이 특허에 인용된 특허 (142) 인용/피인용 타임라인 분석

1. Birx Daniel L. (Oakley CA) Arnold Phillip A. (Livermore CA) Ball Don G. (Livermore CA) Cook Edward G. (Livermore CA), Air and water cooled modulator.

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2. Vitruk Peter ; Broderick Jeffery Alan, All metal electrode sealed gas laser.

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3. Ito Noritoshi (Hiratsuka JPX) Amada Yoshiho (Hiratsuka JPX) Wakabayashi Osamu (Hiratsuka JPX), Apparatus for controlling output of an excimer laser device.

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4. Herziger Gerd (Rossdorf DEX) Neff Willi (Michelstadt DEX), Apparatus for generating a source of plasma with high radiation intensity in the X-ray region.

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5. Kawaguchi Toshihiko (Kawasaki JPX), Apparatus for manufacturing microcrystal particles and manufacturing method for the microcrystal particles.

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6. Yu, Cheng-Hung, Apparatus for on-line cleaning a wafer chuck with laser.

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7. Akins Robert P. (Escondido CA), Apparatus for, and method of, maintaining a clean window in a laser.

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8. Mallozzi Philip J. (Columbus OH) Epstein Harold M. (Columbus OH) Jung Richard G. (Columbus OH) Applebaum David C. (Columbus OH) Fairand Barry P. (Columbus OH) Gallagher William J. (Worthington OH) Ue, Applying radiation.

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9. Besaucele, Herve A.; Hueber, Jean-Marc; Ershov, Alexander I.; Hofmann, Thomas; Fleurov, Vladimir B., ArF laser with low pulse energy and high rep rate.

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10. Gregory Joseph Dobrowolski ; Kevin Wayne McKiou, Asynchronous object oriented configuration control system for highly reliable distributed systems.

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11. Carlesi Jason R. ; Rokni Shahryar ; Gong Mengxiong ; Watson Tom A. ; Das Palash P. ; Binder Michael C. ; Tantra Muljadi ; Tammadge David J. ; Patterson Daniel G., Automatic fluorine control system.

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12. Gong Mengxiong ; Carlesi Jason R. ; Binder Michael C. ; Das Palash P., Automatic fluorine control system.

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13. Fomenkov, Igor V.; Kroyan, Armen; Buck, Jesse D.; Das, Palash P.; Sandstrom, Richard L.; Erie, Frederick G.; Algots, John M.; Padmabandu, Gamaralalage G., Bandwidth control technique for a laser.

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14. Govorkov Sergei V., Beam delivery system for molecular fluorine (F2) laser.

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15. Webb R. Kyle, Blower assembly for a pulsed laser system incorporating ceramic bearings.

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16. Nalos Ervin J. (Bellevue WA) Axtell James C. (Des Moines WA), Broadbend pulsed microwave generator having a plurality of optically triggered cathodes.

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17. Kafka James ; Newell Vincent J. ; Watts Michael ; Clark James, Broadly tunable single longitudinal mode output produced from multi-longitudinal mode seed source.

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18. Silfvast William T. ; Klosner Mark A. ; Shimkaveg Gregory M., Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications.

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19. Dethlefsen Rolf (San Diego CA), Coaxial pseudospark discharge switch.

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20. Akins Robert P. (San Diego CA) Larson Donald G. (San Diego CA) Sengupta Uday K. (Del Mar CA) Sandstrom Richard L. (Encinitas CA), Compact excimer laser.

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21. Akins Robert P. (San Diego CA) Larson Donald G. (San Diego CA) Sengupta Uday K. (Del Mar CA) Sandstrom Richard L. (Encinitas CA), Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser.

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22. Silfvast William T. ; Klosner Marc A., Configurations, materials and wavelengths for EUV lithium plasma discharge lamps.

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23. Paolo Zambon ; Gamaralalage G. Padmabandu ; Tom A. Watson ; Palash P. Das, Control technique for microlithography lasers.

