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Imprint lithography template to facilitate control of liquid movement 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B29C-035/08
출원번호 US-0762378 (2007-06-13)
등록번호 US-7473090 (2009-01-06)
발명자 / 주소
  • McMackin,Ian M.
  • Lad,Pankaj B.
  • Truskett,Van N.
출원인 / 주소
  • Molecular Imprints, Inc.
대리인 / 주소
    Fish & Richardson P.C.
인용정보 피인용 횟수 : 13  인용 특허 : 43

초록

The present invention is directed to a template that features a control surface extending from a periphery of a mold toward a recessed surface of the template forming an oblique angle between a portion of the control surface disposed proximate to the periphery.

대표청구항

What is claimed is: 1. A nanoimprint lithography template comprising: a mold, having a periphery, lying in a plane; a sidewall; a recessed surface spaced-apart from said plane; and a control surface extending from said periphery toward said sidewall, with an obtuse angle being defined between said

이 특허에 인용된 특허 (43)

  1. Sreenivasan, Sidlgata V; Watts, Michael P. C.; Choi, Byung J.; Voisin, Ronald D., Alignment methods for imprint lithography.
  2. Tensor Paul M., Ambient UVL-curable elastomer mold apparatus.
  3. Bernier Lucien (570 Citation Way Thousand Oaks CA 91320), Apparatus for centering template guide on router.
  4. Cassani Giuseppe,ITX, Apparatus for pressing ceramic powders.
  5. Sato Takashi (Fishkill NY), Attenuated phase-shifting mask with opaque reticle alignment marks.
  6. Watts,Michael P. C.; Voisin,Ronald D.; Sreenivasan,Sidlgata V., Compliant hard template for UV imprinting.
  7. Sreenivasan,Sidlgata V; Choi,Byung J.; Voisin,Ronald D., Conforming template for patterning liquids disposed on substrates.
  8. Siddall Graham J. (Woodside CA), Deformable chuck driven by piezoelectric means.
  9. Kevin K. Chan ; Christopher Jhanes ; Leathen Shi ; James L. Speidell ; James F. Ziegler, Encapsulated MEMS band-pass filter for integrated circuits and method of fabrication thereof.
  10. Donald L. Westmoreland, Film on a surface of a mold used during semiconductor device fabrication.
  11. Westmoreland, Donald L., Film on a surface of a mold used during semiconductor device fabrication.
  12. Eldridge, Benjamin N.; Wenzel, Stuart W., Forming tool for forming a contoured microelectronic spring mold.
  13. Everaerts Albert I. ; Lamanna William M. ; Seaver Albert E. ; Tiers George V., Free-radically polymerizable compositions capable of being coated by electrostatic assistance.
  14. Bonnebat Claude (Pontault-Combault FRX) Quentin Jean-Pierre (Lyon FRX) Morin Alain (Villeurbanne FRX), Highly oriented thermotropic optical disc member.
  15. Bailey,Todd C.; Choi,Byung Jin; Colburn,Matthew E.; Sreenivasan,Sidlgata V.; Willson,Carlton G.; Ekerdt,John G., Imprint lithography template having a feature size under 250 nm.
  16. Sreenivasan,Sidlgata V.; Schumaker,Philip D., Imprint lithography template having opaque alignment marks.
  17. Akiyama Nobuyuki (Yokohama JPX) Kembo Yukio (Yokohama JPX) Nakagawa Yasuo (Yokohama JPX) Aiuchi Susumu (Yokohama JPX) Nomoto Mineo (Yokohama JPX), Light exposure device and method.
  18. David P. Mancini ; Doug J. Resnick ; William J. Dauksher, Lithographic template and method of formation and use.
  19. Mancini, David P.; Resnick, Douglas J.; Willson, Carlton Grant, Lithographic template and method of formation and use.
  20. Resnick, Doug J.; Nordquist, Kevin J., Lithographic template and method of formation and use.
  21. Lutwak, Robert; Riley, Jr., William J.; Lyon, Kenneth D., MEMS analog frequency divider.
  22. Hector Wayne M., Method and apparatus for making an optical information record.
  23. Wensel Richard W., Method of fabricating a semiconductor device utilizing a residual organic compound to facilitate gate break on a carrier substrate.
  24. Watts,Michael P. C.; Voisin,Ronald D.; Sreenivasan,Sidlgata V., Method of forming a compliant template for UV imprinting.
  25. Nguyen, Son Van; Robertson, Neil Leslie; Dinan, Thomas Edward; Pham, Thao Duc, Method of manufacturing high aspect ratio photolithographic features.
  26. Guckel Henry (Madison WI) Christenson Todd R. (Madison WI) Skrobis Kenneth J. (Madison WI), Method of manufacturing micromechanical devices.
  27. Calveley Peter Braden,NZX, Method of patterning a metal layer.
  28. Jeans, Albert H., Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size.
  29. Hofmann, James J., Methods of forming patterns and molds for semiconductor constructions.
  30. Wang Dapeng ; Hofmann James, Methods of forming semiconductor devices and methods of forming field emission displays.
  31. Voisin,Ronald D., Methods of manufacturing a lithography template.
  32. Maracas George N. ; Burgin Timothy P. ; Mance Thomas M., Micro-contact printing stamp.
  33. Mancini, David P.; Resnick, Douglas J., Multi-tiered lithographic template and method of formation and use.
  34. Lee, Heon, Nano-size imprinting stamp using spacer technique.
  35. Chou Stephen Y., Nanoimprint lithography.
  36. Watakabe Yaichiro (Itami JPX) Tanaka Kazuhiro (Itami JPX) Hirosue Masahiro (Itami JPX), Photomask material.
  37. Chou Stephen Y., Release surfaces, particularly for use in nanoimprint lithography.
  38. Kinoshita Yoshimi (Amagasaki JPX) Kanda Tomoyuki (Amagasaki JPX) Kitano Katsuhisa (Amagasaki JPX) Yoshida Kazuo (Amagasaki JPX) Ohnishi Hiroshi (Amagasaki JPX) Yamanishi Kenichiro (Amagasaki JPX) Sas, Semiconductor producing apparatus comprising wafer vacuum chucking device.
  39. Carlton Grant Willson ; Matthew Earl Colburn, Step and flash imprint lithography.
  40. Bailey, Todd; Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Ekerdt, John, Template for room temperature, low pressure micro-and nano-imprint lithography.
  41. Zakhidov Anvar ; Baughman Ray ; Cui Changxing ; Khayrullin Ilyas I. ; Liu Lo-Min ; Udod Igor ; Su Ji ; Kozlov Mikhail, Three dimensionally periodic structural assemblies on nanometer and longer scales.
  42. Rogers, John A.; Jackman, Rebecca J.; Paul, Kateri E.; Schueller, Olivier J. A.; Breen, Tricia Lynn; Whitesides, George M., Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element.
  43. Wensel Richard W., Use of residual organic compounds to facilitate gate break on a carrier substrate for a semiconductor device.

