초록 ▼

A plasma processing apparatus having a sample stage disposed inside a vacuum chamber and a plate member disposed opposing to a sample which is placed on the sample stage and supplied with electric power. The sample is processed using a plasma generated between the sample stage and the plate member a

A plasma processing apparatus having a sample stage disposed inside a vacuum chamber and a plate member disposed opposing to a sample which is placed on the sample stage and supplied with electric power. The sample is processed using a plasma generated between the sample stage and the plate member and a measuring port is disposed at a back side of the plate member. The measuring port includes an optical transmitter which receives light from a surface of the sample, and a seal which vacuum-seals between an atmospheric side and vacuum side of the vacuum chamber.

대표청구항 ▼

What is claimed is: 1. A plasma processing apparatus for processing a sample disposed inside a vacuum chamber using a plasma generated therein comprising: an electrically conductive member disposed above said sample which is disposed inside said vacuum chamber, said electrically conductive member b

What is claimed is: 1. A plasma processing apparatus for processing a sample disposed inside a vacuum chamber using a plasma generated therein comprising: an electrically conductive member disposed above said sample which is disposed inside said vacuum chamber, said electrically conductive member being supplied with electric power for generating said plasma thereunder; a plate member which is disposed so as to have a front part which opposes and faces said sample and constitutes a portion of a ceiling of a processing chamber of said vacuum chamber in which said sample is processed, said plate member being disposed under said electrically conductive member and electrically coupled to said electrically conductive member; an optical transmitter mounted with respect to said vacuum chamber so as to be almost in contact with or spaced apart from a back part of said plate member at an opening of a through-hole in said plate member which is open to said vacuum chamber, said opening having a smaller diameter than a diameter of said optical transmitter, and said optical transmitter being disposed so as to receive light from said vacuum chamber via said opening of said through-hole; a holder disposed at an upper side of said electrically conductive member which holds said optical transmitter with respect to said vacuum chamber; a seal which seals a vacuum side and an atmospheric side of said vacuum chamber with respect to said holder which holds said optical transmitter; and a detector which detects said light received by said optical transmitter and which is transmitted through said optical transmitter; wherein said optical transmitter is mounted with respect to said vacuum chamber so as to be detachable from a back part side of said plate member out of said atmospheric side thereof. 2. A plasma processing apparatus according to claim 1, wherein said optical transmitter has a substantially cylindrical shaped elongated transmissive portion with a length substantially greater than the diameter thereof, and said seal is disposed at an outer periphery of said cylindrical shaped portion. 3. A plasma processing apparatus according to claim 2, wherein said optical transmitter is mounted with respect to said vacuum chamber so as to be detachable from said atmospheric side after said holder is detached. 4. A plasma processing apparatus according to claim 2, wherein said optical transmitter is mounted on said electrically conductive member. 5. A plasma processing apparatus according to claim 1, wherein said optical transmitter is elongated with a length substantially greater than the diameter thereof and is mounted with respect to said vacuum chamber so as to be detachable from said atmospheric side after said holder is detached. 6. A plasma processing apparatus according to claim 5, wherein said optical transmitter is mounted with respect to said vacuum chamber so as to be detachable from said atmospheric side after said holder is detached. 7. A plasma processing apparatus according to claim 5, wherein said optical transmitter is mounted on said electrically conductive member. 8. A plasma processing apparatus according to claim 1, wherein said optical transmitter is elongated with a length substantially greater than the diameter thereof and is mounted on said electrically conductive member. 9. A plasma processing apparatus according to claim 8, wherein said optical transmitter is mounted with respect to said vacuum chamber so as to be detachable from said atmospheric side after said holder is detached. 10. A plasma processing apparatus according to claim 1, wherein said plate member is a single plate having said front part at one surface thereof and said back part at another surface thereof. 11. A plasma processing apparatus according to claim 1, wherein said electrically conductive member is a single plate. 12. A plasma processing apparatus according to claim 1, wherein said front part of said plate member which constitutes the ceiling of said processing chamber extends at least from a center portion of said sample to a peripheral portion thereof. 13. A plasma processing apparatus according to claim 1, wherein a ratio between a diameter and the depth of the through-hole is in a range of 5 to 100, and the diameter of the through-hole is in a range of 0.1 mm to 5 mm.