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Solvent cleaning process 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C11D-003/00
  • D06L-001/04
  • D06L-001/00
  • A01H-005/02
  • A01H-005/00
  • D06F-035/00
출원번호 US-0734027 (2003-12-11)
등록번호 US-7497877 (2009-03-03)
발명자 / 주소
  • Goedhart,Machial
  • Luckman,Joel
  • Reinhoudt,Hank Robert
  • Verbeek,Jan Hendrik
  • Wyatt Smith,Vicki Lyn
  • May,Brian W.
  • Kovich,Mark B.
  • Wright,Tremitchell
  • Conrad,Daniel C.
출원인 / 주소
  • Whirlpool Corporation
대리인 / 주소
    Green,Clifton
인용정보 피인용 횟수 : 5  인용 특허 : 33

초록

An improved solvent cleaning process of cleaning a non-aqueous solvent used in a dry cleaning process for fabrics including consecutive wash cycles for washing respective fabrics batches, including a basic solvent refining cycle and a first advanced solvent refining cycle, the basic solvent refining

대표청구항

The invention claimed is: 1. A solvent cleaning process of cleaning a non-aqueous solvent used in a dry cleaning process for fabrics, the dry cleaning process comprising consecutive wash cycles for washing respective fabrics batches, the solvent cleaning process occurring independent of the wash cy

이 특허에 인용된 특허 (33)

