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Metallic nano-optic lenses and beam shaping devices 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G02B-009/00
출원번호 US-0001154 (2004-12-02)
등록번호 US-7315426 (2008-01-01)
발명자 / 주소
  • Kim,Hong Koo
  • Sun,Zhijun
  • Capelli,Christopher C.
출원인 / 주소
  • University of Pittsburgh
대리인 / 주소
    Foley & Lardner LLP
인용정보 피인용 횟수 : 10  인용 특허 : 37

초록

A nano-optic device comprises a plurality of subwavelength apertures in a metal film or between metal islands. The device is adapted to shape a radiation beam transmitted there through. For example, beam shaping includes at least one of beam focusing, beam bending and beam collimating.

대표청구항

What is claimed is: 1. A nano-optic device comprising a plurality of subwavelength apertures in a metal film or between metal islands, wherein the device is adapted to shape a radiation beam transmitted there through and wherein: each aperture has a width that is less than a first peak wavelength o

이 특허에 인용된 특허 (37)

  1. Greve Jeffrey M. ; McClelland Alan ; Davis Gary, Antiviral methods using fragments of human rhinovirus receptor (ICAM-1).
  2. Greve, Jeffrey M.; McClelland, Alan; Davis, Gary, Antiviral methods using human rhinovirus receptor (ICAM-1).
  3. Dickson, Robert M.; Lyon, Louis A., Apparatus and method of optical transfer and control in plasmon supporting metal nanostructures.
  4. Finlan Martin F. (Aylesbury GB2) Midgley John E. M. (Little Chalfont GB2) Charles Stephen A. (Little Chalfont GB2) Irlam James C. (Staines GB2), Biological sensors.
  5. Goodman Douglas S. (Yorktown Heights NY), Confocal method and apparatus for focusing in projection lithography.
  6. Wang Yu, Efficient color display using low-absorption in-pixel color filters.
  7. Murai Fumio (Nishitama JPX) Okazaki Shinji (Urawa JPX) Yoda Haruo (Nishitama JPX) Shibata Yukinobu (Ibaraki JPX) Tsukizoe Akira (Koganei JPX), Electron beam lithography using an aperture having an array of repeated unit patterns.
  8. Ebbesen Thomas W. ; Grupp Daniel E. ; Thio Tineke ; Lezec Henri J.,FRX, Enhanced optical transmission apparatus utilizing metal films having apertures and periodic surface topography.
  9. Kim Tae Jin ; Krishnan Ajit ; Thio Tineke ; Lezec Henri Joseph,FRX ; Ebbesen Thomas W.,FRX, Enhanced optical transmission apparatus with improved inter-surface coupling.
  10. Karrai Khaled (Munich DEX), Far-field characterization of sub-wavelength sized apertures.
  11. Jorgenson Ralph C. (Mercer Island WA) Yee Sinclair S. (Seattle WA), Fiber optic sensor and methods and apparatus relating thereto.
  12. Jorgenson Ralph C. (Mercer Island WA) Yee Sinclair S. (Seattle WA), Fiber optic sensor and methods and apparatus relating thereto.
  13. Jorgenson Ralph C. ; Yee Sinclair S., Fiber optic sensor and methods and apparatus relating thereto.
  14. Melendez Jose L. ; Carr Richard A. ; Smith Patrick Paul ; Bartholomew Dwight U. ; Berlien ; Jr. John H. ; Geyer Frederick F. ; Breedlove Paul S., Fixed optic sensor system and distributed sensor network.
  15. Melendez Jose L. ; Carr Richard A. ; Smith Patrick Paul ; Bartholomew Dwight U. ; Berlien ; Jr. John H. ; Geyer Frederick F. ; Breedlove Paul S., Fixed optic sensor system and distributed sensor network.
  16. Simon H. J. (Toledo OH) Wang Yu (Toledo OH), Liquid crystal flat panel color display with surface plasmon scattering.
