초록 ▼

A hermetically sealed glass package and method for manufacturing the hermetically sealed glass package are described herein. In one embodiment, the hermetically sealed glass package is suitable to protect thin film devices which are sensitive to the ambient environment. Some examples of such glass

A hermetically sealed glass package and method for manufacturing the hermetically sealed glass package are described herein. In one embodiment, the hermetically sealed glass package is suitable to protect thin film devices which are sensitive to the ambient environment. Some examples of such glass packages are organic emitting light diode (OLED) displays, sensors, and other optical devices. The present invention is demonstrated using an OLED display as an example.

대표청구항 ▼

What is claimed is: 1. A method for manufacturing an optical device, said method comprising the steps of: providing a cover plate; providing a substrate plate; depositing a fit onto said cover plate; depositing at least one thin film device onto said substrate plate; and using a sealing apparatus t

What is claimed is: 1. A method for manufacturing an optical device, said method comprising the steps of: providing a cover plate; providing a substrate plate; depositing a fit onto said cover plate; depositing at least one thin film device onto said substrate plate; and using a sealing apparatus to heat said frit in a manner where a substantially constant temperature is maintained in said flit along a sealing line that has regions free of electrodes and regions occupied by electrodes which are connected to said at least one thin film device and where said frit melts and forms a hermetic seal that connects said cover plate to said substrate plate and also protects said at least one thin film device located between said cover plate and said substrate plate. 2. The method of claim 1, further comprising the step of pre-sintering said frit to said cover plate. 3. The method of claim 1, wherein said frit is glass doped with a material that is absorbent at a specific wavelength of light. 4. The method of claim 1, wherein said electrodes are metal non-transparent electrodes that have different patterns and different optical properties. 5. The method of claim 1, wherein said electrodes are reflective, absorptive, transmissive or any combination thereof. 6. The method of claim 1, wherein said sealing apparatus emits a laser beam used to melt said frit where a speed of the laser beam is dynamically changed in a manner that maintains the substantially constant temperature in said frit along the sealing line which has the electrode free regions and the electrode occupied regions. 7. The method of claim 1, wherein said sealing apparatus dynamically changes a power of a laser beam used to melt said frit in a manner that maintains the substantially constant temperature in said frit along the sealing line which has the electrode free regions and the electrode occupied regions. 8. The method of claim 1, wherein a reflector is placed under said substrate while said sealing apparatus emits a laser beam through said cover plate to melt said frit in a manner that maintains the substantially constant temperature in said frit along the sealing line which has the electrode free regions and the electrode occupied regions. 9. The method of claim 1, wherein a partially reflective mask is placed on top of said cover plate while said sealing apparatus emits a laser beam through said partially reflective mask and said cover plate to melt said frit in a manner that maintains the substantially constant temperature in said frit along the sealing line which has the electrode free regions and the electrode occupied regions. 10. The method of claim 1, wherein said sealing apparatus emits a lower power laser beam used to melt said frit along the sealing line during a first pass and then said sealing apparatus emits a higher power laser beam during a second pass only at portions of said frit along the sealing line which did not reach a correct temperature during the first pass of said lower power laser beam. 11. The method of claim 1, wherein said sealing apparatus uses an elliptical focusing lens to emit an elliptical shaped laser beam to melt said frit in a manner that maintains the substantially constant temperature in said frit along the sealing line which has the electrode free regions and the electrode occupied regions. 12. The method of claim 1, wherein said sealing apparatus uses a focusing lens and a specially shaped aperture to emit a defocused laser beam to melt said frit in a manner that maintains the substantially constant temperature in said frit along the sealing line which has the electrode free regions and the electrode occupied regions. 13. The method of claim 1, wherein a feedback mechanism is used to optimize an operation of said sealing apparatus so as to melt said frit in a manner that maintains the substantially constant temperature in said frit along the sealing line which has the electrode free regions and the electrode occupied regions. 14. The method of claim 1, wherein a mask is placed on top of said cover plate while said sealing apparatus emits a laser beam through a slit in said mask and said cover plate to melt said frit in a manner that maintains the substantially constant temperature in said frit along the sealing line which has the electrode free regions and the electrode occupied regions. 15. A method for manufacturing a glass package, said method comprising the steps of: providing a cover plate; providing a substrate plate; depositing at least one thin film device onto said substrate plate; and using a sealing apparatus to heat a portion of said substrate plate in a manner where a substantially constant temperature was maintained in the portion along a sealing line that has regions free of electrodes and regions occupied by electrodes which are connected to said at least one thin film device and where said portion melts and forms a hermetic seal that connects said cover plate to said substrate plate and also protects said at least one thin film device located between said cover plate and said substrate plate. 16. The method of claim 15, wherein said substrate plate is glass doped with a material that is absorbent at a specific wavelength of light. 17. The method of claim 15, wherein said electrodes are metal non-transparent electrodes that have different patterns and different optical properties. 18. The method of claim 15, wherein said electrodes are reflective, absorptive, transmissive or any combination thereof. 19. The method of claim 15, wherein said sealing apparatus emits a laser beam used to melt said portion of said substrate plate where a speed of the laser beam is dynamically changed in a manner that maintains the substantially constant temperature in said portion of said substrate plate along the sealing line which has the electrode free regions and the electrode occupied regions. 20. The method of claim 15, wherein said sealing apparatus dynamically changes a power of a laser beam used to melt said portion of said substrate plate in a manner that maintains the substantially constant temperature in said portion of said substrate plate along the sealing line which has the electrode free regions and the electrode occupied regions. 21. The method of claim 15, wherein a reflector is placed under said substrate while said sealing apparatus emits a laser beam through said cover plate to melt said portion of said substrate plate in a manner that maintains the substantially constant temperature in said portion of said substrate plate along the sealing line which has the electrode free regions and the electrode occupied regions. 22. The method of claim 15, wherein a partially reflective mask is placed on top of said cover plate while said sealing apparatus emits a laser beam through said partially reflective mask and said cover plate to melt said portion of said substrate plate in a manner that maintains the substantially constant temperature in said portion of said substrate plate along the sealing line which has the electrode free regions and the electrode occupied regions. 23. The method of claim 15, wherein said sealing apparatus emits a lower power laser beam used to melt said portion of said substrate plate along the sealing line during a first pass and then said sealing apparatus emits a higher power laser beam during a second pass only at portions of said portion of said substrate plate along the sealing line which did not reach a correct temperature during the first pass of said lower power laser beam. 24. The method of claim 15, wherein said sealing apparatus uses an elliptical focusing lens to emit an elliptical shaped laser beam to melt said portion of said substrate plate in a manner that maintains the substantially constant temperature in said portion of said substrate plate along the sealing line which has the electrode free regions and the electrode occupied regions. 25. The method of claim 15, wherein said sealing apparatus uses a focusing lens and a specially shaped aperture to emit a defocused laser beam to melt said portion of said substrate plate in a manner that maintains the substantially constant temperature in said portion of said substrate plate along the sealing line which has the electrode free regions and the electrode occupied regions. 26. The method of claim 15, wherein a feedback mechanism is used to optimize an operation of said sealing apparatus so as to melt said portion of said substrate plate in a manner that maintains the substantially constant temperature in said portion of said substrate plate along the sealing line which has the electrode free regions and the electrode occupied regions. 27. The method of claim 15, wherein a mask is placed on top of said cover plate while said sealing apparatus emits a laser beam through a slit in said mask and said cover plate to melt said portion of said substrate plate in a manner that maintains the substantially constant temperature in said portion of said substrate plate along the sealing line which has the electrode free regions and the electrode occupied regions.