Multimetal oxide materials which contain Mo and V and, if required, one or more of the elements from the group consisting of lanthanides, transition elements of the Periodic Table of the Elements and elements of the third to sixth main group of the Periodic Table of the Elements and which are prepar
Multimetal oxide materials which contain Mo and V and, if required, one or more of the elements from the group consisting of lanthanides, transition elements of the Periodic Table of the Elements and elements of the third to sixth main group of the Periodic Table of the Elements and which are prepared in the presence of an alkali metal other than Li and have the i-phase structure are used as active material in catalysts for partial gas-phase oxidations.
대표청구항▼
We claim: 1. A multimetal oxide material of the formula I description="In-line Formulae" end="lead"Aa[Mo5-b-cVbXcOd] 1 (I),description="In-line Formulae" end="tail" where A is at least one of the elements selected from the group consisting of NH4, Na, K, Rb, Cs and Tl; X is one or more of the e
We claim: 1. A multimetal oxide material of the formula I description="In-line Formulae" end="lead"Aa[Mo5-b-cVbXcOd] 1 (I),description="In-line Formulae" end="tail" where A is at least one of the elements selected from the group consisting of NH4, Na, K, Rb, Cs and Tl; X is one or more of the elements selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Ti, Zr, Hf, Nb, Ta, W, Mn, Re, Fe, Co, Ni, Cr, Ru, Rh, Pd, Os, Ir, Pt, Cu, Ag, Au, Zn, Cd, Hg, B, Al, Ga, In, C, Si, Ge, Sn, Pb, P, As, Sb, Bi, S, Se and Te; a is from 0.1 to 1; b is from 0.25 to 4.5; and c is from 0 to 4.5, with the proviso that b+c≦4.5, whose X-ray diffractogram contains the following X-ray diffraction pattern XP, reproduced in the form of interplanar spacings d [Å] independent of the wavelength of the X-rays used, d [Å] 3.06 �� 0.2 3.17 �� 0.2 3.28 �� 0.2 3.99 �� 0.2 9.82 �� 0.4 11.24 �� 0.4 13.28 �� 0.5. 2. A multimetal oxide material as claimed in claim 1, wherein the X-ray diffraction pattern XP additionally has the following relative reflection intensities I (%) based on the intensity of the reflection representing the interplanar spacing d [Å]=3.99��0.2: d[Å] I (%) 3.06 �� 0.2 5 to 65 3.17 �� 0.2 5 to 65 3.28 �� 0.2 15 to 130 3.99 �� 0.2 100 9.82 �� 0.4 1 to 50 11.24 �� 0.4 1 to 45 13.28 �� 0.5 1 to 35. 3. A multimetal oxide material as claimed in claim 1, in which A is at least one of the two elements Rb and Cs. 4. A multimetal oxide material as claimed in claim 1, in which X is one or more of the elements selected from the group consisting of Ti, Cr, W, Mn, Re, Fe, Co, Ni, Pd, Pt, Cu, Ag, Ga, Sn, Sb and Te. 5. A multimetal oxide material as claimed in claim 1, in which c is from 0.05 to 4.0. 6. A multimetal oxide material as claimed in claim 1, in which b is from 0.5 to 2.5. 7. A multimetal oxide material as claimed in claim 1, in which a is from 0.2 to 0.8. 8. A multimetal oxide material as claimed in claim 1, in which a is from 0.3 to 0.7. 9. A multimetal oxide material as claimed in claim 1, in which more than 25 mol % of the V contained therein is present in the oxidation state +4. 10. A multimetal oxide material as claimed in claim 1, in which more than 50 mol % of the V contained therein is present in the oxidation state +4. 11. A multimetal oxide material as claimed in claim 1, whose X-ray diffractogram additionally contains the following reflections: d [Å] 8.19 �� 0.3 3.51 �� 0.2 3.42 �� 0.2 3.34 �� 0.2 2.94 �� 0.2 2.86 �� 0.2. 12. A multimetal oxide material as claimed in claim 11, wherein the additional reflections have the following relative reflection intensities I (%) based on the intensity of the reflection representing the interplanar spacing d [Å]=3.99��0.2: d [Å] I (%) 8.19 �� 0.3 0 to 25 3.51 �� 0.2 2 to 50 3.42 �� 0.2 5 to 75 3.34 �� 0.2 5 to 80 2.94 �� 0.2 5 to 55 2.86 �� 0.2 5 to 60. 