Apparatus is described for treating an effluent fluid stream from a semiconductor manufacturing process tool. The apparatus comprises a combustion chamber, means for heating the combustion chamber, and a nozzle for injecting the effluent stream into the combustion chamber. The apparatus is configure
Apparatus is described for treating an effluent fluid stream from a semiconductor manufacturing process tool. The apparatus comprises a combustion chamber, means for heating the combustion chamber, and a nozzle for injecting the effluent stream into the combustion chamber. The apparatus is configured to enable a fuel and an oxidant to be selectively injected into the effluent stream as required to optimise the combustion conditions for a particular effluent stream. In one to embodiment, a lance projecting into the nozzle selectively injects an oxidant into the effluent stream, and a sleeve surrounding the nozzle selectively injects a fuel into the effluent stream.
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We claim: 1. An apparatus for treating an effluent gas stream from a semiconductor manufacturing process tool comprising: a combustion chamber; a nozzle for injecting the effluent stream into the combustion chamber; means for selectively injecting first and second fluid streams into the effluent st
We claim: 1. An apparatus for treating an effluent gas stream from a semiconductor manufacturing process tool comprising: a combustion chamber; a nozzle for injecting the effluent stream into the combustion chamber; means for selectively injecting first and second fluid streams into the effluent stream upstream from the combustion chamber; the injecting means comprising a lance projecting into the nozzle for conveying the first fluid stream into the effluent stream, and a sleeve extending about the nozzle for conveying the second fluid stream into the effluent stream; and control means for receiving data indicative of the composition of the effluent stream and for adjusting in response thereto at least one of (i) the rate of injection of at least one of the first and second fluid streams into the effluent stream and (ii) the composition of at least one of the first and second fluid streams. 2. The apparatus according to claim 1 wherein the injecting means comprises a source of a fuel, a source of an oxidant, means for selectively conveying one of the fuel and the oxidant from the source thereof to the lance as the first fluid stream, and means for selectively conveying one of the fuel and the oxidant from the source thereof to the sleeve as the second fluid stream, the control means being configured to control the selection of the fuel and the oxidant in dependence on the composition of the effluent stream. 3. The apparatus according to claim 2 wherein the injecting means comprises variable flow control devices for varying the supply of the fuel and oxidant to the sleeve and the lance, the control means being arranged to selectively control the variable flow control devices in response to the received data. 4. The apparatus according to claim 2 wherein the control means is configured to control the injecting means to supply one of the fuel and the oxidant to the lance, and to supply the other of the fuel and the oxidant to the sleeve, when the received data indicates that the effluent stream contains ammonia. 5. The apparatus according to claim 4 wherein the control means is configured to control the injecting means to supply fuel at a rate of between 1 l/min and 10 l/min to one of the lance and the sleeve, and to supply oxidant at a rate of between 5 and 20 l/min to the other of the lance and the sleeve, when the received data indicates that the effluent stream contains between 0.5 l/min and 2.5 l/min of ammonia. 6. The apparatus according to claim 2 wherein the control means is configured to control the injecting means to supply oxidant to the lance, and to supply fuel to the sleeve, when the received data indicates that the effluent stream contains an organo-silane. 7. The apparatus according to claim 6 wherein the control means is configured to control the injecting means to supply fuel at a rate of between 1 l/min and 10 l/min to one of the lance and the sleeve, and to supply oxidant at a rate of between 5 and 20 l/min to the other of the lance and the sleeve, when the received data indicates that the effluent stream contains between 0.5 l/min and 2.5 l/min of organo-silane. 8. The apparatus according to claim 2 wherein the injecting means comprises means for selectively conveying one of the fuel and the oxidant from the source thereof into the effluent stream upstream from the nozzle. 9. The apparatus according to claim 8 wherein the injecting means comprises variable flow control devices for varying the supply of the fuel and oxidant into the effluent stream upstream from the nozzle, the control means being arranged to selectively control the variable flow control devices in response to the received data. 10. The apparatus according to claim 8 wherein the control means is configured to control the injecting means to supply oxidant to the lance, and to supply fuel into the effluent stream upstream from the nozzle, when the received data indicates that the effluent stream contains a fluorine-containing component. 11. The apparatus according to claim 8 wherein the control means is configured to control the injecting means to supply oxidant into the effluent stream upstream from the nozzle, and to supply fuel to at least one of the lance and the sleeve, when the received data indicates that the effluent stream contains a fluorine-containing component. 12. The apparatus according to claim 11 wherein the control means is configured to control the injecting means to supply oxidant into the effluent stream upstream from the nozzle, and to supply fuel to both the lance and the sleeve, when the received data indicates that the effluent stream contains a fluorine-containing component and chlorine (Cl2). 