IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
UP-0430489
(2003-05-06)
|
등록번호 |
US-7527698
(2009-07-01)
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발명자
/ 주소 |
- Holsteyns, Frank
- Heyns, Marc
- Mertens, Paul W.
|
출원인 / 주소 |
- Interuniversitair Microelektronica Centrum (IMEC, VZW)
|
대리인 / 주소 |
McDonnell Boehnen Hulbert & Berghoff LLP
|
인용정보 |
피인용 횟수 :
2 인용 특허 :
24 |
초록
▼
A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The rotary movement has a center of rotation and an edge of rotation. The second liquid is directed from th
A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The rotary movement has a center of rotation and an edge of rotation. The second liquid is directed from the center of rotation to the edge of rotation using a nozzle. A dry zone is created on the substrate as the position of the spray moves from the center of rotation to the edge of rotation. As a result, the first liquid and the second liquid are removed from the surface of the substrate.
대표청구항
▼
What is claimed is: 1. A method of removing a liquid from at least a part of a surface of a substrate, the substrate defining an outer edge, the method comprising: providing a first wetting liquid comprising isopropyl alcohol from a first supply on a portion of the surface of the substrate, wherein
What is claimed is: 1. A method of removing a liquid from at least a part of a surface of a substrate, the substrate defining an outer edge, the method comprising: providing a first wetting liquid comprising isopropyl alcohol from a first supply on a portion of the surface of the substrate, wherein the first supply is affixed to a moveable arm; providing a non-wetting liquid consisting of water on the portion of the surface of the substrate from a second supply after supplying the first wetting liquid to the portion of the surface of the substrate, wherein the second supply is affixed to the moveable arm; providing a second wetting liquid consisting of a surfactant/water mixture on the portion of the surface of the substrate from a third supply after supplying the non-wetting liquid to the portion of the surface of the substrate, wherein the third supply is affixed to the moveable arm; and moving the moveable arm relative to the substrate, wherein the first, second, and third supplies move closer to the outer edge of the substrate with the second supply spaced further away from the outer edge of the substrate than the first supply; and wherein the first supply provides the first wetting liquid to the portion of the surface of the substrate and the second supply thereafter provides the non-wetting liquid to the portion of the surface of the substrate, and the third supply thereafter provides the surfactant/water mixture to the portion of the surface of the substrate as the first, second, and third supplies move closer to the outer edge of the substrate, whereby moving the moveable arm relative to the substrate removes the liquid from at least a part of the surface of the substrate. 2. The method of claim 1, wherein the first wetting liquid is supplied in order to obtain a complete wetting of the at least part of the surface of the substrate. 3. The method of claim 1, wherein the first wetting liquid further comprises nitrogen gas. 4. The method of claim 1, wherein the water is de-ionized water. 5. The method of claim 1, further comprising providing centrifugal force on the first and second wetting liquids and the non-wetting liquid, wherein the force is applied in the direction of movement of the moveable arm. 6. A method according to claim 1, wherein at least a part of the surface of the substrate is lyophobic, lyophilic, or a mixture of both. 7. The method of claim 5, wherein the substrate is rotated around its own center, and wherein the direction of movement of the moveable arm is away from the center of the substrate. 8. The method of claim 5, wherein the substrate is rotated off-center. 9. The method of claim 5, wherein the substrate is rotated about a center, at a rotational speed within a range of approximately 2 to 40 revolutions per second. 10. The method of claim 5, wherein the substrate is rotated about a center, wherein the rotary movement has a center of rotation and an outer edge of rotation, and wherein the direction of movement of the movable arm is in a direction from the center of rotation to the outer edge of rotation. 11. The method of claim 7, wherein providing a first wetting liquid from a first supply comprises supplying the first wetting liquid using a first nozzle, and wherein providing a non-wetting liquid from a second supply comprises supplying the non-wetting liquid using a second nozzle and wherein providing a second wetting liquid from a third supply comprises supplying the second wetting liquid from a third nozzle. 12. The method of claim 11, wherein moving moveable the movable arm relative to the substrate comprises movement selected from the group consisting of linear movement, rotational movement, and sweeping movement. 13. The method of claim 12, wherein the nozzles are angled and the nozzles direct the first and second wetting liquids and the non-wetting liquid from substantially the center of the substrate towards the outer edge of the substrate. 14. A method of removing a liquid from at least a part of a surface of a substrate, the substrate having an outer edge, the method comprising: providing a first wetting liquid comprising isopropyl alcohol from a first supply on a portion of the surface of the substrate; providing a non-wetting liquid consisting of water on the portion of the surface of the substrate from a second supply after supplying the first wetting liquid to the portion of the surface of the substrate; providing a second wetting liquid consisting of a surfactant/water mixture on the portion of the surface of the substrate from a third supply after supplying the non-wetting liquid to the portion of the surface of the substrate, and moving the first, second and third supplies relative to the substrate, wherein the first, second, and third supplies move closer to the outer edge of the substrate with the second supply spaced further away from the outer edge of the substrate than the first supply; and wherein the first supply provides the first wetting liquid to the portion of the surface of the substrate and the second supply thereafter provides the non-wetting liquid to the portion of the surface of the substrate, and the third supply thereafter provides the surfactant/water mixture to the portion of the surface of the substrate, as the first, second, and third supplies move closer to the outer edge of the substrate, whereby moving the first, second, and third supplies relative to the substrate removes the liquid from at least a part of the surface of the substrate. 15. A method according to claim 14, further comprising providing an external force on the first and second wetting liquids and the non-wetting liquid, wherein the force is applied in the direction of movement of the first, second, third supplies. 16. A method according to claim 14, wherein moving the first, second and third supplies relative to the substrate comprises moving the substrate. 17. A method according to claim 14, wherein moving the first, second, and third supplies relative to the substrate comprises moving the first, second, and third supplies toward the outer edge of the substrate. 18. A method according to claim 14, wherein moving the first, second, and third supplies relative to the substrate comprises subjecting the substrate to linear movement. 19. A method according to claim 14, wherein at least a part of the surface of the substrate is lyophobic, lyophilic, or a mixture of both. 20. A method according to claim 15, wherein the external force is centrifugal force. 21. A method according to claim 15, wherein the external force is gravity. 22. A method according to claim 20, wherein the substrate is rotated about a center, and wherein the direction of movement of the first, second, and third supplies is away from the center of the substrate.
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