[특허]LPP EUV plasma source material target delivery system

[미국특허] LPP EUV plasma source material target delivery system 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	A61N-005/06 G01J-003/10 G01J-003/00 H05G-002/00
출원번호	US-0174443 (2005-06-29)
등록번호	US-7372056 (2008-05-13)
발명자 / 주소	Bykanov,Alexander N. Algots,J. Martin Khodykin,Oleh Hemberg,Oscar
출원인 / 주소	Cymer, Inc.
대리인 / 주소	Cray,William C.
인용정보	피인용 횟수 : 41 인용 특허 : 159

초록 ▼

An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site. The apparatus and method may further comprise a droplet detection mechanism that may comprise a droplet detection radiation detector positioned to detect droplet detection radiation reflected from a plasma source material droplet.

대표청구항 ▼

We claim: 1. An EUV light generation system comprising: a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site wherein each respective droplet has 200 to 400 μm separation; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site; and a droplet detection mechanism comprising a droplet detection radiation detector positioned to detect droplet detection radiation reflected from a plurality of plasma source material droplets. 2. The apparatus of claim 1 further comprising: a droplet detection radiation source comprising a laser. 3. The apparatus of claim 1 further comprising: the droplet detection radiation source comprises a laser. 4. The apparatus of claim 1 further comprising: the droplet detection radiation among mechanism comprising a mechanism selecting the angle of incidence of the droplet detection radiation on the drive laser steering element. 5. The apparatus of claim 1 further comprising: the droplet detection radiation aiming mechanism comprising mechanism selecting the angle of incidence of the droplet detection radiation on the drive laser steering element. 6. The apparatus of claim 2 further comprising: the droplet detection radiation aiming mechanism comprising a mechanism selecting the angle of incidence of the droplet detection radiation on the drive laser steering element. 7. The apparatus of claim 3 further comprising: the droplet detection radiation aiming mechanism comprising a mechanism selecting the angle of incidence of the droplet detection radiation on the drive laser steering element. 8. The apparatus of claim 1 further comprising: the droplet detection radiation detector comprising a radiation detector sensitive to light in the second range of center wavelengths and not sensitive to radiation within the second range of center wavelengths. 9. The apparatus of claim 3 further comprising: the droplet detection radiation detector comprising a radiation detector sensitive to light in the second range of center wavelengths and not sensitive to radiation within the second range of center wavelengths. 10. The apparatus of claim 5 further comprising: the droplet detection radiation detector cmmprising a radiation detector sensitive to light in the second range of center wavelengths and not sensitive to radiation within the second range of center wavelengths. 11. Thu apparatus of claim 7 further comprising: the droplet detection radiation detector comprising radiation detector sensitive to light in the second range of center wavelengths and not sensitive to radiation within the second range of center wavelengths. 12. The apparatus of claim 4 further comprising: the droplet detection radiation is focused to a point at or near the selected droplet detection position such that the droplet detection radiation reflects from a respective plasma source material target at the selected droplet detection position. 13. The apparatus of claim 5 further comprising: the droplet detection radiation is focused to a point at or near the selected droplet detection position such that the droplet detection radiation reflects from a respective plasma source material target at the selected droplet detection position. 14. The apparatus of claim 6 further comprising: the droplet detection radiation is focused to a point at or near the selected droplet detection position such that the droplet detection radiation reflects from a respective plasma source material target at the selected droplet detection position. 15. The apparatus of claim 7 further comprising: the droplet detection radiation is focused to a point at or near the selected droplet detection position such that the droplet detection radiation reflects from a respective plasma source material target at the selected droplet detection position. 16. The apparatus of claim 8 further comprising: the droplet detection radiation is focused to a point at or near the selected droplet detection position such that the droplet detection radiation reflects from a respective plasma source material target at the selected droplet defection position. 17. The apparatus of claim 9 further comprising: the droplet detection radiation is focused to a point at or near the selected droplet detection position such that the droplet detection radiation reflects from a respective plasma source material target at the selected droplet detection position. 18. The apparatus of claim 10 further comprising: the droplet detection radiation is focused to a point at or near the selected droplet detection position such that the droplet detection radiation reflects from a respective plasma source material target at the selected droplet detection position. 19. The apparatus of claim 11 further comprising: the droplet detection radiation is focused to a point at or near the selected droplet detection position such that the droplet detection radiation reflects from a respective plasma source material target at the selected droplet detection position. 20. An EUV plasma source material target delivery system comprising: a plasma source material target formation mechanism comprising: a plasma source target droplet formation mechanism comprising a flow passagway and an output orifice; a stream control mechanism comprising an energy imparting mechanism imparting stream formation control energy in the plasma source material droplet formation mechanism to at least in part control a characteristic of the formed droplet stream; and, an imparted energy sensing mechanism sensing the energy imparted to the stream control mechanism and providing an imparted energy error signal, wherein the energy sensing mechanism monitors the displacement of the flow passageway and compares the displacement to the energy imparted by the energy mechanism of the stream control mechanism. 21. The apparatus of claim 20 further comprising: the flow passageway comprising a capillary tube.

이 특허에 인용된 특허 (159) 인용/피인용 타임라인 분석

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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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[미국특허] LPP EUV plasma source material target delivery system 원문보기

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[미국특허] LPP EUV plasma source material target delivery system 원문보기

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이 특허에 인용된 특허 (159) 인용/피인용 타임라인 분석

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