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다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
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Kafe 바로가기국가/구분 | United States(US) Patent 등록 |
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국제특허분류(IPC7판) |
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출원번호 | UP-0683424 (2003-10-10) |
등록번호 | US-7581511 (2009-09-16) |
발명자 / 주소 |
|
출원인 / 주소 |
|
대리인 / 주소 |
|
인용정보 | 피인용 횟수 : 148 인용 특허 : 343 |
A reactor comprising an energy source, a plasma unit positioned relative to the energy source, and a processing vessel connected to the plasma unit. The energy source has a generator that produces a plasma energy and a transmitter to transmit the plasma energy. The plasma unit has a first portion o
A reactor comprising an energy source, a plasma unit positioned relative to the energy source, and a processing vessel connected to the plasma unit. The energy source has a generator that produces a plasma energy and a transmitter to transmit the plasma energy. The plasma unit has a first portion or transmissive portion through which the plasma energy can propagate, a second portion or distributor portion having a plurality of outlets, and a chamber in fluid communication with the plurality of outlets. The chamber is generally between or within the first and second portions. The plasma energy can pass through at least the first portion and into the chamber to create a plasma in the chamber. The second portion can also be transmissive or opaque to the plasma energy. The processing vessel includes a workpiece holder across from the outlets of the second portion of the plasma unit.
We claim: 1. A plasma unit for distributing a plasma in the manufacturing of microfeature devices, comprising: a window having an upper portion composed at least in part of a material through which a plasma energy can propagate and a lower portion extending downward directly from the first portion,
We claim: 1. A plasma unit for distributing a plasma in the manufacturing of microfeature devices, comprising: a window having an upper portion composed at least in part of a material through which a plasma energy can propagate and a lower portion extending downward directly from the first portion, wherein the lower portion is composed of a non-conductive material that is transmissive to the plasma energy, and wherein the lower portion has an exterior surface configured to face a workpiece holder directly below the window; a chamber configured to receive the plasma energy passing through the window, the chamber having a first inlet for receiving a first gas and a second inlet for receiving a second gas, and wherein the chamber comprises a central hub enclosed within the window and a plurality of conduits extending through the window from the hub; and a plurality of holes extending through the lower portion of the window from the conduits to the exterior surface, wherein the holes define outlets arranged to distribute the plasma formed within the plasma unit directly over a workpiece juxtaposed to the plasma unit. 2. A plasma unit for generating a plasma therein and distributing plasma fluid in a plasma vapor reactor used in the manufacturing of microfeature devices, comprising: a quartz window having an upper surface and a lower surface; a chamber in the quartz window between the upper and lower surfaces; a gas supply having at least a first gas line configured to direct a first gas into the chamber and a second gas line configured to direct a second gas into the chamber; and a plurality of outlets arranged along the lower surface of the window in fluid communication with the chamber, wherein the chamber comprises a central hub in the window and a plurality of conduits extending through the window from the hub, and wherein the outlets comprise holes along the conduits that extend through the window. 3. The plasma unit of claim 2 wherein the chamber is within the window. 4. The plasma unit of claim 2 wherein the chamber comprises a cavity within the window and the outlets extend from the chamber and through a lower portion of the window.
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