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[미국특허] Method and apparatus for EUV plasma source target delivery 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H05G-002/00
출원번호 US-0067124 (2005-02-25)
등록번호 US-7405416 (2008-07-29)
발명자 / 주소
  • Algots,J. Martin
  • Fomenkov,Igor V.
  • Ershov,Alexander I.
  • Partlo,William N.
  • Sandstrom,Richard L.
  • Hemberg,Oscar
  • Bykanov,Alexander N.
  • Cobb,Dennis W.
출원인 / 주소
  • Cymer, Inc.
대리인 / 주소
    Hillman,Matthew K.
인용정보 피인용 횟수 : 59  인용 특허 : 86

초록 ▼

An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying

대표청구항 ▼

We claim: 1. An EUV plasma formation target delivery system comprising: a target droplet formation mechanism comprising a magneto-strictive or electro-strictive material cooperating with a target droplet delivery capillary and/or output orifice in the formation of liquid target material droplets.

이 특허에 인용된 특허 (86) 인용/피인용 타임라인 분석

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이 특허를 인용한 특허 (59) 인용/피인용 타임라인 분석

  1. Delgado, Gildardo, Apparatus and method for multiplexed multiple discharge plasma produced sources.
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  3. Park, Chang-Min; Park, Joo-On; Yeo, Jeong-Ho, Apparatus for creating an extreme ultraviolet light, an exposing apparatus including the same, and electronic devices manufactured using the exposing apparatus.
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  4. Hergenhan, Guido; Kloepfel, Diethard; Byrnes, Todd; Weber, Elma; Möritz, Mike, Arrangement for the continuous generation of liquid tin as emitter material in EUV radiation sources.
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  5. Mizoguchi, Hakaru; Nagai, Shinji, Cleaning method for EUV light generation apparatus.
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  6. Ueno, Yoshifumi, Control method for target supply device, and target supply device.
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  8. Soer, Wouter Anthon; Van Herpen, Maarten Marinus Johannes Wilhelmus, Debris prevention system and lithographic apparatus.
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  9. Bykanov, Alexander N.; Ershov, Alexander I., Debris protection system having a magnetic field for an EUV light source.
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  27. Bykanov, Alexander N.; Ershov, Alexander I.; Fomenkov, Igor V.; Brandt, David C., Gas management system for a laser-produced-plasma EUV light source.
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  28. Bykanov, Alexander N.; Ershov, Alexander I.; Fomenkov, Igor V.; Brandt, David C., Gas management system for a laser-produced-plasma EUV light source.
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  29. Bykanov, Alexander N.; Bowering, Norbert; Fomenkov, Igor V.; Brandt, David C.; Ershov, Alexander I.; Khodykin, Oleh; Partlo, William N., Laser produced plasma EUV light source.
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  30. Bykanov, Alexander N.; Bowering, Norbert; Fomenkov, Igor V.; Ershov, Alexander I.; Khodykin, Oleh, Laser produced plasma EUV light source.
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  31. Bykanov, Alexander N.; Fomenkov, Igor V., Laser produced plasma EUV light source.
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  32. Hou, Kai-Chung; Sandstrom, Richard L.; Partlo, William N.; Brown, Daniel J. W.; Fomenkov, Igor V., Master oscillator-power amplifier drive laser with pre-pulse for EUV light source.
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  33. Fomenkov, Igor V.; Partlo, William N.; Vaschenko, Gregory O.; Oldham, William, Material supply apparatus for extreme ultraviolet light source having a filter constructed with a plurality of openings fluidly coupled to a plurality of through holes to remove non-target particles from the supply material.
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  34. Fleurov, Vladimir B., Methods and apparatus for laser produced plasma EUV light source.
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  35. Sandstrom, Richard L., Multi-pass optical apparatus.
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  36. Hou, Kai-Chung; Sandstrom, Richard L.; Partlo, William N.; Brown, Daniel J. W.; Fomenkov, Igor V., Oscillator-amplifier drive laser with seed protection for an EUV light source.
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  37. Van Den Akker, Jeroen; Kempen, Antonius Theodorus Wilhelmus; Kuijpers, Adriaan Cornelis, Radiation source.
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  38. Bykanov, Alexander N.; Brandt, David C.; Fomenkov, Igor V.; Partlo, William N., System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus.
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  39. Fleurov, Vladimir B.; Partlo, William N.; Fomenkov, Igor V.; Ershov, Alexander I., Systems and methods for buffer gas flow stabilization in a laser produced plasma light source.
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  40. Chrobak, Christopher P.; Fomenkov, Igor V., Systems and methods for collector mirror temperature control using direct contact heat transfer.
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  41. Ershov, Alexander I.; Morse, Robert L.; Partlo, William N.; Pate, Christopher P., Systems and methods for cooling an optic.
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  42. Partlo, William N.; Fomenkov, Igor V.; Paxton, Jason, Systems and methods for drive laser beam delivery in an EUV light source.
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  43. Bykanov, Alexander N.; De Dea, Silvia; Ershov, Alexander I.; Fleurov, Vladimir B.; Fomenkov, Igor V.; Partlo, William N., Systems and methods for optics cleaning in an EUV light source.
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