This disclosure provides an approach for cleaning an ion implanter. In this disclosure, there is a vacuum device having an in-take port adapted to receive a contaminant removing hose. The vacuum device and hose are configured to provide constant suction to the ion implanter. A dry ice blaster having
This disclosure provides an approach for cleaning an ion implanter. In this disclosure, there is a vacuum device having an in-take port adapted to receive a contaminant removing hose. The vacuum device and hose are configured to provide constant suction to the ion implanter. A dry ice blaster having a dry ice dispensing hose is configured to supply dry ice. A sealing plate is adapted to attach to an access section of a processing region of the ion implanter. The sealing plate has a first opening configured to receive the contaminant removing hose and the dry ice dispensing hose.
대표청구항▼
What is claimed is: 1. A system for cleaning an ion implanter, comprising: a contaminant removing hose; a vacuum device comprising an in-take port adapted to receive the contaminant removing hose, wherein the vacuum device and hose are configured to provide constant suction; a dry ice blaster havin
What is claimed is: 1. A system for cleaning an ion implanter, comprising: a contaminant removing hose; a vacuum device comprising an in-take port adapted to receive the contaminant removing hose, wherein the vacuum device and hose are configured to provide constant suction; a dry ice blaster having a dry ice dispensing hose coupled thereto, wherein the dry ice blaster and dry ice dispensing hose are configured to supply dry ice; and a sealing plate adapted to attach to an access section of a processing region of the ion implanter, wherein the sealing plate comprises a first opening configured to receive the contaminant removing hose and the dry ice dispensing hose. 2. The system according to claim 1, wherein the vacuum device further comprises an air particulate filtration unit. 3. The system according to claim 2, wherein the air particulate filtration unit is selected from the group consisting of a HEPA filter or an ULPA filter. 4. The system according to claim 1, wherein the contaminant removing hose comprises an in-take port configured to receive a portion of the dry ice dispensing hose, wherein the contaminant removing hose and the dry ice dispensing hose are configured to simultaneously provide constant suction and dispensing of dry ice. 5. The system according to claim 1, wherein the dry ice dispensing hose comprises an extendible nozzle to deliver dry ice. 6. The system according to claim 1, wherein the sealing plate comprises a second opening configured to receive a glove box. 7. The system according to claim 1, wherein the sealing plate comprises a transparent plate. 8. The system according to claim 1, wherein the vacuum device comprises a cyclonic cleaner. 9. A system for cleaning an ion implanter, comprising: a vacuum device configured to provide constant suction, wherein the vacuum device comprises a contaminant removing hose configured to deliver the constant suction, wherein the contaminant removing hose comprises an in-take port; a dry ice blaster configured to supply dry ice, wherein the dry ice blaster comprises a dry ice dispensing hose configured to dispense the dry ice, wherein the dry ice dispensing hose is integrated into the contaminant removing hose through the in-take port; and a sealing plate adapted to attach to an access section of a processing region of the ion implanter, wherein the sealing plate comprises a first opening configured to receive the contaminant removing hose and the dry ice dispensing hose. 10. The system according to claim 9, wherein the vacuum device further comprises an air particulate filtration unit. 11. The system according to claim 10, wherein the air particulate filtration unit is selected from the group consisting of a HEPA filter or an ULPA filter. 12. The system according to claim 9, wherein the contaminant removing hose and the dry ice dispensing hose are configured to simultaneously provide constant suction and dispensing of dry ice. 13. The system according to claim 9, wherein the dry ice dispensing hose comprises a extendible nozzle configured to extend from the contaminant removing hose. 14. The system according to claim 9, wherein the sealing plate comprises a second opening configured to receive a glove box. 15. The system according to claim 9, wherein the sealing plate comprises a transparent plate. 16. The system according to claim 9, wherein the vacuum device comprises a cyclonic cleaner. 17. A method for cleaning an ion implanter, comprising: removing an access section plate to a processing region of the ion implanter; sealing the removed access section plate with a sealing plate; providing constant suction to the processing region through an opening in the sealing plate; and supplying dry ice to the processing region through the opening in the sealing plate. 18. The method according to claim 17, wherein the providing of constant suction comprises placing a contaminant removing hose through the opening in the sealing plate and applying constant suction to the processing region through the contaminant removing hose. 19. The method according to claim 17, wherein the supplying of dry ice comprises placing a dry ice dispensing hose through the opening in the sealing plate and dispensing the dry ice to the processing region through the dry ice dispensing hose. 20. The method according to claim 17, wherein the providing of constant suction and supplying of dry ice to the processing region occur simultaneously. 21. A method for cleaning an ion implanter, comprising: removing an access section plate to a processing region of the ion implanter; sealing the removed access section plate with a sealing plate; placing a contaminant removing hose through an opening in the sealing plate; providing constant suction to the processing region through the contaminant removing hose; placing a dry ice dispensing hose through the opening in the sealing plate; and supplying dry ice to the processing region through the dry ice dispensing hose. 22. A method for cleaning an ion implanter, comprising: removing an access section plate to a processing region of the ion implanter; sealing the removed access section plate with a sealing plate; placing a contaminant removing hose through an opening in the sealing plate; inserting a dry ice dispensing hose through an in-take port in the contaminant removing hose; providing constant suction to the processing region through the contaminant removing hose; and supplying dry ice to the processing region through the dry ice dispensing hose. 23. The method according to claim 22, wherein the providing of constant suction and supplying of dry ice to the processing region occur simultaneously.
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이 특허에 인용된 특허 (4)
Rose Peter H. ; Sferlazzo Piero ; van der Heide Robert G., Aerosol surface processing.
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