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Wafer carrier for growing GaN wafers 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 US-0975902 (2004-10-28)
발명자 / 주소
  • Boguslavskiy,Vadim
  • Gurary,Alex
  • Stall,Richard A.
출원인 / 주소
  • Veeco Instruments Inc.
대리인 / 주소
    Lerner, David, Littenberg, Krumholz & Mentlik, LLP
인용정보 피인용 횟수 : 31  인용 특허 : 30

초록

초록이 없습니다.

대표청구항

대표청구항이 없습니다.

이 특허에 인용된 특허 (30)

  1. Stall Richard A. (Warren NJ) Tompa Gary S. (Somerville NJ) Gurary Alexander (Bridgewater NJ) Nelson Craig R. (Berkeley Heights NJ), Apparatus for depositing a coating on a substrate.
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  2. Hasegawa Shinya (Tokyo JPX) Mizuno Shigeru (Kanagawaken-ken JPX) Watanabe Kazuhito (Kanagawaken-ken JPX) Takahashi Nobuyuki (Tokyo JPX) Tagami Manabu (Tokyo JPX) Yoshimura Takanori (Tokyo JPX) Sahase, CVD apparatus.
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  3. Gurary Alexander I. ; Beherrell Scott ; Boguslavskiy Vadim, CVD reactor for uniform heating with radiant heating filaments.
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  4. Li Tingkai ; Scott Dane C. ; Wyckoff Brian, Chemical vapor deposition chamber having an adjustable flow flange.
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  5. Shinichi Namioka JP; Takaaki Inoue JP, Chuck table.
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  6. Farnworth Warren M., Complete blade and wafer handling and support system without tape.
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  7. Goldin ; Grigory Borisovich ; Khlebnikov ; Valentin Petrovich ; Jushk ov ; Jury Vasilievich ; Maslov ; Vadim Nikolaevich ; Korobov ; Oleg Ev genievich ; Kuklev ; Vladimir Petrovich ; Demyanets ; Vlad, Device for epitaxial growing of semiconductor periodic structures from gas phase.
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  8. Divakar, Ramesh, Electrostatic chuck and method for forming an electrostatic chuck having porous regions for fluid flow.
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  9. Li Ting Kai ; Gurary Alexander I. ; Scott Dane C., Liquid vaporizer system and method.
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  10. White Carl (Gilbert AZ) MacErnie Jon R. (Chandler AZ) Hillman Joseph T. (Scottsdale AZ), Method and apparatus for isolating a susceptor heating element from a chemical vapor deposition environment.
    상세보기
  11. Charles Chiun-Chieh Yang ; Robert W. Standley, Modified susceptor for use in chemical vapor deposition process.
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  12. McDiarmid James (San Jose CA), Rotary/linear actuator for closed chamber, and reaction chamber utilizing same.
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  13. Foster Robert F. (Weston MA) Rebenne Helen E. (Fair Lawn NJ) LeBlanc Rene E. (Branford CT) White Carl L. (Gilbert AZ) Arora Rikhit (Mesa AZ), Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD.
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  14. Berry Anthony (Huntsville AL) Nerren Billy H. (Meridianville AL), Sample holder support for microscopes.
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  15. Sommer Peter (Duisburg DEX), Screen printing apparatus.
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  16. Kinoshita Yoshimi (Amagasaki JPX) Kanda Tomoyuki (Amagasaki JPX) Kitano Katsuhisa (Amagasaki JPX) Yoshida Kazuo (Amagasaki JPX) Ohnishi Hiroshi (Amagasaki JPX) Yamanishi Kenichiro (Amagasaki JPX) Sas, Semiconductor producing apparatus comprising wafer vacuum chucking device.
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  17. Kinoshita Yoshimi,JPX ; Kanda Tomoyuki,JPX ; Kitano Katsuhisa,JPX ; Yoshida Kazuo,JPX ; Ohnishi Hiroshi,JPX ; Yamanishi Kenichiro,JPX ; Sasaki Shigeo,JPX ; Komori Hideki,JPX ; Eshima Taizo,JPX ; Tsut, Semiconductor producing apparatus, and wafer vacuum chucking device, gas cleaning method and nitride film forming method.
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  18. Stewart David R. (Sacramento CA), Spincup with a wafer backside deposition reduction apparatus.
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  19. Nilsson Boo (Hoffman Estates IL), Substrate holder for wafers during MBE growth.
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  20. Yoshioka Katsushi,JPX ; Ogura Hiroyuki,JPX ; Sanari Takuya,JPX, Substrate processing apparatus.
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  21. Semyon Sherstinsky ; Calvin Augason ; Leonel A. Zuniga ; Jun Zhao ; Talex Sajoto ; Leonid Selyutin ; Joseph Yudovsky ; Maitreyee Mahajani ; Steve G. Ghanayem ; Tai T. Ngo ; Arnold Kholodenk, Substrate support member for a processing chamber.
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  22. Burk ; Jr. Albert A., Susceptor for an epitaxial growth factor.
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  23. Foster Robert F. (Phoenix AZ) Shekerjian Brian (Tempe AZ) Hillman Joseph T. (Scottsdale AZ), Thermal cycle resistant seal and method of sealing for use with semiconductor wafer processing apparatus.
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  24. Hiyamizu Makoto (Saitama JPX) Nagashima Kazuhiro (Tochigi JPX) Tani Yasuhiro (Tokyo JPX), Vacuum chuck.
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  25. Cripe Jerry D. (Tempe AZ) Martinez ; Jr. Joe L. (Phoenix AZ), Vacuum chuck with venturi jet for converting positive pressure to a vacuum.
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  26. Ohmine Toshimitsu (Tokyo JPX) Akagawa Keiichi (Yamato JPX) Ishihata Akira (Tokyo JPX), Vapor deposition apparatus.
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  27. Ohkubo Yasunori,JPX ; Satoh Hiroshi,JPX ; Miyazawa Yoshihiro,JPX, Wafer bonding device.
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  28. Gurary Alexander I. ; Beherrell Scott ; Boguslavskiy Vadim, Wafer carrier with flexible wafer flat holder.
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  29. Gurary Alexander I. ; Armour Eric A. ; Collins Douglas A. ; Stall Richard A., Wafer carriers for epitaxial growth processes.
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  30. Ishikawa, Toshihiko; Katagiri, Yasushi, Wafer surface machining apparatus.
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이 특허를 인용한 특허 (31)

