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Method and apparatus for protecting surfaces of optical components 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01J-001/42
출원번호 US-0688839 (2003-10-16)
발명자 / 주소
  • Delgado,Gil
  • McMurtry,John
  • Wiley,James
출원인 / 주소
  • KLA Tencor Technologies, Corporation
대리인 / 주소
    Beyer Weaver &
인용정보 피인용 횟수 : 17  인용 특허 : 21

초록

The invention pertains to mechanisms for protecting surfaces of optical components of an optical inspection system. One aspect of the invention relates to a gas purge system that produces a gas stream that blocks contaminants from reaching the optical surfaces of the optical components and that tran

대표청구항

What is claimed is: 1. An inspection system for detecting defects on a sample, the inspection system comprising: an optical subsystem configured to collect ultra violet light emanating from the sample, the optical subsystem including an optical component having an optical surface; a detector config

이 특허에 인용된 특허 (21)

  1. Uto, Sachio; Yoshida, Minoru; Nakata, Toshihiko; Maeda, Shunzi; Shimoda, Atsushi, Apparatus and method for inspecting pattern.
  2. Hershel Ronald S. (Albany OR), Apparatus for projecting a series of images onto dies of a semiconductor wafer.
  3. Levy Kenneth (Saratoga CA) Sandland Paul (San Jose CA), Automatic photomask inspection system and apparatus.
  4. Shafer David R. ; Chuang Yung-Ho ; Tsai Bin-Ming B., Broad spectrum ultraviolet inspection methods employing catadioptric imaging.
  5. Shafer David (Fairfield CT), Catadioptric imaging system.
  6. Elliott David J. (Wayland MA) Shafer David (Fairfield CT), Deep ultraviolet microlithography system.
  7. Arakawa, Kiyoshi, Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method using the apparatus, and semiconductor manufacturing factory.
  8. Kubota Yoshihiro (Gunma-ken JPX) Kawakami Satoshi (Gunma-ken JPX) Hamada Yuichi (Gunma-ken JPX) Shirasaki Toru (Gunma-ken JPX) Nagata Yoshihiko (Gunma-ken JPX) Kashida Meguru (Gunma-ken JPX), Frame-supported pellicle for dustproof protection of photomask.
  9. Sandland Paul (Gilroy CA) Chadwick Curt H. (Los Altos CA) Singleton Russell M. (Sunnyvale CA) Dwyer Howard (Mountain View CA), Method and apparatus for automatic wafer inspection.
  10. Tsai Bin-ming B. (Santa Clara CA) Babian Fred E. (Boulder Creek CA), Method and apparatus for detecting defects in repeated microminiature patterns.
  11. Tanitsu, Osamu; Kudo, Yuji; Toyoda, Mitsunori; Shibuya, Masato, Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus.
  12. Kuo George Nein-Jai, Optical pellicle with controlled transmission peaks and anti-reflective coatings.
  13. Funatsu Hiroyuki,JPX, Pellicle.
  14. Kuo George Nein-Jai, Pellicle assembly having a vented frame.
  15. Campi ; Jr. James G. (Morgan Hill CA), Pellicle assembly with vent structure.
  16. Kashida Meguru,JPX, Pellicle for a mask or substrate.
  17. Toru Shirasaki JP, Pellicle for photolithography.
  18. Kubota Yoshihiro (Gunma-ken JPX) Kashida Meguru (Gunma-ken JPX) Nagata Yoshihiko (Gunma-ken JPX) Noguchi Hitoshi (Gunma-ken JPX) Hamada Yuichi (Gunma-ken JPX) Kumagae Kimitaka (Gunma-ken JPX), Pellicle for protection of photolithographic mask.
  19. Broude Sergey V. ; Allen Nicholas ; Boudour Abdu ; Chase Eric ; Johnson Carl ; Miller Pascal ; Ormsby Jay, Pellicle reflectivity monitoring system having means for compensating for portions of light reflected by the pellicle.
  20. Engelsberg Audrey C. (Milton VT) Dehais Joseph A. (Washington DC), Removal of surface contaminants by irradiation from a high energy source.
  21. Sandland, Paul; Chadwick, Curt H.; Dwyer, Howard I., X-Y Stage for a patterned wafer automatic inspection system.

이 특허를 인용한 특허 (17)

  1. Williams, Derek; Garnier, Gary; Stemer, Kent; Carlson, Paul, Air purge collar.
  2. Yoo, Chue San; Chen, Ching-Yueh; Cheng, Wen-Hao, Apparatus and a method of forming a particle shield.
  3. Kopelman, Avi; Sambu, Shiva; Sterental, Rene M.; Kuo, Eric; de Alencar Casa, Mauricio, Arch expanding appliance.
  4. Sendrowski, Peter; Kress, Claus, Arrangement for analyzing microscopic and macroscopic preparations.
  5. Witte, Martin, Integrated camera mounting and image window cleaning device.
  6. Elbaz, Gilad; Lampert, Erez; Atiya, Yossef; Kopelman, Avi; Saphier, Ofer; Moshe, Maayan; Ayal, Shai, Intraoral scanner with dental diagnostics capabilities.
  7. Fagrenius, Nils Gustav; Palmqvist, Sven Rune Fredrik; Wedel, Johan Martin; Waldt, Carl Magnus; Rålin, Eva Tina; Håkansson, Sten Ola, Lens cleaner.
  8. Krishnan, Shankar, Measurement of semiconductor structures with capillary condensation.
  9. Hwang, Shiow-Hwei; Kirk, Gregory L.; Jeong, Hwan J.; Shafer, David; Hudyma, Russel, Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths.
  10. Klassen, Andrew S.; Hazelton, Andrew J.; Barada, Andrew H.; Petit, Todd M.; Tu, Chuan Sheng, Optical metrology with purged reference chip.
  11. Woll, Dirk, Oven enclosure for optical components with integrated purge gas pre-heater.
  12. Borovinskih, Artem; Derakhshan, Mitra; Koppers, Carina; Meyer, Eric; Tolstaya, Ekaterina; Brailov, Yury, Photograph-based assessment of dental treatments and procedures.
  13. Krishnan, Shankar, Porosity measurement of semiconductor structures.
  14. Shields, Jason Robert; Ben Moshe, Nir; Hazelton, Andrew J., Protected lens cover plate for an optical metrology device.
  15. Boillot, Jean-Paul; Rusnac, Marian, Protective nozzle for a laser camera.
  16. Kvamme, Damon; Chilese, Frank, Segmented mirror apparatus for imaging and method of using the same.
  17. Haller, Kurt L.; Shortt, David; Wolters, Christian, Systems and methods for inspecting a wafer with increased sensitivity.
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