13. The apparatus according to claim 11 wherein the control means is configured to control the injecting means to supply fuel at a rate of between 5 l/min and 15 l/min to at least one of the lance and the sleeve, and to supply oxidant at a rate of between 5 and 20 l/min into the effluent stream upstream of the nozzle, when the received data indicates that the effluent stream contains between 1 l/min and 5 l/min of a fluorine-containing component. 14. The apparatus according to claim 10 wherein the fluorine-containing component comprises a perfluorocarbon. 15. The apparatus according to claim 2 wherein the fuel comprises a hydrocarbon. 16. The apparatus according to claim 2 wherein the oxidant comprises oxygen. 17. The apparatus according to claim 1 wherein the nozzle extends about the lance. 18. The apparatus according to claim 1 wherein the nozzle is substantially concentric with the lance. 19. The apparatus according to claim 1 wherein the sleeve is substantially concentric with the nozzle. 20. The apparatus according to claim 1 wherein the nozzle terminates within the sleeve. 21. The apparatus according to claim 1 wherein the combustion chamber is laterally surrounded by the exit surface of a foraminous gas burner, and wherein the apparatus further comprises means for supplying to the burner a mixture of a fuel and an oxidant. 22. A method of treating an effluent fluid stream from a semiconductor manufacturing process tool comprising the steps of: providing a combustion chamber having a nozzle through which the effluent stream is injected into the combustion chamber; selectively injecting into the effluent stream a first fluid stream through a lance projecting into the nozzle; selectively injecting into the effluent stream a second fluid stream through a sleeve extending about the nozzle; and adjusting at least one of (i) the rate of injection of at least one of the first and second fluid streams into the effluent stream and (ii) the composition of at least one of the first and second fluid streams, in dependence on the composition of the effluent stream. 23. The method according to claim 22 wherein one of a fuel and an oxidant is selectively conveyed to the lance as the first fluid stream, and one of the fuel and the oxidant is selectively conveyed to the sleeve as the second fluid stream, the selection of the fuel and oxidant being dependent on the composition of the effluent stream. 24. The method according to claim 22 wherein one of the fuel and the oxidant is supplied to the lance, and the other of the fuel and the oxidant is supplied to the sleeve, when the effluent stream contains ammonia. 25. The method according to claim 24 wherein the fuel is supplied at a rate of between 1 l/min and 10 l/min to one of the lance and the sleeve, and the oxidant is supplied at a rate of between 5 and 20 l/min to the other of the lance and the sleeve, when the effluent stream contains between 0.5 l/min and 2.5 l/min of ammonia. 26. The method according to claim 23 wherein oxidant is supplied to the lance, and fuel is supplied to the sleeve, when the effluent stream contains an organo-silane. 27. The method according to claim 26 wherein the fuel is supplied at a rate of between 1 l/min and 10 l/min to one of the lance and the sleeve, and the oxidant is supplied at a rate of between 5 and 20 l/min to the other of the lance and the sleeve, when the effluent stream contains between 0.5 l/min and 2.5 l/min of organo-silane. 28. The method according to claim 23 wherein one of the fuel and the oxidant is conveyed into the effluent stream upstream from the nozzle in dependence on the composition of the effluent stream. 29. The method according to claim 28 wherein the oxidant is supplied to the lance, and the fuel is conveyed into the effluent stream upstream from the nozzle, when the effluent stream contains a fluorine-containing component. 30. The method according to claim 28 wherein the oxidant is conveyed into the effluent stream upstream from the nozzle, and the fuel is supplied to at least one of the lance and the sleeve, when the effluent stream contains a fluorine-containing component. 31. The method according to claim 30 wherein oxidant is conveyed into the effluent stream upstream from the nozzle, and fuel is supplied to both the lance and the sleeve, when the effluent stream contains a fluorine-containing component and chlorine (Cl2). 32. The method according to claim 30 wherein the fuel is supplied at a rate of between 5 l/min and 15 l/min to at least one of the lance and the sleeve, and oxidant is supplied at a rate of between 5 and 20 l/min into the effluent stream upstream of the nozzle, when the effluent stream contains between 1 l/min and 5 l/min of a fluorine-containing component. 33. The method according to claim 29 wherein the fluorine-containing component comprises a perfluorocarbon. 34. The method according to claim 23 wherein the fuel comprises a hydrocarbon. 35. The method according to claim 23 wherein the oxidant comprises oxygen. 36. The method according to claim 22 wherein the combustion chamber is laterally surrounded by the exit surface of a foraminous gas burner, and wherein a mixture of a fuel and an oxidant is supplied to the burner. 37. The apparatus according to claim 10 wherein the fluorine-containing component comprises a perfluorocarbon selected from the group consisting of CF4, NF3 and SF6 and mixtures thereof. 38. The apparatus as in claim 15 wherein the hydrocarbon comprises methane. 39. The method according to claim 29 wherein the fluorine-containing component comprises a perfluorocarbon selected from the group consisting of CF4, NF3 and SF6 and mixtures thereof. 40. The method as in claim 34 wherein the hydrocarbon comprises methane.
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이 특허에 인용된 특허 (7)
Seeley, Andrew James; Smith, James Robert, Abatement of semiconductor processing gases.
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