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24. Cook Edward G. (Livermore CA) Birx Daniel L. (Oakley CA) Ball Don G. (Livermore CA), Copper laser modulator driving assembly including a magnetic compression laser.

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25. Ball Don G. (Livermore CA) Miller John L. (Dublin CA), Coupling apparatus for a metal vapor laser.

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26. Sutter ; Jr. Leroy V. (6301 Summertime La. Culver City CA 90230), Coupling circuit for use with a transversely excited gas laser.

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27. Neff Willi (Kelmis BEX) Holz Raymond (Herzogenrath DEX) Lebert Rainer (Aachen DEX) Richter Franz (Olching DEX), Device for generating X-radiation with a plasma source.

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28. Harris Thomas (Chesterland OH), Die structure for forming a serrated rod.

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29. Gann Ronald A. (La Crescenta CA), Direct spark ignition system.

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30. Sandstrom, Richard L.; Das, Palash P.; Everage, George J.; Erie, Frederick G.; Partlo, William N.; Fomenkov, Igor V., Electric discharge laser with active wavelength chirp correction.

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31. Witter Gerald J. (Waukegan IL), Electrical contact material and method for making the same.

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32. Shell, Melissa; Rice, Bryan J., Electrode insulator materials for use in extreme ultraviolet electric discharge sources.

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33. Ward Michael A. V. (Arlington MA), Electromagnetic ignition－an ignition system producing a large size and intense capacitive and inductive spark with an i.

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34. Smart Donald V., Energy-efficient, laser-based method and system for processing target material.

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35. Morton Richard G. ; Partlo William N., Excimer laser with pulse multiplier.

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36. I. Roger Oliver ; William N. Partlo ; Richard M. Ness ; Richard L. Sandstrom ; Stuart L. Anderson ; Alex P. Ivaschenko ; James K. Howey ; Vladimir Kulgeyko ; Jean-Marc Hueber ; Daniel L. Bir, Extreme repetition rate gas discharge laser.

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37. I. Roger Oliver ; William N. Partlo, Extreme repetition rate gas discharge laser with improved blower motor.

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38. Melnychuk, Stephan T.; Partlo, William N.; Fomenkov, Igor V.; Oliver, I. Roger; Ness, Richard M.; Bowering, Norbert; Khodykin, Oleh; Rettig, Curtis L.; Blumenstock, Gerry M.; Dyer, Timothy S.; Simmon, Extreme ultraviolet light source.

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39. Rando Joseph F. (Los Altos Hills CA) Koop Dale E. (Sunnyvale CA), Fast axial flow laser circulating system.

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40. Everage, George J.; Fomenkov, Igor V.; Das, Palash P.; Sandstrom, Richard L.; Erie, Frederick G.; Algots, John M., Fast wavelength correction technique for a laser.

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41. Riordan John C. (Carlsbad CA) Pearlman Jay S. (San Diego CA), Filter apparatus for use with an x-ray source.

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42. Gong Mengxiong ; Watson Tom A. ; Das Palash P. ; Sandstrom Richard L. ; Duffey Thomas P., Fluorine control system with fluorine monitor.

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43. Newman, Peter C.; Duffey, Thomas P.; Partlo, William N.; Sandstrom, Richard L.; Melcher, Paul C.; Johns, David M.; Saethre, Robert B.; Fleurov, Vladimir B.; Ness, Richard M.; Rettig, Curtis L.; Shann, Four KHz gas discharge laser.

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44. Gupta Rajendra P. (Gloucester CAX) Kekez Mladen M. (Ottawa CAX) Lau John H. (Gloucester CAX) Lougheed Gary D. (Gloucester CAX), Gas discharge derived annular plasma pinch x-ray source.

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45. Vladimir B. Fleurov ; Michael C. Cates ; Michael Du'Lyea ; Igor V. Fomenkov ; Dmitri V. Gaidarenko ; Jean-Marc Hueber ; Richard G. Morton ; Eckehard D. Onkels ; Robert A. Shannon ; Ross H. W, Gas discharge laser long life electrodes.

