[특허]Flash curing in selective deposition modeling

[미국특허] Flash curing in selective deposition modeling 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B29C-035/08
출원번호	US-0140426 (2002-05-07)
등록번호	US-7270528 (2007-09-18)
발명자 / 주소	Sherwood,Michael Thomas
출원인 / 주소	3D Systems, Inc.
대리인 / 주소	Summa, Allan & Addition, P.A.
인용정보	피인용 횟수 : 8 인용 특허 : 28

초록 ▼

A flash curing system for solid freeform fabrication which generates a plurality of radiation emitting pulses that forms a planar flash. The planar flash initiates curing of a curable material dispensed by a solid freeform fabrication apparatus. The radiation emitting pulses have a high peak power value that releases a sufficient quantity of free radicals from the photoinitiator to initiate curing and overcome the problem of oxygen inhibition. Substantially less power is consumed and less heat generated by the flash curing system compared to conventional continuous emission curing systems.

대표청구항 ▼

What is claimed is: 1. A selective deposition modeling apparatus for forming a three-dimensional object from a curable build material in a build environment, the apparatus receiving data corresponding to layers of the three-dimensional object, the apparatus comprising: a support platform, affixed to the apparatus for supporting the three-dimensional object in the build environment; a print head affixed to the apparatus and in communication with the support platform for selectively dispensing the curable build material and a non-curable support material, in the build environment according to the computer data to form the layers of the three-dimensional object, the curable build material including both a photocurable component and a non-photocurable wax component; a planarizer rotably and movably mounted to the apparatus and cooperative with the print head to smooth and normalize the layers dispensed by the print head; and a flash exposure device having an average power consumption level of less than about 1000 watts, said flash exposure device connected to the print head and in communication with the support platform for exposing the dispensed material in the build environment to at least one planar flash of radiation, the planar flash comprising a plurality of radiation emitting pulses to release an effective amount of free radicals from a photoinitiator to overcome oxygen inhibition and to initiate curing of the photocurable component in the dispensed curable build material. 2. The apparatus of claim 1 wherein the support platform reciprocates along a fixed path with respect to the print head. 3. The apparatus of claim 1 wherein the flash exposure device and the print head are positioned above the support platform. 4. The apparatus of claim 1 further comprising the flash exposure device emitting radiation from the pulses having wavelengths of between about 200 to about 400 nanometers to initiate curing of the dispensed material. 5. The apparatus of claim 1 wherein the flash exposure device comprises at least one lamp that emits the radiation, the lamp selected from the group consisting of a light-emitting-diode lamp, a microwave-powered lamp, a xenon lamp, a xenon-mercury lamp, a xenon-metal halide lamp, and combinations thereof. 6. The apparatus of claim 1 wherein the flash exposure device comprises a reflector housing assembly holding a xenon lamp which directs the at least one planar flash of radiation generated by the exposure means to expose a planar area of at least about 10 square inches in the build environment.

