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System for controlling a volume of material on a mold 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B29C-031/00
출원번호 US-0101139 (2005-04-07)
등록번호 US-7281919 (2007-10-16)
발명자 / 주소
  • Shackleton,Steven C.
  • McMackin,Ian M.
  • Lad,Pankaj B.
  • Truskett,Van N.
출원인 / 주소
  • Molecular Imprints, Inc.
대리인 / 주소
    Fish & Richardson P.C.
인용정보 피인용 횟수 : 17  인용 특허 : 30

초록

A system for controlling a volume of liquid on a mold that features a body defining a volume with an aperture formed into the body and positioned proximate to the mold. A pump system is in fluid communication with the body, and the aperture and the pump system are established to create a stream of f

대표청구항

What is claimed is: 1. A system for controlling a volume of liquid on a mold, said system comprising: a body defining a void with an aperture formed into said body and positioned proximate to said mold, with an air bearing being disposed on opposed sides of said aperture, defining a pair of spaced-

이 특허에 인용된 특허 (30)

  1. Kirk Lester C., Apparatus for dispensing valuable bulk commodities and method therefor.
  2. Beltz, John P.; Hang, Kenneth W., Automatic liquid dispensing apparatus for spinning surface of uniform thickness.
  3. Sudolcan, David C.; Chadwell, Thomas J., Beverage dispenser including an improved electronic control system.
  4. Simard Gilbert,CAX, Beverage dispensing system for bar.
  5. Falcoff Allan F. (Lake Orion MI), Computerized spray machine.
  6. James P. Gardner, Jr., Data processing system for managing chemical product usage.
  7. Begemann Ulrich (Leonberg DEX) Heinzmann Helmut (Bohmenkirch DEX) Ruf Wolfgang (Heidenehim DEX), Device and method for changing the flow resistance of a fluid flow control device.
  8. Peckels Arganious E. (Ogilvie MN), Electronic dispensing heads.
  9. Zengerle, Roland; Hey, Nicolaus; Gruhler, Holger; Freygang, Michael; Mueller, Martin, Fluids manipulation device with format conversion.
  10. Smith James C. ; Hogan Patrick T. ; Saidman Laurence B., Method and apparatus for dispensing small amounts of liquid material.
  11. Keyworth Barrie Peter,CAX ; McMullin James Neil,CAX, Method and apparatus for making optical components by direct dispensing of curable liquid.
  12. Cavallaro William A. ; Bibeault Steven P. ; Gordon Jules, Method and apparatus for measuring the size of drops of a viscous material dispensed from a dispensing system.
  13. Cavallaro William A. ; Fugere Jeffrey P. ; O'Neil Todd Edwin ; Kaplan John ; Franklin Stephen M., Method and apparatus for measuring the size of drops of a viscous material dispensed from a dispensing system.
  14. Seshan, Ramanathan, Method and apparatus for programming a paste dispensing machine.
  15. Nishizawa Akira (Yokohama JPX) Kondo Tetsuya (Yokohama JPX), Method and apparatus for the fabrication of optical record media such as a digital audio disc.
  16. Liebl Roland,DEX, Method and device for transferring ink in a printing unit of an offset printing press.
  17. Grinberg, Grigoriy; Collins, David Robert; Shade, Matthew M., Method of making a spray formed article.
  18. Suleski Thomas J., Method of making optical replicas by stamping in photoresist and replicas formed thereby.
  19. Chou Stephen Y., Nanoimprint lithography.
  20. Donges William E., No-flow flux and underfill dispensing methods.
  21. Seiichi Sato JP; Hitoshi Mukojima JP; Nobuyuki Iwashita JP; Nobuyuki Suefuji JP; Mitsuru Ozono JP, Paste application method for die bonding.
  22. Biebuyck Hans,CHX ; Delamarche Emmanuel,CHX ; Bruno Michel,CHX ; Schmid Heinz,CHX, Patterning device for patterning a substrate with patterning cavities fed by service cavities.
  23. Nebashi, Satoshi; Nishikawa, Takao; Shimoda, Tatsuya, Patterning method, patterning apparatus, patterning template, and method for manufacturing the patterning template.
  24. Shirley Paul, Process liquid dispense method and apparatus.
  25. Nicol, Gorham, Programmable beverage dispensing apparatus.
  26. Chou Stephen Y., Release surfaces, particularly for use in nanoimprint lithography.
  27. Hashimoto, Kenji, Resin encapsulating apparatus used in a manufacture of a semiconductor device.
  28. Hiraoka Hiroyuki (Saratoga CA), Spray silylation of photoresist images.
  29. Carlton Grant Willson ; Matthew Earl Colburn, Step and flash imprint lithography.
  30. Watts, Michael P. C.; Choi, Byung-Jin; Sreenivasan, Sidlgata V., System and method for dispensing liquids.

이 특허를 인용한 특허 (17)

  1. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Capillary imprinting technique.
  2. Schumaker, Philip D., Drop pattern generation for imprint lithography.
  3. Schumaker, Philip D., Drop pattern generation with edge weighting.
  4. Khusnatdinov, Niyaz; Jones, Christopher Ellis; Perez, Joseph G.; LaBrake, Dwayne L.; McMackin, Ian Matthew, Extrusion reduction in imprint lithography.
  5. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Meissl, Mario Johannes, Imprint lithography system and method.
  6. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Method and system for double-sided patterning of substrates.
  7. Xu, Frank; McMackin, Ian; Lad, PanKaj B.; Watts, Michael P. C., Method for controlling distribution of fluid components on a body.
  8. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian M.; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
  9. McMackin, Ian M.; Lad, Pankaj B.; Truskett, Van N., Method for fast filling of templates for imprint lithography using on template dispense.
  10. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
  11. Kawamura, Yoshihisa; Shiobara, Eishi; Ito, Shinichi, Pattern forming method.
  12. Sreenivasan, Sidlgata V.; Schumaker, Philip D., Patterning a plurality of fields on a substrate to compensate for differing evaporation times.
  13. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Patterning substrates employing multiple chucks.
  14. Nguyen, Houng T.; Xu, Ren; Barnes, Michael S., Process for optimization of island to trench ratio in patterned media.
  15. Schumaker, Philip D., Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement.
  16. Xu, Frank Y.; Khusnatdinov, Niyaz, Single phase fluid imprint lithography method.
  17. Sreenivasan, Sidlgata V.; Choi, Byung J.; Schumaker, Norman E.; Voisin, Ronald D.; Watts, Michael P. C.; Meissl, Mario J., Step and repeat imprint lithography processes.
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