이 특허에 인용된 특허 (51) 인용/피인용 타임라인 분석

1. Leech ; Jr. Charles S. (Glendale AZ), Apparatus and method for vacuum drying.

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2. Hijikata Isamu (Tokyo JPX) Uehara Akira (Yokohama JPX) Nakane Hisashi (Kawasaki JPX), Apparatus for the treatment of semiconductor wafers by plasma reaction.

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3. Davis James C. (Carlisle MA), Articulated arm transfer device.

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4. Davis James C. (Carlisle MA) Brooks Norman B. (Carlisle MA), Articulated arm transfer device.

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5. Eastman Richard H. (Needham MA) Davis ; Jr. James C. (Carlisle MA), Articulated arm transfer device.

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6. Hardegen E. Brian (Westford MA) Bottomley Todd E. (Swamzey NH) Davis ; Jr. James C. (Carlisle MA), Articulated arm transfer device.

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7. Fyler Donald C. (Cambridge MA), Control arm assembly.

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8. Namba, Hirotoshi; Kobiki, Takahiro, Double arm substrate transport unit.

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9. Brown William ; Welch Michael, Dual independent robot blades with minimal offset.

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10. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.

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11. Choy, Ping Kong; Liu, Chou Kee; Laio, Wei Hsin; Wang, Yu, High speed pick and place apparatus.

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12. Katsuhiro Yamazoe JP, Horizontal multi-joint industrial robot and a control method thereof.

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13. Flint Alan (Los Gatos CA) Miller Ken (Mt. View CA) Shah Sushil (Sunnyvale CA), In-line disk sputtering system.

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14. Koyano Shinji (Tokyo JPX), In-vacuum conveyance robot.

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15. Wytman Joe, Independent linear dual-blade robot and method for transferring wafers.

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16. Ting Chiu H. ; Holtkamp William H., Integrated vacuum and plating cluster system.

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17. Muka Richard S. (Topsfield MA), Low-gas temperature stabilization system.

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18. Lee, Kwang-Wook; Ko, Yong-Sun; Hwang, In-Seak, Method for drying a wafer and apparatus for performing the same.

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19. Klebanoff Leonard E. ; Rader Daniel J., Method for protection of lithographic components from particle contamination.

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20. White John M. ; Blonigan Wendell T. ; Richter Michael W., Method of controlling gas flow in a substrate processing system.

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21. Hasegawa Junzo (Obu JPX) Ando Michinori (Nagoya JPX) Nakamura Hiroshi (Kariya JPX), Method of producing an industrial robot arm.

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22. Robert W. Berner ; Daniel J. Woodruff ; Wayne J. Schmidt ; Kevin W. Coyle ; Vladimir Zila CA; Worm Lund, Modular semiconductor workpiece processing tool.

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23. White John M. ; Conner Robert B. ; Law Kam S. ; Turner Norman L. ; Lee William T. ; Kurita Shinichi, Modular substrate processing system.

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24. Vowles E. John (Deering NH) Maher Joseph A. (Wenham MA) Napoli Joseph D. (Windham NH), Modular vapor processor system.

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25. Stark Lawrence R. (San Jose CA) Turner Frederick (Sunnyvale CA), Modular wafer transport and processing system.

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26. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multi-chamber integrated process system.

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27. Saito Masasi (Yamanashi JPX) Iwata Teruo (Nirasaki JPX) Ishii Nobuo (Yamanashi JPX) Ikeda Towl (Kofu JPX) Saeki Hiroaki (Yamanashi JPX), Reduced pressure processing system and reduced pressure processing method.

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28. Grunes Howard (Santa Cruz CA) Tepman Avi (Cupertino CA) Lowrance Robert (Los Gatos CA), Robot assembly.

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29. Jones Lawrence T. (Playa del Rey CA) Howden Ashley (Los Angeles CA) Knighton Mark S. (Los Angeles CA) Sims Anson (Granada Hills CA) Kittinger David L. (Van Nuys CA) Hollander Richard E. (Santa Monica, Robot computer chess game.

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30. Caveney Robert T. ; Hofmeister Christopher A., Robot handling apparatus.

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31. Schmidt Wayne J. ; Oberlitner Thomas H., Robots for microelectronic workpiece handling.

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32. Czech Edward A. (Winamac IN) Goodrich Ronald W. (Logansport IN) Crawford Kevin L. (Winamac IN), Rotary bus lift with power stowable platform.

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33. Tarui Tetsuya (Osaka JPX) Asano Hiromitsu (Nara JPX) Onoda Hajime (Tokyo JPX), Substrate drying apparatus.

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34. Takahashi Nobuyuki (Fuchu JPX) Kitahara Hiroaki (Fuchu JPX), Substrate processing apparatus.

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35. Sato Yuusuke,JPX ; Ohmine Toshimitsu,JPX ; Honda Takaaki,JPX, Substrate processing apparatus and substrate processing method.