이 특허에 인용된 특허 (28) 인용/피인용 타임라인 분석

Khoshevis Behrokh (Los Angeles CA), Additive fabrication method.
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Crump S. Scott (Minnetonka MN), Apparatus and method for creating three-dimensional objects.
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Menhennett Herbert E. (Easley SC) Brown Robert B. (Duncan SC), Apparatus and method for making three-dimensional articles using bursts of droplets.
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Gothait Hanan,ILX, Apparatus and method for three dimensional model printing.
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Bui Loc V. ; Doan Vu ; Kwo Kelly, Compositions and methods for selective deposition modeling.
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Desobry Vincent (Marly CHX), Fluorine-free titanocenes and the use thereof.
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Fong, Jon Jody, Layer normalizing device for selective deposition modeling.
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Retallick David (Munsterhausen DEX) Langer Hans J. (Grafelfing DEX), Method and apparatus for producing a three-dimensional object.
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Penn Steven M. (Plano TX) Jones David N. (Dallas TX) Embree Michael E. (The Colony TX), Method and apparatus for the computer-controlled manufacture of three-dimensional objects from computer data.
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Helinski Richard (56 Gowing Rd. Hudson NH 03051), Method and means for constructing three-dimensional articles by particle deposition.
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Batchelder John Samuel ; Crump Steven Scott, Method for rapid prototyping of solid models.
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Leyden Richard N. ; Hull Charles W., Method for selective deposition modeling.
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Yabe Akira (Ibaraki JPX) Niino Hiroyuki (Ibaraki JPX) Shimoyama Masashi (Tokyo JPX), Method of forming a thin electroconductive film.
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Yang Michael Wen-Chein ; Kanga Rustom Sam ; Randall Alvin Varnard, Method of making laser imaged printing plates utilizing ultraviolet absorbing layer.
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Crump S. Scott (Minnetonka MN), Modeling apparatus for three-dimensional objects.
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Newell, Kenneth J.; Ruatta, Stephen A.; Stockwell, John S., Post processing three-dimensional objects formed by selective deposition modeling.
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Titterington Donald R. (Tualatin OR) Bui Loc V. (Portland OR) Hirschy Linda M. (Portland OR) Jaeger C. Wayne (Beaverton OR), Reactive ink compositions and systems.
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Cohen Adam L. (Sherman Oaks CA), Resin film recoating method and apparatus.
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Crawford, Clark W., Selective deposition modeling build style providing enhanced dimensional accuracy.
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Leyden Richard N. ; Hull Charles W. ; That Dinh Ton, Selective deposition modeling materials and method.
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Schmidt, Kris Alan, Selective deposition modeling with curable phase change materials.
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Young ; Jr. Albert C., Stereolithography layering control system.
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Thomas A. Kerekes, Surface scanning system for selective deposition modeling.
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Masters William E. (313 Dogwood La. Easley SC 29640), System and method for computer automated manufacture with reduced object shape distortion.
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Gothait, Hanan, System and method for three dimensional model printing.
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Sachs Emanuel M. (Somerville MA) Haggerty John S. (Lincoln MA) Cima Michael J. (Lexington MA) Williams Paul A. (Concord MA), Three-dimensional printing techniques.
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Sachs Emanuel M. (Somerville) Haggerty John S. (Lincoln) Cima Michael J. (Lexington) Williams Paul A. (Concord MA), Three-dimensional printing techniques.
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Schmidt, Kris Alan; Doan, Vu A.; Xu, Pingyong; Stockwell, John S.; Holden, Susan Kay, Ultra-violet light curable hot melt composition.
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이 특허를 인용한 특허 (8) 인용/피인용 타임라인 분석

Kläber, Nico, Kitchen appliance especially a food printer.
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Okuyama, Masayuki, Liquid droplet discharging method, and liquid droplet discharging apparatus.
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Vermeer, Adrianus Johannes Petrus Maria; Maalderink, Herman Hendrikus; Jamar, Jacobus Hubertus Theodoor; Rijfers, Andries; Vaes, Mark Herman Else, Method and apparatus for layerwise production of a 3D object.
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Vermeer, Adrianus Johannes Petrus Maria; Maalderink, Herman Hendrikus; Jamar, Jacobus Hubertus Theodoor; Rijfers, Andries; Vaes, Mark Herman Else, Method and apparatus for layerwise production of a 3D object.
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Lim, Jin Hong; Angulo, Hernando Vicente; Clay, John D.; Moussa, Khalil, Selective deposition modeling using CW UV LED curing.
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Vermeer, Adrianus Johannes Petrus Maria; Maalderink, Herman Hendrikus; Jamar, Jacobus Hubertus Theodoor; Rijfers, Andries; Vaes, Mark Herman Else; Bauman, Brian; Thomas, Richard, System and method for layerwise production of a tangible object.
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Folkins, Jeffrey J.; Donaldson, Patricia J., System for controlling operation of a printer during three-dimensional object printing with reference to a distance from the surface of object.
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West,Thomas George; Liu,Qing; Materna,Peter A.; Litwak,Alfred Anthony; Gaylo,Christopher M., Three-dimensional printing apparatus and methods of manufacture including sterilization or disinfection, for example, using ultraviolet light.
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[미국특허] Flash curing in selective deposition modeling 원문보기

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[미국특허] Flash curing in selective deposition modeling 원문보기

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