IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
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출원번호 |
US-0037151
(2005-01-19)
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우선권정보 |
FR-00 02757(2000-03-03) |
발명자
/ 주소 |
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출원인 / 주소 |
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대리인 / 주소 |
Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
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인용정보 |
피인용 횟수 :
3 인용 특허 :
7 |
초록
▼
A device for applying a substance, in particular a cosmetic, the device comprising an applicator having a structure for application purposes and capable of transporting the substance onto a surface to be treated, and optionally a wiper member for wiping said applicator prior to applying the substanc
A device for applying a substance, in particular a cosmetic, the device comprising an applicator having a structure for application purposes and capable of transporting the substance onto a surface to be treated, and optionally a wiper member for wiping said applicator prior to applying the substance, wherein inside at least a portion of said structure and/or the wiper member there are disposed one or more elements generating or suitable for generating a magnetic field of predetermined orientation.
대표청구항
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The invention claimed is: 1. A device for applying a substance, the device comprising: an applicator comprising an applicator structure configured to be loaded with substance and to apply the loaded substance; and a wiper member configured to wipe at least a portion of the applicator structure prio
The invention claimed is: 1. A device for applying a substance, the device comprising: an applicator comprising an applicator structure configured to be loaded with substance and to apply the loaded substance; and a wiper member configured to wipe at least a portion of the applicator structure prior to applying the substance, wherein at least one of the applicator structure and the wiper member comprises at least a portion comprising at least one element configured to generate a magnetic field. 2. The device of claim 1, wherein the magnetic field has a predetermined orientation. 3. The device of claim 1, wherein at least a portion of the applicator structure is configured to absorb the substance. 4. The device of claim 1, wherein the at least one element configured to generate a magnetic field comprises a plurality of magnetic particles. 5. The device of claim 4, further comprising a receptacle for containing the substance, wherein the applicator structure is configured to be loaded with substance from the receptacle. 6. The device of claim 5, further comprising the substance in the receptacle. 7. The device of claim 6, wherein the substance is a cosmetic substance. 8. The device of claim 6, wherein the substance is intended for application to at least one of hair and skin. 9. The device of claim 5, wherein the applicator comprises a stalk extending in a longitudinal manner from the applicator structure. 10. The device of claim 9, wherein the wiper member defines an aperture configured to permit the stalk and the applicator structure to pass therethrough after the applicator structure has been loaded with substance from the receptacle. 11. The device of claim 4, wherein at least a portion of the wiper member comprises the plurality of magnetic particles, and wherein the plurality of magnetic particles subject the applicator structure to a magnetic field when the applicator structure is wiped with the wiper member. 12. The device of claim 1, wherein the applicator structure is made of at least one of a foam, a sponge, a sintered block, an aggregate of natural fibers, an aggregate of synthetic fibers, woven fibers, and non-woven fibers. 13. The device of claim 1, wherein at least a portion of a surface of the applicator structure has at least one of a flocking and a roughness thereon. 14. The device of claim 1, wherein the applicator structure is configured to apply a cosmetic substance. 15. The device of claim 1, wherein at least a portion of the wiper member comprises the at least one element configured to generate a magnetic field. 16. The device of claim 15, wherein the at least one element configured to generate a magnetic field is disposed within the portion of the wiper member. 17. The device of claim 1, wherein at least a portion of the applicator structure comprises the at least one element configured to generate a magnetic field. 18. The device of claim 1, wherein both the applicator structure and the wiper member comprise at least one portion comprising at least one element configured to generate a magnetic field. 19. A method of applying a substance to a surface, the method comprising: providing an applicator structure for applying the substance to a surface and a wiper member configured for wiping excess substance from the applicator prior to applying the substance to the surface, wherein at least one of the wiper member and the applicator structure comprises at least a portion comprising at least one element configured to generate a magnetic field; loading the applicator structure with substance; wiping the applicator structure with the wiper member; and placing the loaded applicator structure in contact with the surface. 20. The method of claim 19, wherein at least a portion of the wiper member comprises the at least one element configured to generate a magnetic field, and wherein the wiping of the applicator structure comprises subjecting the applicator structure to a magnetic field generated by the at least one element. 21. The method of claim 20, wherein subjecting the applicator structure to a magnetic field creates a magnetic field of a predetermined orientation. 22. The method of claim 19, wherein the wiper member defines an aperture, and wherein the wiping of the applicator structure comprises translating at least a portion of the applicator structure through the aperture. 23. The method of claim 19, wherein the loading of the substance onto the applicator structure comprises loading the substance onto the applicator structure from a receptacle. 