  1. DesMarais Thomas Allen ; Stone Keith Joseph ; Dyer John Collins ; Hird Bryn ; Goldman Stephen Allen ; Seiden Paul, Absorbent foam materials for aqueous fluids made from high internal phase emulsions having very high water-to-oil ratios.
  2. Dennis Stephen Murphy ; David Alan Binder, Carbohydrate containing cleaning surfactant and method for using the same.
  3. Murphy Dennis Stephen, Cleaning composition and method for using the same.
  4. Flynn Richard M. ; Grenfell Mark W. ; Moore George G. I. ; Owens John G. ; Milbrath Dean S., Cleaning process and composition.
  5. Heini Tapio M. (Uusikaupunki FIX) Kontu Mauri (Kalanti FIX), Distillation apparatus with paired membrane units.
  6. Mitani Kenji (Yokohama JPX) Ashida Akira (Yokohama JPX) Ebara Katsuya (Mito JPX) Kurokawa Hideaki (Hitachi JPX), Distillation apparatus with porous membrane and heat pump.
  7. Suissa Moshe (5561 Alpine Cte St Luc ; Quebec CAX H4V 2X4), Dry cleaning machine.
  8. Berndt Dieter R. ; Griffiss John McLeod, Dry cleaning method and solvent/detergent mixture.
  9. Evers, Joop; Goedhart, Machiel; Kerpels, Fred; Kralingen van, Cornelis Gerhard; Overdevest, Pieter Everhardus; Reinhoudt, Hank Robert; Vrieswijk, Karin, Dry cleaning process comprising a dry cleaning step and a regeneration step.
  10. Evers, Joop; Goedhart, Machiel; Kerpels, Fred; Kralingen van, Cornelis Gerhard; Overdevest, Pieter Everhardus; Reinhoudt, Hank Robert; Vrieswijk, Karin, Dry cleaning process comprising a non-aqueous step and a low aqueous step.
  11. Wehr ; Robert L., Dry cleaning system with solvent recovery.
  12. Murphy Dennis Stephen, Dry-cleaning solvent and method for using the same.
  13. Huba Francis (Mentor OH) Zorska Roman (University Heights OH), Electrolytic-ultrafiltration apparatus and process for recovering solids from a liquid medium.
  14. Groeger H. Gunter (Charlotte NC) Serad George A. (Charlotte NC) Felton Clinton D. (Charlotte NC), Fibrous structures containing immobilized particulate matter.
  15. Mayne Michael D., Ion exchange resin cleaning method.
  16. Itoh Hiroshi (Yokohama JPX) Nakagawa Toshimi (Fujisawa JPX) Nitta Atsuhiko (Yokohama JPX) Tanaka Tomio (Tokyo JPX) Kamio Hideo (Odawara JPX), Method for the extraction of water from macromolecular solutions.
  17. Cussler, Edward L., Method of size-selective extraction from solutions.
  18. Takagawa Hiroyuki (Nagoya JPX) Tsubaki Yasuhiro (Nagoya JPX) Miyairi Yoshio (Nagoya JPX) Hattori Toshio (Nagoya JPX) Hagiwara Haruo (Nagoya JPX), Method of washing and drying clothes.
  19. Estes Kurt A ; Conrad Daniel C. ; Kovich Mark Bradley ; Wright Tremitchell L., Non-aqueous washing apparatus and method.
  20. Estes, Kurt A; Conrad, Daniel C.; Kovich, Mark Bradley; Wright, Tremitchell L., Non-aqueous washing apparatus and method.
  21. Kurt A Estes ; Daniel C. Conrad ; Mark Bradley Kovich ; Tremitchell L. Wright, Non-aqueous washing apparatus and method.
  22. Estes, Kurt A; Conrad, Daniel C.; Kovich, Mark Bradley; Wright, Tremitchell L., Non-aqueous washing cabinet and apparatus.
  23. Huang Pin Y. (Houston TX) Tsao Yuh-Hwang (Houston TX) Ubelhor Martin E. (Houston TX), Process for dewatering an aqueous solution containing solids using water-absorbent substances.
  24. Cash Alan B., Process for regenerating spent solvent.
  25. Cocuzza Gioacchino (Catania ITX) Torreggiani Gianni (Busto Arsizio ITX), Process for the preparation and the recovery of ethanolamines.
  26. Kinsley ; Jr. Homan B. (Powhatan VA), Solvent removal via continuously superheated heat transfer medium.
  27. Cockett Keith R. (Cheshire GBX) Concannon Martin (West Kirby GBX) Hunter Robert M. (Cheshire GBX) Lovell Anthony L. (Clwyd GB7) Nock Anthony (Cheshire GBX) Webb Maurice (Cheshire GBX) Whalley Roderic, Sorbing agents.
  28. Caputi Roger W. (Walnut Creek CA) Pierick Edward G. (Fremont CA) Brumley Dennis V. (Fremont CA) Kincaid Charles B. (Pleasanton CA), Spent liquid organic solvent recovery system.
  29. Grossman Bruce (107 Via Del Cerrito Encinitas CA 92024), System for reducing liquid waste generated by dry cleaning.
  30. Cussler Edward L. (Edina MN), Temperature-sensitive method of size-selective extraction from solution.
  31. Filson James L. (Wexford PA) Carrera Wesley R. (San Antonio TX) Bhave Ramesh R. (Cranberry Township PA), Ultra pure water filtration.
  32. Werner Kurt (St. Joseph Township ; Berrien County MI) Sherer R. Bruce (St. Joseph Township ; Berrien County MI) Kretchman Gerald L. (St. Joseph Township ; Berrien County MI) Mueller Dale E. (Benton T, Vertical axis washer.
  33. Chung Jong Wha, Zero emission dry cleaning machine and process.

이 특허를 인용한 특허 (5)

  1. Yi, Chong Tae, Dry cleaning systems and methods.
  2. Lee, Deughee, Fabric dryer and method of controlling the same.
  3. Wang, Zhaolin; Finlay, Warren H., Powder formation by atmospheric spray-freeze drying.
  4. Nagashima, Kazuhito; Ishikawa, Junichi; Kikuchi, Hideaki, Solvent composition for removing radioactive substance and removing material, and method for removing radioactive substance.
  5. Ohno, Hiroki; Sekiguchi, Kenji, Substrate processing apparatus and substrate processing method.
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