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36. Harada Junji (Kumamoto JPX) Harada Ichiro (Kumamoto JPX) Nakamura Koji (Kumamoto JPX), Substrate processing method and substrate processing apparatus.

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37. Saino, Kousaku; Kobiki, Takahiro, Substrate transfer system.

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38. Hofmeister, Christopher A., Substrate transport apparatus.

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39. Ueyama Tsutomu (Kyoto JPX) Adachi Hideki (Kyoto JPX) Matsumura Yoshio (Hikone JPX) Tanaka Yasuhide (Kyoto JPX), Subtrate processing apparatus and device for and method of exchanging substrate in substrate processing apparatus.

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40. Mizukami Masami (Yamanashi JPX) Osada Hatsuo (Yamanashi JPX), Transfer apparatus.

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41. Brooks Norman B. (391 East St. Carlisle MA 01741) Brooks Frank P. (5 Inverness Rd. Winchester MA 01890), Transport apparatus.

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42. Minami, Hirofumi; Yuyama, Junpei, Transport apparatus and vacuum processing system using the same.

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43. Lowrance Robert B. (Los Gatos CA), Two-axis magnetically coupled robot.

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44. Bacchi Paul ; Filipski Paul S., Unitary specimen prealigner and continuously rotatable four link robot arm mechanism.

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45. Aichert Hans (Hanau am Main DEX) Dietrich Walter (Hanau am Main DEX) Hauff Alfred (Bruchkobel DEX) Stephan Herbert (Bruchkobel DEX) Stark Friedrich (Langenselbold DEX), Vacuum coating apparatus having a plurality of lock chambers.

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47. Kawakami Osamu (Itami JPX) Tsuruta Kaichi (Mouka JPX), Vacuum drying apparatus.

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48. Small Edward A. (Santa Rosa CA) Edwards Richard H. (Santa Rosa CA) Eufusia Eugene A. (Santa Rosa CA) Clary Robert M. (Santa Rosa CA) Bergfelt Nils H. (Santa Rosa CA), Vapor deposition apparatus.

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49. Moslehi Mehrdad M., Wafer handler for multi-station tool.

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51. Edwards Richard C. (Ringwood NJ) Kolesa Michael S. (Suffern NY) Ishikawa Hiroichi (Mahwah NJ), Wafer processing cluster tool batch preheating and degassing apparatus.

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이 특허를 인용한 특허 (24) 인용/피인용 타임라인 분석

1. Stout, Timothy; Clark, John; Seymour, Sydney; Winkles, Ronald, Apparatus for and method of preparing plant tissue for plant production.

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2. Stout, Timothy; Clark, John; Symour, Sydney; Winkles, Ronald, Apparatus for and method of preparing plant tissue for plant production.

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3. Moynahan, Tonya Lynne Strange, Apparatus for tissue transfer.

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4. Takenaga, Yuichi; Saito, Takanori, Control apparatus, substrate processing apparatus, and substrate processing system.

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5. Wong, Scott; Lin, Jeffrey; Bailey, III, Andrew D.; Chen, Jack; Mooring, Benjamin W.; Huang, Chung Ho, Dynamic alignment of wafers using compensation values obtained through a series of wafer movements.

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6. Terada, Shoichi; Kimura, Yoshio; Kitano, Takahiro, Imprint system for performing a treatment on a template.

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7. Watanabe, Naoki; Abarra, Einstein Noel; Djayaprawira, David Djulianto; Kurematsu, Yasumi, Inline-type wafer conveyance device.

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8. Watanabe, Naoki; Abarra, Einstein Noel; Djayaprawira, David Djulianto; Kurematsu, Yasumi, Inline-type wafer conveyance device.

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9. Meulen, Peter van der, Linear semiconductor processing facilities.

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10. van der Meulen, Peter, Linear semiconductor processing facilities.

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11. Price, JB; Keller, Jed; Dulmage, Laurence; Cheng, David, Method and apparatus for semiconductor processing.

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12. Strange Moynahan, Tonya Lynne, Method and apparatus for tissue transfer.

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13. Slack, Howard C.; Milton, Clare L; Slack, Andrew F., Method for cleaning and reconditioning FCR APG-68 tactical radar units.

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14. Slack, Howard C.; Milton, Clare L., Method for reconditioning FCR APG-68 tactical radar units.

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15. van der Meulen, Peter, Mid-entry load lock for semiconductor handling system.

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16. van der Meulen,Peter, Mid-entry load lock for semiconductor handling system.

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17. van der Meulen, Peter, Semiconductor manufacturing systems.

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18. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.

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19. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.

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20. van der Meulen, Peter; Kiley, Christopher C.; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling transport.

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21. Rosenblum, Martin Philip, Substrate processing apparatus.

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22. Hiroki, Tsutomu, Substrate processing apparatus and substrate processing method.

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