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46. Richard C. Ujazdowski ; Michael C. Cates ; Richard G. Morton ; Jean-Marc Hueber ; Ross H. Winnick, Gas discharge laser with blade-dielectric electrode.

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47. Partlo, William N.; Sandstrom, Richard L.; Glatzel, Holzer K.; Cybulski, Raymond F.; Newman, Peter C.; Howey, James K.; Hulburd, William G.; Melchior, John T.; Ivaschenko, Alex P., Gas discharge laser with improved beam path.

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48. Webb R. Kyle, Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly.

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49. Smith, Scott T.; Ershov, Alexander I.; Rao, Rajasekhar M., Gas discharge laser with pulse multiplier.

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50. Sukhman Yefim P. ; Ryskin Mikhail E. ; Schultz David W. ; Mavroleon George M., Gas laser RF power source apparatus and method.

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51. Rice Gregory D. ; Shogren Peter K., Gas module valve automated test fixture.

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52. Javan Ali (12 Hawthorne St. Cambridge MA 02138), Generation of stable frequency radiation at an optical frequency.

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53. Fomenkov Igor V. ; Erie Frederick G. ; Ershov Alexander I., Grating assembly with bi-directional bandwidth control.

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54. Dearman Raymond M. (Five Bellwood Dr. Hattieburg MS 39402) Bethea John J. (P.O. Box 83 Hattiesburg MS 39403), Guard for jet engine.

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55. Ball Don G. (Livermore CA) Birx Daniel L. (Oakley CA) Cook Edward G. (Livermore CA) Miller John L. (Livermore CA), High average power magnetic modulator for metal vapor lasers.

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56. Hiroshi Komine, High average power solid-state laser system with phase front control.

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57. Partlo William N. ; Birx Daniel L. ; Ness Richard M. ; Rothweil Daniel A. ; Melcher Paul C. ; Smith Brett D., High pulse rate pulse power system.

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58. Partlo William N. ; Birx Daniel L. ; Ness Richard M. ; Rothweil Daniel A. ; Melcher Paul C. ; Smith Brett D., High pulse rate pulse power system with fast rise time and low current.

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59. Sandstrom, Richard L.; Ershov, Alexander I.; Partlo, William N.; Fomenkov, Igor V.; Brown, Daniel J. W., High resolution etalon-grating spectrometer.

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60. Birx Daniel L. (Oakley CA), High voltage pulsed power source.

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61. Lee Ja Hyun (37 E. Governer Drive Newport News VA 23602), Hypocycloidal pinch device.

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62. Asik Joseph R. (Bloomfield Hills MI), Ignition system employing plasma spray.

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63. Keeler R. Norris (McLean VA), Imaging lidar systems and K-meters employing tunable and fixed frequency laser transmitters.

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64. Sandstrom, Richard L.; Partlo, William N.; Onkels, Eckehard D., Injection seeded F2 laser with pre-injection filter.

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65. Eckehard D. Onkels ; Palash P. Das ; Thomas P. Duffey ; Richard L. Sandstrom ; Alexander I. Ershov ; William N. Partlo, Injection seeded F2 lithography laser.

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66. Ness, Richard M.; Sandstrom, Richard L.; Partlo, William N.; Ershov, Alexander I., Injection seeded laser with precise timing control.

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67. Roberts Thomas G. (Huntsville AL) Shatas Romas A. (Huntsville AL) Meyer ; III Harry C. (Huntsville AL) Stettler John D. (Huntsville AL), Intense, energetic electron beam assisted X-ray generator.

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68. Kuizenga Dirk J. (Sunnyvale CA), Intra-cavity beam relay for optical harmonic generation.

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69. Asmussen Jes (Okemos MI) Root Joseph J. (East Lansing MI), Ion generating apparatus and method for the use thereof.

