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A method of forming a metal wiring layer of a semiconductor device produces metal wiring that is free of defects. The method includes forming an insulating layer pattern defining a recess on a substrate, forming a conformal first barrier metal layer on the insulating layer pattern, and forming a sec

A method of forming a metal wiring layer of a semiconductor device produces metal wiring that is free of defects. The method includes forming an insulating layer pattern defining a recess on a substrate, forming a conformal first barrier metal layer on the insulating layer pattern, and forming a second barrier metal layer on the first barrier metal layer in such a way that the second barrier metal layer will facilitate the growing of metal from the bottom of the recess such that the metal can fill a bottom part of the recess completely and thus, form damascene wiring. An etch stop layer pattern is formed after the damascene wiring is formed so as to fill the portion of the recess which is not occupied by the damascene wiring.

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What is claimed is: 1. A method of forming a metal wiring layer of a semiconductor device, the method comprising: forming an insulating layer pattern defining a recess on a substrate; forming a first barrier metal layer which extends over an upper surface of the insulating layer pattern, over a sid

What is claimed is: 1. A method of forming a metal wiring layer of a semiconductor device, the method comprising: forming an insulating layer pattern defining a recess on a substrate; forming a first barrier metal layer which extends over an upper surface of the insulating layer pattern, over a side wall of the insulating layer pattern that defines the sides of the recess, and along the bottom of the recess; forming a second barrier metal layer on the first barrier metal layer comprising including over that portion of the first barrier metal layer that overlies the upper surface of the insulating layer pattern and over that portion of the first barrier metal layer that extends within the recess, the second barrier metal layer comprising a nitride layer, and wherein the forming of the second barrier metal layer is terminated at a time when the nitrogen content of that portion of the second barrier metal layer extending within the recess is lower than the nitrogen content of that portion of the second barrier metal layer which lies over the upper surface of the insulating layer pattern; filling only a portion of the recess with electrically conductive material to thereby form a damascene wiring; and forming an etch stop layer pattern in an upper portion of the recess which is not occupied by the damascene wiring. 2. The method of claim 1, wherein said forming of the second barrier metal layer comprises forming a second barrier metal layer that becomes thinner in a direction from the upper surface of the insulating layer towards the bottom of the recess. 3. The method of claim 1, wherein the second barrier metal layer is formed by a PVD process. 4. The method of claim 1, wherein the forming of the damascene wiring comprises growing Al from the bottom of the recess. 5. The method of claim 1, wherein the forming of the etch stop layer pattern comprises forming a first etch stop film and subsequently forming a second etch stop film on the first etch stop film. 6. The method of claim 5, wherein the forming of the etch stop layer pattern comprises: forming the first etch stop film and the second etch stop film to each extend over the upper surface of the insulating layer pattern as well as in the portion of the recess which is not occupied with the damascene wiring, and subsequently selectively removing respective portions of the second etch stop film, the first etch stop film, the second barrier metal layer, and the first barrier metal layer to expose the upper surface of the insulating layer pattern. 7. The method of claim 1, further comprising forming a contact hole aligned with the recess, after the etch stop layer pattern has been formed. 8. A method of forming a metal wiring layer of a semiconductor device, the method comprising: forming an insulating layer pattern defining a recess on a substrate; forming a first conformal barrier metal layer over the insulating layer pattern such that respective portions of the first conformal barrier metal layer extend over an upper surface of the insulating layer pattern, over the entire side wall of the insulating layer pattern that defines the sides of the recess, and over the entire bottom of the recess; forming a second barrier metal layer over that portion of the conformal first barrier metal layer that overlies the upper surface of the insulating layer pattern and along the first barrier metal layer within the recess including over the portion of the first conformal barrier metal layer that extends over the bottom of the recess, the second barrier metal layer comprising a nitride layer, and wherein the forming of the second barrier metal layer is terminated at a time when the nitrogen content of that portion of the second barrier metal layer within the recess is lower than the nitrogen content of that portion of the second barrier metal layer which lies over the upper surface of the insulating layer pattern; filling only a portion of the recess with electrically conductive material to thereby form a damascene wiring; and forming an etch stop layer pattern in an upper portion of the recess which is not occupied by the damascene wiring. 9. The method of claim 8, wherein said forming of the second barrier metal layer comprises forming a second barrier metal layer that becomes thinner in a direction from the upper surface of the insulating layer towards the bottom of the recess. 10. The method of claim 8, wherein the second barrier metal layer is formed by a PVD process. 11. The method of claim 8, wherein the forming of the damascene wiring comprises growing Al from the bottom of the recess. 12. The method of claim 8, wherein the forming of the etch stop layer pattern comprises forming a first etch stop film and subsequently forming a second etch stop film on the first etch stop film. 13. The method of claim 12, wherein the forming of the etch stop layer pattern comprises: forming the first etch stop film and the second etch stop film to each extend over the upper surface of the insulating layer pattern as well as in the portion of the recess which is not occupied with the damascene wiring, and subsequently selectively removing respective portions of the second etch stop film, the first etch stop film, the second barrier metal layer, and the first barrier metal layer to expose the upper surface of the insulating layer pattern. 14. The method of claim 8, further comprising forming a contact hole aligned with the recess, after the etch stop layer pattern has been formed.