13. A multimetal oxide material as claimed in claim 1, whose X-ray diffractogram additionally contains the following reflections: d [Å] 2.54 �� 0.2 2.01 �� 0.2. 14. A multimetal oxide material as claimed in claim 13, wherein the additional reflections have the following relative reflection intensities I (%) based on the intensity of the reflection representing the interplanar spacing d [Å]=3.99��0.2: d [Å] I (%) 2.54 �� 0.2 0.5 to 40 2.01 �� 0.2 5 to 60. 15. A multimetal oxide material as claimed in claim 1, in whose X-ray diffractogram the reflection representing the interplanar spacing d [Å]=3.99��0.2 or the reflection representing the interplanar spacing d [Å]=3.28��0.2 is the reflection having the strongest intensity. 16. A multimetal oxide material as claimed in claim 1, in whose X-ray diffractogram the reflection representing the interplanar spacing d [Å]=3.99��0.2 has a 2θ full width at half height of ≦1��. 17. A process for the preparation of a multimetal oxide material as claimed in claim 1, comprising preparing a dry blend from suitable sources of the elemental constituents of the multimetal oxide material and subjecting said dry blend to a thermal treatment at a temperature from 350 to 1000�� C. 18. A process as claimed in claim 17, wherein the thermal treatment is effected under inert gas. 19. A process as claimed in claim 17, wherein a mixture of at least one compound, which contains the element V in the oxidation state +5, and elemental vanadium is used as sources of the element V for the preparation of the dry blend. 20. A process for the preparation of multimetal oxides, wherein a multimetal oxide as claimed in claim 17 is first prepared and its content of elements A is then reduced relative to the content of Mo. 21. A process for the preparation of multimetal oxides, wherein a multimetal oxide as claimed in claim 17 is first prepared and this is then treated with a liquid. 22. A process as claimed in claim 21, wherein the liquid is an organic acid, an inorganic acid or an aqueous solution of acids thereof. 23. The process as claimed in claim 17, wherein the dry blend does not contain any of the following: Nb, Te, Sb, Nb and Te, or Nb and Sb. 24. A process for the preparation of a multimetal oxide material as claimed in claim 1, comprising preparing a dry blend from suitable sources of the elemental constituents of the multimetal oxide material and subjecting said dry blend to a thermal treatment first under an oxidizing atmosphere at a temperature from 150 to 400�� C. and then under inert gas at a temperature from 350 to 1000�� C. 25. In a process for at least one member selected from the group consisting of heterogeneously catalyzed partial gas-phase oxidations, and ammoxidations of at least one member selected from the group consisting of saturated hydrocarbons, unsaturated hydrocarbons, saturated aldehydes, and unsaturated aldehydes, the improvement wherein the process is carried out in the presence of a catalytically active material comprising a multimetal oxide as claimed in claim 1.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (8)
Hinago Hidenori,JPX ; Komada Satoru,JPX, Ammoxidation catalyst for use in producing acrylonitrile or methacrylonitrile from propane or isobutane by ammoxidation.
Hinago Hidenori,JPX ; Komada Satoru,JPX, Ammoxidation catalyst for use in producing acrylonitrile or methacrylonitrile from propane or isobutane by ammoxidation.
Borgmeier,Frieder; Tenten,Andreas; Hibst,Hartmut, Catalyst comprising a support body and a catalytically active oxide material applied to the surface of the substrate.
Bedard Robert L. ; Bogdan Paula L. ; King Lisa M. ; Koster Susan C., Crystalline multinary metal oxide compositions, process for preparing and processes for using the composition.
Robert L. Bedard ; Lisa M. King ; Paula L. Bogdan ; Susan C. Koster, Crystalline tantalum containing multinary metal oxide compositions, processes for using the composition.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.