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70. Cartz Louis (Milwaukee WI) Weiss Arnold (Minneapolis MN) Schutten Herman P. (Milwaukee WI) Spellman Gordon B. (Mequon WI) Jaskolski Stanley V. (Sussex WI) Wackman ; deceased Peter H. (late of Wauwato, Laser beam plasma pinch X-ray system.

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71. Edelman William (Seal Beach CA) Constantinou Dennis (Corona Del Mar CA) Stefanovski Miles (Santa Ana CA) Jan Yuh L. (El Toro CA) Fahlen Theodore S. (San Jose CA) Hansen Ronald L. (San Jose CA) Kramas, Laser catheter system.

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72. Webb R. Kyle ; Partlo William N., Laser chamber with fully integrated electrode feedthrough main insulator.

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73. Mizoguchi Hakaru (Hiratsuka JPX) Fujimoto Junichi (Hiratsuka JPX) Kowaka Masahiko (Hiratsuka JPX) Takahashi Tomokazu (Hiratsuka JPX), Laser gas replenishing apparatus and method in excimer laser system.

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74. Martin Richardson ; Guido Shriever DE, Laser plasma source for extreme ultraviolet lithography using a water droplet target.

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75. Kroyan, Armen; Lalovic, Ivan; Fomenkov, Igor V.; Das, Palash P.; Sandstrom, Richard L.; Algots, John M.; Ahmed, Khurshid, Laser spectral engineering for lithographic process.

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76. Spangler, Ronald L.; Jacques, Robert N.; Everage, George J.; Anderson, Stuart L.; Palenschat, Frederick A.; Fomenkov, Igor V.; Sandstrom, Richard L.; Partlo, William N.; Algots, John M.; Brown, Danie, Laser wavelength control unit with piezoelectric driver.

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77. Sandstrom Richard L. ; Das Palash P. ; Fomenkov Igor V. ; Besaucele Herve A. ; Ozarski Robert G., Laser-illuminated stepper or scanner with energy sensor feedback.

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78. Visser, Hugo M.; Sandstrom, Richard L.; Bisschops, Theodorus H. J.; Banine, Vadim Y.; Jonkers, Jeroen, Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window.

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79. Hofmann, Thomas; Johanson, Bruce D., Long-pulse pulse power system for gas discharge laser.

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80. Ness Richard M. ; Partlo William N. ; Sandstrom Richard L., Magnetic modulator voltage and temperature timing compensation circuit.

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81. Hammer David A. (Ithaca NY) Kalantar Daniel H. (Ithaca NY) Qi Nian-Sheng (Freeville NY), Method and apparatus for microlithography using x-pinch x-ray source.

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82. Karning, Heinrich; Prein, Franz; Vierling, Karl-Heinz, Method and apparatus for operating a gas laser.

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83. Kondo Hiroyuki,JPX ; Kandaka Noriaki,JPX, Method and apparatus for soft X-ray generation.

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84. Wakabayashi Osamu (Hiratsuka JPX) Kowaka Masahiko (Hiratsuka JPX), Method and system for controlling narrow-band oscillation excimer laser.

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85. Itoh Kazuhiko (Tokyo JPX) Kataoka Izumi (Tokyo JPX), Multilayer film reflector for soft X-rays.

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86. Troy W. Barbee, Jr. ; Sasa Bajt, Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application.

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87. Gupta Rajendra P. (Gloucester CAX) Kekez Mladen M. (Ottawa CAX) Lau John H. (Gloucester CAX) Lougheed Gary D. (Gloucester CAX), Multiple vacuum arc derived plasma pinch x-ray source.

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88. Toda Takeshi,JPX ; Tanaka Yoshinori,JPX ; Kobayakawa Shuji,JPX ; Seki Hiroyuki,JPX ; Tsutsui Masafumi,JPX, Multistage interference canceller.

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89. Samis ; Michael A., Non-equilibrium plasma glow jet.

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90. Horsley William J. (Boulder CO) Tucker Virgil R. (Boulder CO), Open cage density sensor.

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91. Waarts Robert G. ; Sanders Steven ; Welch David F., Optical amplifiers providing high peak powers with high energy levels.