  1. Foote, David K.; Getty, James D., Apparatus and methods for supporting workpieces during plasma processing.
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  2. Begarney, Michael J.; Campanale, Frank J., Chemical vapor deposition reactor.
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  3. Fukushima, Makoto; Yasuda, Hozumi; Nabeya, Osamu; Watanabe, Katsuhide; Namiki, Keisuke, Elastic membrane for semiconductor wafer polishing.
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  4. Fukushima, Makoto; Yasuda, Hozumi; Nabeya, Osamu; Watanabe, Katsuhide; Namiki, Keisuke, Elastic membrane for semiconductor wafer polishing.
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  5. Foad, Majeed A.; Newman, Jacob; Marin, Jose Antonio; Hoffman, Daniel J.; Moffatt, Stephen; Verhaverbeke, Steven, HDD pattern implant system.
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  6. Wallace, Jay R.; Hamelin, Thomas, High throughput processing system for chemical treatment and thermal treatment and method of operating.
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  7. Krishnan, Sandeep; Moy, Keng; Gurary, Alexander I.; King, Matthew; Boguslavskiy, Vadim; Krommenhoek, Steven, Keyed spindle.
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  8. Krishnan, Sandeep; Moy, Keng; Gurary, Alexander I.; King, Matthew; Boguslavskiy, Vadim; Krommenhoek, Steven, Keyed spindle.
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  9. Krishnan, Sandeep; Moy, Keng; Gurary, Alexander I.; King, Matthew; Boguslavskiy, Vadim; Krommenhoek, Steven, Keyed wafer carrier.
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  10. Krishnan, Sandeep; Moy, Keng; Gurary, Alexander I.; King, Matthew; Boguslavskiy, Vadim; Krommenhoek, Steven, Keyed wafer carrier.
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  11. Krishnan, Sandeep; Moy, Keng; Gurary, Alexander I.; King, Matthew; Boguslavskiy, Vadim; Krommenhoek, Steven, Multi-keyed spindle.
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  12. Krishnan, Sandeep; Moy, Keng; Gurary, Alexander I.; King, Matthew; Boguslavskiy, Vadim; Krommenhoek, Steven, Multi-keyed wafer carrier.
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  13. Krishnan, Sandeep; Moy, Keng; Gurary, Alexander I.; King, Matthew; Boguslavskiy, Vadim; Krommenhoek, Steven, Spindle key.
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  14. Krishnan, Sandeep; Moy, Keng; Gurary, Alexander I.; King, Matthew; Boguslavskiy, Vadim; Krommenhoek, Steven, Spindle key.
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  15. Wallace, Jay R.; Takahashi, Hiroyuki, Substrate support for high throughput chemical treatment system.
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  16. Honma, Manabu; Hishiya, Katsuyuki, Top plate for reactor for manufacturing semiconductor.
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  17. Honma, Manabu; Hishiya, Katsuyuki, Top plate for reactor for manufacturing semiconductor.
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  18. Honma, Manabu; Hishiya, Katsuyuki, Top plate for reactor for manufacturing semiconductor.
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  19. Honma, Manabu; Hishiya, Katsuyuki, Top plate for reactor for manufacturing semiconductor.
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  20. Chang, Chung-Ying; Yang, Tzu-Ching, Wafer carrier.
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  21. Chang, Chung-Ying; Yang, Tzu-Ching; Chang, Chia-Sheng, Wafer carrier.
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  22. Gurary, Alexander I.; Moy, Keng; Chang, Chenghung Paul, Wafer carrier having pockets.
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  23. Gurary, Alexander I.; Moy, Keng; Chang, Chenghung Paul, Wafer carrier having pockets.
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  24. Gurary, Alexander I.; Moy, Keng; Chang, Paul, Wafer carrier having pockets.
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  25. Gurary, Alexander I.; Moy, Keng; Chang, Paul, Wafer carrier having pockets.
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  26. Krishnan, Sandeep; Moy, Keng, Wafer carrier having pockets.
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  27. Krishnan, Sandeep; Quinn, William E.; Montgomery, Jeffery S.; Mangum, Joshua; Urban, Lukas, Wafer carrier having provisions for improving heating uniformity in chemical vapor deposition systems.
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  28. Krishnan, Sandeep; Moorkannaiah, Raghu, Wafer carrier with a 14-pocket configuration.
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  29. Krishnan, Sandeep; Moy, Keng, Wafer carrier with a 31-pocket configuration.
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  30. Gurary, Alexander; Deshpande, Mandar; Parekh, Aniruddh; Rashkovsky, Yuliy, Wafer carrier with a multi-pocket configuration.
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  31. Gurary, Alexander; Deshpande, Mandar; Parekh, Aniruddh; Rashkovsky, Yuliy, Wafer carrier with a multi-pocket configuration.
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