초록 ▼

A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteri

A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.

대표청구항 ▼

The invention claimed is: 1. An optical system of a projection exposure apparatus, comprising at least one lens that is made of a non-crystalline material and at least one lens that is made of a birefringent crystal, wherein all lenses made of a birefringent crystal have a higher susceptibility fac

The invention claimed is: 1. An optical system of a projection exposure apparatus, comprising at least one lens that is made of a non-crystalline material and at least one lens that is made of a birefringent crystal, wherein all lenses made of a birefringent crystal have a higher susceptibility factor KLT/LH than the lenses made of a non-crystalline material, wherein KLT/LH is given by description="In-line Formulae" end="lead"KLT/LH =D/* (CA>/CA)2 ,description="In-line Formulae" end="tail" with being the mean value of the thickness D of the plurality of lenses and being the mean value of the clear aperture CA of all lenses of the optical system, wherein the optical system is a projection objective configured to image a mask onto an image plane, and wherein the lens which is closest to the image plane has the highest susceptibility factor KLT/LH. 2. The optical system of claim 1, wherein the optical system is a catadioptric projection objective. 3. The optical system of claim 2, wherein the projection objective comprises: a) a first objective portion for imaging the mask into a first intermediate image; b) a second objective portion for imaging the first intermediate image into a second intermediate image; c) a third objective portion for imaging the second intermediate image into the image plane. 4. The optical system of claim 3, wherein the first objective portion contains only refractive optical elements. 5. The optical system of claim 3, wherein the third objective portion contains only refractive optical elements. 6. The optical system of claim 3, wherein the second objective portion contains reflective optical elements. 7. The optical system of claim 6, wherein the second objective portion contains only reflective optical elements. 8. The optical system of claim 6, wherein the second objective portion comprises a first concave mirror and a second concave mirror. 9. The optical system of claim 8, wherein the first concave mirror and the second concave mirror are facing each other, thereby defining an intermirror space. 10. The optical system of claim 9, wherein the first intermediate image and the second intermediate image are geometrically located within the intermirror space. 11. The optical system of claim 8, wherein the condition description="In-line Formulae" end="lead"1 D/(|c1|+|c2|) ·10-41 is the curvature of the first concave mirror, c2 is the curvatures of the second concave mirror. 12. The optical system of claim 2, comprising an aperture stop which is arranged between a region of largest beam diameter and the image plane. 13. The optical system of claim 2, wherein exactly one negative lens is arranged between the second intermediate image and the image plane. 14. The optical system of claim 13, wherein the negative lens is a biconcave lens. 15. The optical system of claim 2, wherein the projection objective is an immersion objective with a numerical aperture NA>1. 16. The optical system of claim 3, wherein the second objective portion comprises a concave mirror. 17. The optical system of claim 16, comprising a first folding mirror for deflecting radiation coming from the mask in the direction of the concave mirror, and a second folding mirror for deflecting radiation coming from the concave mirror in the direction of the image plane. 18. The optical system of claim 17, comprising lenses that are arranged between the first folding mirror, the second folding mirror and the concave mirror such that radiation passes the lenses twice. 19. The optical system of claim 17, comprising an aperture stop which is arranged in the third objective portion. 20. The optical system of claim 17, wherein the projection objective is an immersion objective with a numerical aperture NA>1. 21. The optical system of claim 1, wherein the birefringent crystal is selected from the group consisting of: CaF2, BaF2, LiF2, SrF2. 22. The optical system of claim 1, wherein the birefringent crystal is an isomorphous mixture of at least two of the group consisting of: CaF2, BaF2, LiF2, SrF2. 23. The optical system of claim 22, wherein the mixture is Ca1-xBaxF2.