이 특허를 인용한 특허 (13)

  1. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Capillary imprinting technique.
  2. Schumaker, Philip D., Drop pattern generation for imprint lithography.
  3. Schumaker, Philip D., Drop pattern generation with edge weighting.
  4. Khusnatdinov, Niyaz; Jones, Christopher Ellis; Perez, Joseph G.; LaBrake, Dwayne L.; McMackin, Ian Matthew, Extrusion reduction in imprint lithography.
  5. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Meissl, Mario Johannes, Imprint lithography system and method.
  6. Xu, Frank; McMackin, Ian; Lad, PanKaj B.; Watts, Michael P. C., Method for controlling distribution of fluid components on a body.
  7. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian M.; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
  8. Tsuji, Yukihiro; Yanagisawa, Masaki, Method for manufacturing nano-imprint mold, method for forming resin pattern by nano-imprint technique, and nano-imprint mold.
  9. Cherala, Anshuman; Sreenivasan, Sidlgata V.; Choi, Byung-Jin; Thompson, Ecron D., Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques.
  10. Malic, Lidija; Morton, Keith; Veres, Teodor, Microfluidic system having monolithic nanoplasmonic structures.
  11. Nguyen, Houng T.; Xu, Ren; Barnes, Michael S., Process for optimization of island to trench ratio in patterned media.
  12. Schumaker, Philip D., Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement.
  13. Sreenivasan, Sidlgata V.; Choi, Byung J.; Schumaker, Norman E.; Voisin, Ronald D.; Watts, Michael P. C.; Meissl, Mario J., Step and repeat imprint lithography processes.
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