  17. Isaacson Michael (Ithaca NY) Lewis Aaron (Ithaca NY), Method and apparatus for production and use of nanometer scale light beams.
  18. Isaacson Michael (Ithaca NY) Lewis Aaron (Ithaca NY), Method and apparatus for production and use of nanometer scale light beams.
  19. Gunther Rolf,DEX, Method and device for the determination of material-specific parameters of one or a few molecules by means of correlatio.
  20. Tanaka Yoshiharu (Tokyo JPX) Kouno Eiichi (Tokyo JPX) Iwata Joji (Tokyo JPX), Method of alignment between mask and semiconductor wafer.
  21. Quate Calvin F. (Stanford CA), Near field scanning optical and force microscope including cantilever and optical waveguide.
  22. Ebbesen Thomas W. ; Ghaemi Hadi F. ; Thio Tineke ; Wolff Peter A., Near-field scanning optical microscope having a sub-wavelength aperture array for enhanced light transmission.
  23. Wolff Peter A., Near-field scanning optical microscope probe exhibiting resonant plasmon excitation.
  24. Murphy Kent A. ; Jones Mark E., Optical fiber long period sensor having a reactive coating.
  25. Hill, Henry Allen, Optical storage system based on scanning interferometric near-field confocal microscopy.
  26. Thompson Leo J. ; Anemogiannis Emmanuel, Optical surface plasmon-wave communications systems.
  27. Lezec,Henri Joseph; Ebbesen,Thomas Wren, Optical transmission apparatus with directionality and divergence control.
  28. Kim Tae Jin ; Thio Tineke ; Ebbesen Thomas Wren, Optical transmission control apparatus utilizing metal films perforated with subwavelength-diameter holes.
  29. Melendez Jose L. ; Carr Richard A., Self-contained optical sensor system.
  30. Ebbesen Thomas W. ; Ghaemi Hadi F. ; Thio Tineke ; Wolff Peter A., Sub-wavelength aperture arrays with enhanced light transmission.
  31. Walt David R. (Lexington MA) Pantano Paul (Everett MA), Superresolution imaging fiber for subwavelength light energy generation and near-field optical microscopy.
  32. Stark, Peter Randolph Hazard, Surface plasmon enhanced illumination system.
  33. Wang Yu (40-57 Junction Blvd. Corona NY 11368), Surface plasmon high efficiency HDTV projector.
  34. King David A. (Palo Alto CA) Seher Jens-Peter (Stuttgart DEX), Surface plasmon resonance measuring instruments.
  35. Tineke Thio, Surface-plasmon enhanced photovoltaic device.
  36. Wang Yu, Surface-plasmon-wave-coupled tunable filter.
  37. Iwahashi Kenji (Kyoto JPX), X-ray reflective mask and system for image formation with use of the same.

이 특허를 인용한 특허 (10)

  1. Pottier, Pierre; Packirisamy, Muthukumaran, High efficiency mono-order concave diffraction grating.
  2. Schellenberg, Franklin Mark; Bennett, Keith Edward, Method and system for nanopatterning.
  3. Schellenberg, Franklin Mark; Bennett, Keith Edward, Method for writing nanoscale patterns.
  4. Schellenberg, Franklin Mark; Bennett, Keith Edward, Nanolithography system.
  5. Okitsu, Masahiro; Ogura, Kazuyuki; Konno, Kenji; Hatano, Hiroshi, Optical element for condensing incident light.
  6. Han, Seunghoon; Alam, Muhammad Zulfiker; Atwater, Harry, Optical modulator including nanostructure.
  7. Lee, Byounghee; Choi, Byung Il, Plasmonic fabry-perot filter.
  8. Onozawa, Kazutoshi; Ueda, Daisuke; Yoshida, Shinji, Solid-state imaging device including pixels arranged in a two-dimensional array.
  9. Jin, Sungho, Spinodally patterned nanostructures.
  10. Lee, Byounghee; Choi, Byung Il, Tunable plasmonic filter.
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