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92. Keeler R. Norris (McLean VA), Optical underwater communications systems employing tunable and fixed frequency laser transmitters.

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93. Benda John A. (Amston CT) Blaszuk Paul R. (Lebanon CT) Palma Gary E. (Bloomfield CT) Smith David C. (Glastonbury CT), Optically pulsed laser.

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94. McGeoch Malcolm W. (Brookline MA), Plasma X-ray source.

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95. Partlo William N., Plasma focus high energy photon source.

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96. Partlo William N. ; Fomenkov Igor V. ; Birx Daniel L., Plasma focus high energy photon source.

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97. Partlo William Norman, Plasma focus high energy photon source.

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98. William N. Partlo ; Igor V. Fomenkov ; Daniel L. Birx, Plasma focus high energy photon source with blast shield.

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99. Melnychuk, Stephan T.; Partlo, William N.; Fomenkov, Igor V.; Ness, Richard M.; Birx late of, Daniel L.; Sandstrom, Richard L.; Rauch, John E., Plasma focus light source with active and buffer gas control.

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100. Partlo, William N.; Fomenkov, Igor V.; Oliver, I. Roger; Ness, Richard M.; Birx, Daniel L., Plasma focus light source with improved pulse power system.

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101. Rauch, John E.; Partlo, William N.; Fomenkov, Igor V.; Ness, Richard M.; Birx, Daniel L.; Sandstrom, Richard L.; Melnychuk, Stephan T., Plasma focus light source with tandem ellipsoidal mirror units.

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102. Birx Daniel, Plasma focus radiation source.

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103. Birx Daniel, Plasma gun and methods for the use thereof.

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104. Endo Hiroshi (Yokosuka JPX), Plasma ignition system.

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105. Giardini Dante S. (Dearborn Hts. MI), Plasma jet ignition engine and method.

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106. Weiss, Arnold; Schutten, Herman P.; Cartz, Louis; Spellman, Gordon B.; Jaskolski, Stanley V.; Wackman, deceased, Peter H., Plasma pinch X-ray apparatus.

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107. Weiss Arnold (Minneapolis MN) Schutten Herman P. (Milwaukee WI) Cartz Louis (Milwaukee WI) Spellman Gordon B. (Mequon WI) Jaskolski Stanley V. (Sussex WI) Wackman ; deceased Peter H. (late of Wauwato, Plasma pinch X-ray method.

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108. Partlo, William N.; Fomenkov, Igor V.; Birx, Daniel L., Plasma pinch high energy with debris collector.

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109. Sandstrom Richard L. ; Besaucele Herve Andre ; Fomenkov Igor V. ; Das Palash P., Pulse energy control for excimer laser.

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110. Sandstrom Richard L., Pulse laser with pulse energy trimmer.

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111. Birx Daniel L. ; Das Palash P. ; Fomenkov Igor V. ; Partlo William N. ; Watson Tom A., Pulse power generating circuit with energy recovery.

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112. Bradford ; Jr. Robert S. (Los Angeles CA) Braverman Leonard W. (Santa Monica CA) Levatter Jeffrey I. (San Clemente CA), Pulsed electric discharge laser utilizing water dielectric blumlein transmission line.

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113. Pascente Joseph E., Pulsed high voltage power supply radiography system having a one to one correspondence between low voltage input pulses and high voltage output pulses.

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114. Myers David W. ; Besaucele Herve A. ; Das Palash P. ; Duffey Thomas P. ; Ershov Alexander I. ; Fomenkov Igor V. ; Hofmann Thomas ; Morton Richard G. ; Ness Richard M. ; Newman Peter C. ; Ozarski Robe, Reliable modular production quality narrow-band high REP rate excimer laser.

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115. Hofmann Thomas ; Hueber Jean-Marc ; Das Palash P. ; Ishihara Toshihiko ; Duffey Thomas P. ; Melchior John T. ; Besaucele Herve A. ; Morton Richard G. ; Ness Richard M. ; Newman Peter C. ; Partlo Will, Reliable, modular, production quality narrow-band high rep rate F.sub.2 laser.

