초록 ▼

An interconnect structure a substrate, a contact pad disposed over a surface of the substrate, and an insulative mask disposed over the contact pad. The insulative mask can include an opening that is aligned over and exposes an inner portion of the contact pad. The inner portion of the contact pad i

An interconnect structure a substrate, a contact pad disposed over a surface of the substrate, and an insulative mask disposed over the contact pad. The insulative mask can include an opening that is aligned over and exposes an inner portion of the contact pad. The inner portion of the contact pad includes a compliant layer and a conductive layer that is disposed over the compliant layer. The inner portion of the contact pad has sufficient flexibility to distribute mechanical stress applied to the contact pad and can mitigate damage to the interconnect structure.

대표청구항 ▼

What is claimed is: 1. An interconnect structure comprising: a substrate; a conductive contact pad having a first elastic modulus, disposed over a portion of the substrate surface, having an inner portion and an outer portion surrounding the inner portion; a compliant layer having a second elastic

What is claimed is: 1. An interconnect structure comprising: a substrate; a conductive contact pad having a first elastic modulus, disposed over a portion of the substrate surface, having an inner portion and an outer portion surrounding the inner portion; a compliant layer having a second elastic modulus lower than the first elastic modulus, disposed directly under the inner portion of the contact pad but not under the outer portion of the contact pad; wherein said compliant layer having a thickness greater than the thickness of said outer portion the portion of the contact pad over the compliant layer having a thickness thinner than the thickness of the outer portion of the contact pad; and an insulative mask disposed over the contact pad including an opening that exposes the inner portion of the contact pad. 2. The interconnect structure of claim 1, in which the contact pad comprises a conductive metal and the compliant layer comprises a metal. 3. The interconnect structure of claim 1, in which the contact pad comprises copper and the compliant layer comprises a material having an elastic modulus lower than the elastic modulus of copper. 4. The interconnect structure of claim 3, in which the compliant layer has pores, apertures, and voids. 5. The interconnect structure of claim 1, in which the inner portion of the contact pad is more flexible than the outer portion. 6. The interconnect structure of claim 1, in which the opening uncovers a substantially planar contact surface. 7. The interconnect structure of claim 1, further including a solder contact attached to the contact surface, the solder contact including a contact portion defined by the opening of the insulative mask. 8. The interconnect structure of claim 7, in which the thickness of the compliant layer is greater than the thickness of the outer portion of the contact pad. 9. The interconnect structure of claim 1, in which the contact pad comprises a conductive metal and the compliant layer comprises a polymer. 10. The interconnect structure of claim 1, in which the contact pad comprises a conductive metal and the compliant layer comprises a dielectric material. 11. A semiconductor device comprising: a substrate; a conductive contact pad having a first elastic modulus, disposed over the substrate surface, having an inner portion and an outer portion of the same conductive material, the inner portion having a first thickness, the outer portion parallel to the substrate surface, having a second thickness greater than the first thickness and enclosing the inner portion; a compliant layer having a second elastic modulus lower than the first elastic modulus, disposed directly under the contact pad, covered by the inner portion of the contact pad and contacting the outer portion of the contact pad; wherein said compliant layer having a thickness greater than the thickness of said outer portion; and an insulative mask disposed over the contact pad including an opening that exposes a portion of the outer portion and the inner portion of the contact pad. 12. The semiconductor device of claim 11, in which the inner portion and the outer portion of the contact pad are co-planar. 13. The semiconductor device of claim 11, in which the outer portion has a first bottom surface, the compliant layer has a second bottom surface, and the first and the second bottom surfaces are co-planar. 14. The semiconductor device of claim 11, in which the compliant layer has a thickness greater than the second thickness.