24. The method of claim 19, wherein the substance is a cosmetic substance. 25. The method of claim 19, wherein the placing of the applicator structure in contact with the surface comprises placing the applicator structure in contact with at least one of hair and skin. 26. The method of claim 19, wherein at least a portion of the applicator structure comprises the at least one element configured to generate a magnetic field. 27. The device of claim 19, wherein the wiper member and the applicator structure each comprise at least a portion comprising at least one element configured to generate a magnetic field. 28. A wiper member for wiping excess product from an applicator structure, the wiper member comprising: at least a portion comprising at least one element configured to generate a magnetic field so as to subject the applicator structure to the magnetic field while the applicator structure is being wiped by the wiping member; and an aperture defined by a body of the wiper member, the aperture being configured to permit passage of at least a portion of the applicator structure. 29. The wiper member of claim 28, wherein at least the portion of the wiper member comprises a plurality of magnetic particles. 30. The wiper member of claim 28, wherein the magnetic field generated by the at least one element has a predetermined orientation. 31. The wiper member of claim 28, wherein the wiper member comprises a porous material. 32. The wiper member of claim 31, wherein the wiper member is in the form of a block of foam. 33. The wiper member of claim 32, wherein the foam comprises open-celled polyurethane foam. 34. A wiper member for wiping excess product from an applicator structure, the wiper member comprising: at least a portion comprising at least one element configured to generate a magnetic field so as to subject the applicator structure to the magnetic field while the applicator structure is being wiped by the wiping member, wherein the wiper member is configured to be arranged within a receptacle configured to contain the substance. 35. A device for applying a substance, the device comprising: an applicator comprising an applicator structure configured to be loaded with the substance and to apply the loaded substance; and a plurality of particles configured to generate a magnetic field, wherein the device is configured such that the plurality of particles are dispersed in the applicator structure, and/or the device further comprises a wiper member for wiping at least a portion of the applicator structure and the plurality of particles are dispersed in the wiper member. 36. The device of claim 35, wherein the particles are dispersed in the applicator structure. 37. The device of claim 35, wherein the device comprises the wiper member and the particles are dispersed in the wiper member. 38. The device of claim 37, wherein the particles are magnetic and the particles subject the applicator structure to a magnetic field when the applicator structure is wiped with the wiper member. 39. The device of claim 35, wherein the device further comprises the wiper member and wherein the wiper member defines an aperture configured to permit the applicator structure to pass therethrough after the applicator structure has been loaded with substance. 40. The device of claim 35, wherein the device further comprises the wiper member and the particles are dispersed in the applicator structure and in the wiper member. 41. The device of claim 40, wherein the wiper member defines an aperture configured to permit the applicator structure to pass therethrough after the applicator structure has been loaded with substance. 42. The device of claim 35, wherein the magnetic field has a predetermined orientation. 43. The device of claim 35, further comprising a receptacle for containing the substance. 44. The device of claim 43, further comprising the substance in the receptacle. 45. The device of claim 44, wherein the substance is a cosmetic substance. 46. The device of claim 45, wherein the substance is a make-up substance. 47. The device of claim 44, wherein the substance is intended for application to at least one of skin and hair. 48. The device of claim 43, wherein the device further comprises the wiper member and wherein the wiper member is associated with the receptacle. 49. The device of claim 35, wherein the particles comprise magnets. 50. The device of claim 35, wherein the particles comprise magnetizable particles. 51. A method of applying a substance, the method comprising: providing the device of claim 35; loading at least a portion of the applicator structure with the substance; and placing the loaded applicator structure in contact with the surface so as to apply the substance. 52. The method of claim 51, wherein providing the device comprises providing a device comprising the wiper member and the method further comprises wiping the applicator structure with the wiper member. 53. The method of claim 52, wherein wiping the applicator structure comprises subjecting the applicator structure to a magnetic field generated by the particles. 54. The method of claim 53, wherein subjecting the applicator structure to a magnetic field creates a magnetic field of a predetermined orientation. 55. The method of claim 52, wherein the wiper member defines an aperture, and wherein the wiping of the applicator structure comprises translating at least a portion of the applicator structure through the aperture. 56. The method of claim 52, wherein the loading of the substance onto the applicator structure comprises loading the substance onto the applicator structure from a receptacle, the wiper member being associated with the receptacle. 57. The method of claim 51, wherein the substance is a cosmetic substance. 58. The method of claim 51, wherein placing the applicator structure in contact with the surface comprises placing the applicator structure in contact with at least one of hair and skin. 59. The method of claim 51, wherein providing the device comprises providing a device comprising the wiper member and the particles are dispersed in the applicator structure and in the wiper member.
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