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116. Hofmann, Thomas; Hueber, Jean-Marc; Das, Palash P.; Ishihara, Toshihiko; Duffey, Thomas P.; Melchior, John T.; Besaucele, Herve A.; Morton, Richard G.; Ness, Richard M.; Newman, Peter C.; Partlo, Wil, Reliable, modular, production quality narrow-band high rep rate F2 laser.

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117. Knowles David S. ; Azzola James H. ; Besaucele Herve A. ; Das Palash P. ; Ershov Alexander I. ; Fomenkov Igor V. ; Juhasz Tibor ; Ozarski Robert G. ; Partlo William N. ; Rothweil Daniel A. ; Sandstro, Reliable. modular, production quality narrow-band KRF excimer laser.

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118. Hackell Lloyd A. (Livermore CA), Ring laser having an output at a single frequency.

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119. Birx Daniel L. (Londonderry NH) Reginato Louis L. (Orinda CA), Saturable inductor and transformer structures for magnetic pulse compression.

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120. Foster Richard M. ; Turcu Edmond ; Sasian Jose M. ; Rieger Harry ; Morris James H., Shaped source of soft x-ray, extreme ultraviolet and ultraviolet radiation.

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121. William N. Partlo ; Xiaojiang Pan ; Eckehard D. Onkels, Single chamber gas discharge laser with line narrowed seed beam.

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122. Igor V. Fomenkov ; Frederick G. Erie ; Jesse D. Buck ; Palash P. Das, Smart laser with fast deformable grating.

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123. Morton, Richard G., Spinodal copper alloy electrodes.

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124. Schulz Stephen C., Sputtering of lithium.

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125. Larson Donald Glenn ; deRuyter Anthony John ; Mixon Curtiss Lynn ; Gerent Jerry Rudy, Stabilized laser platform and module interface.

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126. McGeoch, Malcolm W., Star pinch X-ray and extreme ultraviolet photon source.

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127. Janes George Sargent (Lincoln MA) Levy Richard H. (Boston MA) Levin Lawrence A. (Beer Sheva IL), Suppression of unwanted lasing in laser isotope separation.

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128. Anderson Stuart L. (San Diego CA) Sandstrom Richard L. (Encinitas CA), System for, and method of, regulating the wavelength of a light beam.

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129. Long William H. (Torrance CA), Tandem electric discharges for exciting lasers.

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130. Letardi Tommaso (Rome ITX), Transverse discharge excited laser head with three electrodes.

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131. Kumakhov Muradin A. (Moscow SUX), Use of a Kumakhov lens for X-ray lithography.

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132. Kapich Davorin D. (3111 Serrano Dr. Carlsbad CA 92009), Very high speed radial inflow hydraulic turbine.

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133. Alexander I. Ershov ; Eckehard D. Onkels ; Palash P. Das ; William N. Partlo ; Thomas Hofmann, Very narrow band injection seeded F2 lithography laser.

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134. Ershov Alexander I., Very narrow band laser.

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135. Knowles, David S.; Brown, Daniel J. W.; Besaucele, Herve A.; Myers, David W.; Ershov, Alexander I.; Partlo, William N.; Sandstrom, Richard L.; Das, Palash P.; Anderson, Stuart L.; Fomenkov, Igor V.; , Very narrow band, two chamber, high rep rate gas discharge laser system.

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136. Myers, David W.; Besaucele, Herve A.; Ershov, Alexander I.; Partlo, William N.; Sandstrom, Richard L.; Das, Palash P.; Anderson, Stuart L.; Fomenkov, Igor V.; Ujazdowski, Richard C.; Pan, Xiaojiang J, Very narrow band, two chamber, high rep rate gas discharge laser system.

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137. Newman Peter C. ; Sandstrom Richard L., Wavelength system for an excimer laser.

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138. Ward, Michael A. V., Winged reentrant electromagnetic combustion chamber.

