ion, the complexing agent includes citric acid, the ammonium salt includes ammonium chloride, and the strong base includes tetramethylammonium hydroxide; wherein the subset includes the strong base and lacks the ammonium salt; and wherein said using includes introducing the ammonium salt into the solution that was stored. 9. The method of claim 1, wherein the subset includes at least three components of the group. 10. The method of claim 1, wherein the second electroless deposition solution comprises from 0.05 to 0.5 mol/L of the metal ion, from 0.1 to 0.6 mol/L of the complexing agent, and from 0.5 to 1.5 mol/L of the ammonium salt. 11. The method of claim 1, further comprising: adding a reducing agent to the second electroless deposition solution; and using the resultant solution to perform an electroless deposition. 12. An electroless deposition solution prepared according to the method of claim 1. 13. An electroless deposition solution prepared according to the method of claim 2. 14. An electroless deposition solution prepared according to the method of claim 3. 15. A method comprising: storing for at least two days a solution that omits one or two components selected from a group consisting of a metal ion, a complexing agent, an anmmonium salt, and a strong base; and after said storing, combining the one or two omitted components and a reducing agent with the solution to form an electroless deposition solution. 16. The method of claim 15: wherein the solution that is stored includes the ammonium salt and omits the strong base; and wherein said combining includes combining the strong base with the solution that was stored. 17. The method of claim 15: wherein the solution that is stored includes the strong base and omits the ammonium salt; and wherein said combining includes combining the ammonium salt with the solution that was stored. 18. A system comprising: a first source including an incomplete electroless deposition solution, the incomplete electroless deposition solution including a subset of a group consisting of a metal ion, a complexing agent, an ammonium salt, and a strong base and omitting one or two components of the group; a second source including the one or two omitted components of the group; and a fluid combination device coupled with the first source and the second source to receive the incomplete electroless deposition solution and the one or two omitted components and to introduce the one or two omitted components into the incomplete electroless deposition solution. 19. The system of claim 18, wherein the fluid combination device comprises a tee. 20. The system of claim 18: wherein the subset lacks the strong base; and wherein the fluid combination device introduces the strong base into the solution that was stored. 21. The system of claim 20, wherein the subset includes the ammonium salt. 22. The system of claim 18: wherein the subset lacks the ammonium salt; and wherein the fluid combination device introduces the ammonium salt into the solution that was stored. 23. The system of claim 22, wherein the subset includes the strong base.
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