IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0800492
(2004-03-15)
|
등록번호 |
US-7485608
(2009-02-03)
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발명자
/ 주소 |
|
출원인 / 주소 |
|
대리인 / 주소 |
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인용정보 |
피인용 횟수 :
0 인용 특허 :
11 |
초록
▼
A composition with improved chemical stability and increased the efficacy as an alkylene carbonate-containing nail polish remover or general purpose solvent, such as a paint thinner or stripper is disclosed. The composition includes: (i) between 10% and 98% by weight of at least one alkylene carbon
A composition with improved chemical stability and increased the efficacy as an alkylene carbonate-containing nail polish remover or general purpose solvent, such as a paint thinner or stripper is disclosed. The composition includes: (i) between 10% and 98% by weight of at least one alkylene carbonate solvent, (ii) between 1.5% and 25% by weight water, and (iii) an effective amount of a pH-buffering agent that maintains the pH of the composition between approximately pH 2 and pH 6.5 and that is chemically inert in the composition. The water in the composition functions to increase the rate at which the composition dissolves, e.g., nail lacquers, and the pH-buffering agent functions to stabilize the alkylene carbonate solvent against hydrolytic decomposition from pH-altering contaminants that may be introduced into the composition.
대표청구항
▼
What is claimed is: 1. A nail polish remover composition comprising: between 85% and 98% by weight of propylene carbonate solvent; between 1.5% and 15% by weight water; and an effective amount of a pH-buffering agent that is chemically inert in said composition and that maintains the pH of said com
What is claimed is: 1. A nail polish remover composition comprising: between 85% and 98% by weight of propylene carbonate solvent; between 1.5% and 15% by weight water; and an effective amount of a pH-buffering agent that is chemically inert in said composition and that maintains the pH of said composition between approximately pH 2.0 and pH 6.0, wherein said composition is free of peroxide, and any organic co-solvent present is a low vapor pressure volatile organic compound (LVP-VOC) or a low reactivity volatile organic compound (LR-VOC). 2. The nail polish remover composition of claim 1, consisting essentially of said propylene carbonate solvent, said water, and said pH-buffering agent. 3. The nail polish remover composition of claim 1, consisting essentially of said propylene carbonate solvent, said water, said pH-buffering agent, a glycol, and optionally a preservative agent that prevents microbial growth in said composition. 4. The nail polish remover composition of claim 1, consisting essentially of said propylene carbonate solvent, said water, said pH-buffering agent, a thickener that is soluble and chemically stable in said composition, and optionally a preservative agent that prevents microbial growth in said composition. 5. The nail polish remover composition of claim 1, consisting essentially of said propylene carbonate solvent, said water, said pH-buffering agent, a glycol, a thickener that is soluble and chemically stable in said composition, and optionally a preservative agent that prevents microbial growth in said composition. 6. The nail polish remover composition of claim 1, wherein any organic co-solvent present is a LVP-VOC. 7. The composition of claim 1, wherein said composition comprises between 85% and 90% by weight of said propylene carbonate solvent. 8. The composition of claim 1, further comprising a thickener that is soluble and chemically stable in said composition, and that can increase the viscosity of said composition to a value of between 100 and 10,000 cps at room temperature. 9. The composition of claim 8, wherein said thickener is selected from the group consisting of hydroxypropyl ethylcellulose, hydroxypropyl cellulose, polyoxyethylene, microparticulate fumed silica and combinations thereof. 10. The composition of claim 1, wherein said pH-buffering agent maintains the pH of said composition between approximately pH 3.0 and pH 5.0. 11. The composition of claim 1, wherein said pH-buffering agent maintains the pH of said composition at about pH 4.0. 12. The composition of claim 1, wherein said pH-buffering agent is selected from the group consisting of citric acid/citrate buffer, citric acid/dibasic phosphate buffer, acetic acid/acetate buffer, succinic acid/succinate buffer and combinations thereof. 13. The composition of claim 1, further comprising an effective amount of a preservative agent that prevents microbial growth in said composition. 14. The composition of claim 13, wherein said preservative agent is selected from the group consisting of methylparaben, propylparaben, DMDM hydantoin, ethylenediaminetetracetate and combinations thereof. 15. The composition of claim 1, further comprising up to 20% by weight of at least one glycol to increase the solubility of said thickener or said water or both in said propylene carbonate solvent. 16. The composition of claim 15, wherein said glycol is selected from the group consisting of propylene glycol, dipropylene glycol, methylpropanediol glycol and combinations thereof. 17. The composition of claim 1, wherein said composition is packaged in a container with a reusable applicator. 18. The composition of claim 17, wherein said container has a liquid capacity of between one-eighth and eight ounces. 19. The composition of claim 17, wherein said reusable applicator is a removable applicator. 20. The composition of claim 19, wherein said removable applicator is selected from the group consisting of a brush, a swab, a spatula, and a roller or other rotating device. 21. The composition of claim 17, wherein said reusable applicator is a permanent applicator that is used as a portion of said container. 22. The composition of claim 21, wherein said permanent applicator is selected from the group consisting of a nib, a brush, a comb-like device, an absorbent porous pad, a substantially non-absorbent porous pad, a porous membrane, and a roller or other rotating device. 23. The composition of claim 1, wherein said composition is free of oxidants.
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