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139. Dawson John M. (Los Angeles CA), X-ray generator.

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140. Weiss Arnold (Minneapolis MN) Schutten Herman P. (Milwaukee WI) Cartz Louis (Milwaukee WI) Spellman Gordon B. (Mequon WI) Jaskolski Stanley V. (Sussex WI) Wackman ; deceased Peter H. (late of Wauwato, X-ray lithography system.

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141. Iwamatsu, Seiichi, X-ray source.

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142. Okada Ikuo (Isehara JPX) Saitoh Yasunao (Isehara JPX) Yoshihara Hideo (Yokohama JPX) Nakayama Satoshi (Sayama JPX), X-ray source and X-ray lithography method.

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이 특허를 인용한 특허 (20) 인용/피인용 타임라인 분석

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2. Bykanov, Alexander N.; Ershov, Alexander I., Debris protection system having a magnetic field for an EUV light source.

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3. Sandstrom, Richard L.; Chung, Tae (Mark) H.; Ujazdowski, Richard C., Extendable electrode for gas discharge laser.

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4. Sandstrom, Richard L.; Chung, Tae (Mark) H.; Ujazdowski, Richard C., Extendable electrode for gas discharge laser.

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5. Sandstrom, Richard L.; Chung, Tae (Mark) H.; Ujazdowski, Richard C., Extendable electrode for gas discharge laser.

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6. Nagai, Shinji; Abe, Tamotsu; Ishihara, Takanobu; Wakabayashi, Osamu, Extreme ultraviolet light generation apparatus.

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7. Ueda, Atsushi; Nagai, Shinji; Ueno, Yoshifumi; Abe, Tamotsu, Extreme ultraviolet light generation device.

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8. Asayama, Takeshi; Kakizaki, Kouji; Endo, Akira; Nagai, Shinji, Extreme ultraviolet light source apparatus.

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9. Asayama, Takeshi; Kakizaki, Kouji; Endo, Akira; Nagai, Shinji, Extreme ultraviolet light source apparatus.

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10. Asayama, Takeshi; Kakizaki, Kouji; Endo, Akira; Nagai, Shinji, Extreme ultraviolet light source apparatus.

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11. Bykanov, Alexander N.; Ershov, Alexander I.; Fomenkov, Igor V.; Brandt, David C., Gas management system for a laser-produced-plasma EUV light source.

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12. Bykanov, Alexander N.; Ershov, Alexander I.; Fomenkov, Igor V.; Brandt, David C., Gas management system for a laser-produced-plasma EUV light source.

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13. Bykanov, Alexander N.; Bowering, Norbert; Fomenkov, Igor V.; Brandt, David C.; Ershov, Alexander I.; Khodykin, Oleh; Partlo, William N., Laser produced plasma EUV light source.

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14. Bykanov, Alexander N.; Bowering, Norbert; Fomenkov, Igor V.; Ershov, Alexander I.; Khodykin, Oleh, Laser produced plasma EUV light source.

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15. Ershov, Alexander I.; Fomenkov, Igor V., Laser-produced-plasma EUV light source.

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16. Fujimoto, Kazuki, Light source.

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17. Van Der Velden,Marc Hubertus Lorenz; Banine,Vadim Yevgenyevich; Mertens,Bastiaan Matthias; Moors,Johannes Hubertus Josephina; Weiss,Markus; Wolschrijn,Bastiaan Theodoor; Nijkerk,Michiel D., Lithographic apparatus, system and device manufacturing method.

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18. Ueno, Yoshifumi; Moriya, Masato; Nakano, Masaki; Komori, Hiroshi, Optical element contamination preventing method and optical element contamination preventing device of extreme ultraviolet light source.

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19. Kuritsyn, Alexey; Bykanov, Alexander; Kanouff, Michael; Khodykin, Oleg, Plasma-based light source.

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20. Bykanov, Alexander N.; Brandt, David C.; Fomenkov, Igor V.; Partlo, William N., System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus.

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