Spinning cold plasma apparatus and methods relating thereto
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
F25B-009/02
H01J-013/28
H01J-013/00
H05B-031/26
H05B-031/00
H01L-021/322
H01L-021/02
출원번호
US-0064300
(2005-02-23)
등록번호
US-7367196
(2008-05-06)
발명자
/ 주소
Chang,Choongseock
Kang,Jemo
Park,Jaeyoung
출원인 / 주소
Princeton BioMeditech Corporation
대리인 / 주소
Norton,Gerard P.
인용정보
피인용 횟수 :
0인용 특허 :
3
초록▼
Disclosed herein is an apparatus for generating a spinning cold plasma. A preferred embodiment of the spinning cold plasma apparatus is portable and includes a vortex tube having an inner wall to form a vortex reaction chamber. The vortex tube preferably has a cold gas outlet formed at a first end o
Disclosed herein is an apparatus for generating a spinning cold plasma. A preferred embodiment of the spinning cold plasma apparatus is portable and includes a vortex tube having an inner wall to form a vortex reaction chamber. The vortex tube preferably has a cold gas outlet formed at a first end of the vortex tube and a hot gas outlet formed at a second end of the vortex tube. The vortex tube preferably has a plurality of gas inlet openings formed therein for directing pressurized gas tangentially to the inner wall into the vortex reaction chamber. A preferred embodiment of the portable spinning cold plasma apparatus also includes a valve positioned at least partially within the cold gas outlet and a valve positioned at least partially within the hot gas outlet. The portable device preferably also includes an ionizing device, such as an RF source or microwave source, for transmitting electromagnetic energy into the vortex reaction chamber to ionize pressurized gas therein. Additional apparatus and methods are also disclosed herein.
대표청구항▼
What is claimed is: 1. A spinning cold plasma apparatus, comprising: a vortex tube having a vortex reaction chamber, an inner wall, and a generated plasma, wherein the vortex tube having a cold gas outlet formed at a first end of the vortex tube and a hot gas outlet formed at a second end of the vo
What is claimed is: 1. A spinning cold plasma apparatus, comprising: a vortex tube having a vortex reaction chamber, an inner wall, and a generated plasma, wherein the vortex tube having a cold gas outlet formed at a first end of the vortex tube and a hot gas outlet formed at a second end of the vortex tube, and the vortex tube having at least one gas inlet opening formed in the vortex tube for directing pressurized gas tangentially to the inner wall into the vortex reaction chamber; a valve positioned at least partially within the cold gas outlet to regulate the flow of cold plasma from the vortex reaction chamber; and an ionizing device for transmitting electromagnetic energy into the vortex reaction chamber to ionize pressurized gas therein, wherein the ionizing device is a source selected from the group consisting of a RF source, and a microwave source capable of forming plasma in the central region of the reaction chamber of said vortex tube. 2. The spinning cold plasma apparatus of claim 1, wherein the RF source comprises a tunable inductive coupler adapted to focus electromagnetic energy on a longitudinal central column region of the vortex reaction chamber. 3. The spinning cold plasma apparatus of claim 1, wherein the vortex tube comprises a plurality of gas inlet openings. 4. The spinning cold plasma apparatus of claim 3, comprising at least one source of pressurized gas in fluid communication with the plurality of gas inlet passages. 5. The spinning cold plasma apparatus of claim 1, comprising a collar extending from the cold gas outlet. 6. The spinning cold plasma apparatus of claim 1, wherein the vortex tube comprises a reverse-flow vortex tube. 7. A method of producing a spinning cold plasma, comprising: directing a pressurized gas into a vortex chamber of a vortex tube to induce a rotational flow of higher-density pressurized gas along an inner wall of the chamber and a lower-density pressurized gas at the longitudinal center column of the reaction chamber of the vortex tube; ionizing the lower-density pressurized gas; generating spinning cold plasma in the central region of the reaction chamber of said vortex tube. 8. The method of claim 7, further comprising the step of: transmitting electromagnetic energy into the chamber. 9. The method of claim 8, further comprising the step of: focusing the electromagnetic energy on the longitudinal center column of lower-density pressurized gas. 10. The method of claim 8, wherein the electromagnetic energy is transmitted from an RF source. 11. The method of claim 8, wherein the electromagnetic energy is transmitted from a microwave source. 12. The method of claim 7, wherein the pressurized gas is selected from the group consisting of Argon, natural air, CO2, NF3, CF4, SF6, a Nitrogen-based gas, and mixtures thereof. 13. A method of disinfecting a surface, comprising applying the spinning cold plasma produced by the method of claim 7 to the surface of interest. 14. A method of increasing the wettability of a substrate, comprising (a) directing a pressurized gas into a vortex chamber to induce a rotational flow of higher-density pressurized gas along an inner wall of the chamber and a lower-density pressurized gas at the longitudinal center of the reaction chamber of: (b) transmitting electromagnetic energy into the chamber; (c) focusing the electromagnetic energy on the longitudinal center reaction column of lower-density pressurized gas, wherein the electromagnetic energy is transmitted from an RF source or a microwave source or a combination thereof; (d) ionizing the lower-density pressurized gas to produce the spinning cold plasma at the center region of the reaction chamber of the vortex tube; and (e) applying the spinning cold plasma to the substrate. 15. The apparatus of claim 1, wherein only a single ionizing device is employed to generate the plasma. 16. The method of claim 7, wherein only a single ionizing device is employed to generate the plasma.
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