Organic thin film transistor including organic acceptor film
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01L-029/08
H01L-029/02
출원번호
US-0010341
(2004-12-14)
등록번호
US-7355198
(2008-04-08)
우선권정보
KR-10-2004-0030222(2004-04-29)
발명자
/ 주소
Suh,Min Chul
Yang,Nam Choul
Kim,Hye Dong
출원인 / 주소
Samsung SDI Co., Ltd.
대리인 / 주소
Bushnell, Esq.,Robert E.
인용정보
피인용 횟수 :
4인용 특허 :
4
초록▼
An organic thin film transistor (TFT) includes: an organic semiconductor film; source and drain electrodes electrically connected to the organic semiconductor film; a gate electrode electrically insulated from the source and drain electrodes and the organic semiconductor film; and an organic accepto
An organic thin film transistor (TFT) includes: an organic semiconductor film; source and drain electrodes electrically connected to the organic semiconductor film; a gate electrode electrically insulated from the source and drain electrodes and the organic semiconductor film; and an organic acceptor film interposed between the source and drain electrodes and the organic semiconductor film.
대표청구항▼
What is claimed is: 1. An organic thin film transistor, comprising: an organic semiconductor film; source and drain electrodes electrically connected to the organic semiconductor film; a gate electrode electrically insulated from the source and drain electrodes and the organic semiconductor film; a
What is claimed is: 1. An organic thin film transistor, comprising: an organic semiconductor film; source and drain electrodes electrically connected to the organic semiconductor film; a gate electrode electrically insulated from the source and drain electrodes and the organic semiconductor film; and an organic acceptor film interposed between the source and drain electrodes, which are disposed on one side of the organic acceptor film, and the organic semiconductor film, which is disposed on another side of the organic acceptor film; wherein the organic acceptor film comprises a material which forms the organic semiconductor film and a material which forms the organic acceptor film, and wherein the material which forms the organic acceptor film is 0.1% to 10% by weight. 2. The organic thin film transistor of claim 1, wherein the organic semiconductor film is formed of pentacene. 3. The organic thin film transistor of claim 1, further comprising a gate insulating film which electrically insulates the source and drain electrodes from the gate electrode; wherein the organic acceptor film contacts the source and drain electrodes and the gate insulating film. 4. The organic thin film transistor of claim 3, further comprising a surface processing film which reinforces adhesion between the gate insulating film and the organic acceptor film. 5. The organic thin film transistor of claim 4, wherein the surface processing film is formed of any one selected from the group consisting of trichlorosilyl-(--SiCl3), trimethoxysilyl-(--Si(OMe)3), and mercapto-(--SH) moieties. 6. The organic thin film transistor of claim 1, further comprising a gate insulating film which electrically insulates the source and drain electrodes from the gate electrode; wherein the organic acceptor film contacts the source and drain electrodes. 7. The organic thin film transistor of claim 6, further comprising a surface processing film which reinforces adhesion between the gate insulating film and the organic semiconductor film. 8. The organic thin film transistor of claim 7, wherein the surface processing film is formed of any one selected from the group consisting of trichlorosilyl-(-SiCl3S), trimethoxysilyl-(--Si(OMe)3), and mercapto-(--SH) moieties. 9. The organic thin film transistor of claim 1, wherein the organic acceptor film is formed of at least one electron withdrawing material selected from the group consisting of aromatic compounds, olefine compounds, aromatic-olefine compounds, aromatic-aromatic conjugated compounds, fused aromatic compounds, and hetero cyclic compounds, which contain at least one selected from the group consisting of nitro group (NO2), cyano group (CN), sulfonyl group (SO2), sulfoxide group (SO), carbonyl group (CO), carboxyl group (C02), ester group (COO), anhydride, imide, imine, halogen group, fluoroalkyl group, and fluoroaromatic group. 10. The organic thin film transistor of claim 1, wherein the organic acceptor film is formed of at least one electron withdrawing material selected from the group consisting of 2,4,7-trinitrofluorenone, 4-nitroaniline, 2,4-dinitroaniline, 5-nitroanthranilonitrile, 2,4-dinitrophenylamine, 1,5-dinitronaphthalene, 4-nitrobiphenyl, 9,10-dicyanoanthracene, 3,5-dinitrobenzonitrile, and N,N'-bis(di-t-buytlphenyl)-3,4,9,10-perylenedicarboxyimide. 11. The organic thin film transistor of claim 10, wherein the organic acceptor film is formed by co-depositing the material which forms the organic semiconductor film and the material which forms the organic acceptor film around the interface between the organic semiconductor film and the source and drain electrodes, and is formed of 0.1 to 10% by weight of the material which forms the organic acceptor film. 12. The organic thin film transistor of claim 1, wherein the organic acceptor film has a thickness in a range of 1 Å to 100 Å. 13. An organic thin film transistor, comprising: an organic semiconductor film; source and drain electrodes electrically connected to the organic semiconductor film; a gate electrode electrically insulated from the source and drain electrodes and the organic semiconductor film; and an organic acceptor film interposed between the source and drain electrodes and the organic semiconductor film; wherein the organic acceptor film is formed of at least one electron withdrawing material selected from the group consisting of olefine compounds and hetero cyclic compounds, which contain at least one selected from the group consisting of nitro group (NO2), cyano group (CN), sulfonyl group (SO2), sulfoxide group (SO), carbonyl group (CO), carboxyl group (CO2), ester group (COO), imide, imine, halogen group and fluoroalkyl group; wherein the organic acceptor film comprises said at least one electron withdrawing material and a material which forms the organic semiconductor film, and wherein the electron withdrawing material is 0.1% to 10% by weight. 14. The organic thin film transistor of claim 13, wherein the organic acceptor film is formed of at least one electron withdrawing material selected from the group consisting of 2,4,7-trinitrofluorenone, 4-nitroaniline, 2,4-dinitroaniline, 5-nitroanthranilonitrile, 2,4-dinitrophenylamine, 1,5-dinitronaphthalene, 4-nitrobiphenyl, 9,10-dicyanoanthracene, 3,5-dinitrobenzonitrile, and N,N'-bis(di-t-buytlphenyl)-3,4,9,10-perylenedicarboxyimide. 15. The organic thin film transistor of claim 13, wherein the organic acceptor film has a thickness in a range of 1 Å to 100 Å. 16. The organic thin film transistor of claim 13, further comprising a gate insulating film which electrically insulates the source and drain electrodes from the gate electrode; wherein the organic acceptor film contacts the source and drain electrodes. 17. The organic thin film transistor of claim 16, further comprising a surface processing film which reinforces adhesion between the gate insulating film and the organic semiconductor film. 18. The organic thin film transistor of claim 17, wherein the surface processing film is formed of any one selected from the group consisting of trichiorosilyl-(--SiCl3), trimethoxysilyl-(--Si(OMe)3), and mercapto-(--SH) moieties.
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이 특허에 인용된 특허 (4)
Dodabalapur Ananth ; Haddon Robert Cort ; Katz Howard Edan ; Torsi Luisa, Article comprising an organic thin film transistor adapted for biasing to form a N-type or a P-type transistor.
Tommie W. Kelley ; Dawn V. Muyres ; Mark J. Pellerite ; Timothy D. Dunbar ; Larry D. Boardman ; Terrance P. Smith, Surface modifying layers for organic thin film transistors.
Ushikura, Shinichi; Katsuhara, Mao, Thin film transistor and method of fabricating the same using an organic semconductor layer and an organic acceptor-donor layer.
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