초록 ▼

An inline transfer system and method are provided for the secure transport and efficient processing of substrates such as glass substrates or semiconductor devices. A rotary conveyor is provided that includes a plurality of air nozzles which inject air to move a substrate above the plurality of air

An inline transfer system and method are provided for the secure transport and efficient processing of substrates such as glass substrates or semiconductor devices. A rotary conveyor is provided that includes a plurality of air nozzles which inject air to move a substrate above the plurality of air nozzles without the plurality of air nozzles making contact with the substrate. At least two independent processing units are operably coupled to the rotary conveyor. Advantageously, because a plurality of substrates may be processed in parallel, greater efficiency and flexibility are provided. Because the substrate can be moved without physical contact between the structure of the air nozzles and the substrate, the transfer is secure, clean, and efficient.

대표청구항 ▼

We claim: 1. An inline transfer system, comprising: a plurality of rotary conveyors each including a panel, and a plurality of air nozzles operably coupled to the panel, wherein the plurality of air nozzles inject air to move a substrate above the plurality of air nozzles without the plurality of a

We claim: 1. An inline transfer system, comprising: a plurality of rotary conveyors each including a panel, and a plurality of air nozzles operably coupled to the panel, wherein the plurality of air nozzles inject air to move a substrate above the plurality of air nozzles without the plurality of air nozzles making contact with the substrate; at least one elevator operatively coupled between at least two of the rotary conveyors disposed on different vertical levels; at least two processing units operably coupled to at least one rotary conveyor, wherein the at least two processing units, each of the at least two processing devices includes an entrance and an exit for the substrate; a buffer module operably coupled to an entrance of each of the at least two processing units; wherein the substrate exiting a first process can be transferred by a rotary conveyor either to the buffer module at the entrance of a second processing unit or to the elevator depending on conditions set during manufacturing. 2. The system of claim 1, wherein one of the at least two processing devices is capable of performing a chemical vapor deposition (CVD), photolithography, sputtering, or etch process. 3. The system of claim 1, further comprising an off-line buffer module operably coupled to the rotary conveyor.